JPS5654039A - Forming method for fine pattern - Google Patents
Forming method for fine patternInfo
- Publication number
- JPS5654039A JPS5654039A JP13064879A JP13064879A JPS5654039A JP S5654039 A JPS5654039 A JP S5654039A JP 13064879 A JP13064879 A JP 13064879A JP 13064879 A JP13064879 A JP 13064879A JP S5654039 A JPS5654039 A JP S5654039A
- Authority
- JP
- Japan
- Prior art keywords
- resin film
- width
- sharp corner
- pattern
- corner parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To obtain a pattern with sharp corner parts accurately by a method wherein the desired pattern is formed at a point of intersection of two continuous patterns that cross each other. CONSTITUTION:The first photosensitive resin film 3 is made up on an insulating film 2 first, and a necessary portion is removed in width W by means of phototype process. The second photosensitive resin film 4 is coated, and the second resin film 4 is removed by means of phototype process, leaving a width L portion so as to cross at right angles with the removed portion of the first resin film 3 with width W in a gate region. According to this method, the mask obtained is formed in precise dimensions and has sharp corner parts. Thus, the pattern with sharp corner parts can accurately be made up when the insulating film is etched by using the mask.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13064879A JPS5654039A (en) | 1979-10-08 | 1979-10-08 | Forming method for fine pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13064879A JPS5654039A (en) | 1979-10-08 | 1979-10-08 | Forming method for fine pattern |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5654039A true JPS5654039A (en) | 1981-05-13 |
Family
ID=15039270
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13064879A Pending JPS5654039A (en) | 1979-10-08 | 1979-10-08 | Forming method for fine pattern |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5654039A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01248150A (en) * | 1988-03-30 | 1989-10-03 | Hoya Corp | Latent image forming method |
US7913197B1 (en) * | 2007-02-21 | 2011-03-22 | Cadence Design Systems, Inc. | Method for double patterning lithography |
-
1979
- 1979-10-08 JP JP13064879A patent/JPS5654039A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01248150A (en) * | 1988-03-30 | 1989-10-03 | Hoya Corp | Latent image forming method |
US7913197B1 (en) * | 2007-02-21 | 2011-03-22 | Cadence Design Systems, Inc. | Method for double patterning lithography |
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