JPS566238A - Heat treating device - Google Patents

Heat treating device

Info

Publication number
JPS566238A
JPS566238A JP8138779A JP8138779A JPS566238A JP S566238 A JPS566238 A JP S566238A JP 8138779 A JP8138779 A JP 8138779A JP 8138779 A JP8138779 A JP 8138779A JP S566238 A JPS566238 A JP S566238A
Authority
JP
Japan
Prior art keywords
chain
pitch
heat
wafers
treated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8138779A
Other languages
Japanese (ja)
Inventor
Kenji Sumitomo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP8138779A priority Critical patent/JPS566238A/en
Publication of JPS566238A publication Critical patent/JPS566238A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To make the conveying mechanism at the heat treatment simple and perform smooth and stable conveying of the materials to be heat-treated by controlling the in-furnace circulation of the materials to be heat-treated by way of an intermittently moving chain. CONSTITUTION:Wafers 4... being the materials to be heat-treated which are transferred in by a transfer-in mechanism 20 such as endless belt are moved upward, pitch by pitch, by the carriers 26... provided to the wafer conveying devices 15... of a chain 14 which is moved, pitch by pitch, by a driving source 16 and penetrates through the furnace walls of which the parallel parts are adjusted slightly higher on the transfer-in side than on the discharge side. The wafers 4... are moved onto the corresponding descending side carriers 26... of the chain 14 by the pusher 25 which is driven cooperatively with the intermittent driving and stopping of the chain 14 of the horizontal moving mechanism 17 provided in the specified position, after which they are moved downward by the chain 14 and are discharged by a discharge mechanism 21 such as endless belt. By the simple conveying mechanism using the chain or the like which is intermittently driven in one direction only, the wafers, etc. are smoothly and stably conveyed in the furnace and good heat treatment is done.
JP8138779A 1979-06-29 1979-06-29 Heat treating device Pending JPS566238A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8138779A JPS566238A (en) 1979-06-29 1979-06-29 Heat treating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8138779A JPS566238A (en) 1979-06-29 1979-06-29 Heat treating device

Publications (1)

Publication Number Publication Date
JPS566238A true JPS566238A (en) 1981-01-22

Family

ID=13744885

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8138779A Pending JPS566238A (en) 1979-06-29 1979-06-29 Heat treating device

Country Status (1)

Country Link
JP (1) JPS566238A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0664035U (en) * 1992-12-17 1994-09-09 株式会社水野設備エンジニア Outdoor unit installation stand for air conditioning
CN113943851A (en) * 2021-09-13 2022-01-18 荆门索立特热能技术股份有限公司 Full-automatic heat treatment system and method for large workpiece

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0664035U (en) * 1992-12-17 1994-09-09 株式会社水野設備エンジニア Outdoor unit installation stand for air conditioning
CN113943851A (en) * 2021-09-13 2022-01-18 荆门索立特热能技术股份有限公司 Full-automatic heat treatment system and method for large workpiece
CN113943851B (en) * 2021-09-13 2023-06-30 荆门索立特热能技术股份有限公司 Full-automatic heat treatment system and heat treatment method for large workpiece

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