JPS5646531U - - Google Patents
Info
- Publication number
- JPS5646531U JPS5646531U JP13042779U JP13042779U JPS5646531U JP S5646531 U JPS5646531 U JP S5646531U JP 13042779 U JP13042779 U JP 13042779U JP 13042779 U JP13042779 U JP 13042779U JP S5646531 U JPS5646531 U JP S5646531U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13042779U JPS5646531U (en) | 1979-09-19 | 1979-09-19 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13042779U JPS5646531U (en) | 1979-09-19 | 1979-09-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5646531U true JPS5646531U (en) | 1981-04-25 |
Family
ID=29362128
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13042779U Pending JPS5646531U (en) | 1979-09-19 | 1979-09-19 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5646531U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9177794B2 (en) | 2012-01-13 | 2015-11-03 | Micron Technology, Inc. | Methods of patterning substrates |
US9305782B2 (en) | 2006-07-10 | 2016-04-05 | Micron Technology, Inc. | Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same |
-
1979
- 1979-09-19 JP JP13042779U patent/JPS5646531U/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9305782B2 (en) | 2006-07-10 | 2016-04-05 | Micron Technology, Inc. | Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same |
US9177794B2 (en) | 2012-01-13 | 2015-11-03 | Micron Technology, Inc. | Methods of patterning substrates |