JPS5635765A - Ion plating apparatus for microparts - Google Patents
Ion plating apparatus for micropartsInfo
- Publication number
- JPS5635765A JPS5635765A JP11156079A JP11156079A JPS5635765A JP S5635765 A JPS5635765 A JP S5635765A JP 11156079 A JP11156079 A JP 11156079A JP 11156079 A JP11156079 A JP 11156079A JP S5635765 A JPS5635765 A JP S5635765A
- Authority
- JP
- Japan
- Prior art keywords
- basket
- microparts
- ion plating
- plating apparatus
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/223—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating specially adapted for coating particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To uniformly ion-plate microparts by putting them into a metal basket and installing a means of swinging the basket. CONSTITUTION:Microparts 4 such as wrist watch parts are put into metal basket 3 attached to metal fittings 2 on the top of shaft 1, and in order to apply minus charge, basket 3 is connected to rotating magnet 8 through sliding portion 5, insulating joint 6 and field through collar 7. Magnet 8 is rotated to vertically move both ends of basket 3 around shaft 1 to such a degree that microparts 4 in basket 3 are rolled. Such an apparatus is provided to an ion plating apparatus. Thus, many microparts 4 be plated uniformly with simple structure.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11156079A JPS5635765A (en) | 1979-08-31 | 1979-08-31 | Ion plating apparatus for microparts |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11156079A JPS5635765A (en) | 1979-08-31 | 1979-08-31 | Ion plating apparatus for microparts |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5635765A true JPS5635765A (en) | 1981-04-08 |
Family
ID=14564472
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11156079A Pending JPS5635765A (en) | 1979-08-31 | 1979-08-31 | Ion plating apparatus for microparts |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5635765A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6292309U (en) * | 1985-11-29 | 1987-06-12 | ||
JPH01126410U (en) * | 1988-02-20 | 1989-08-29 | ||
JPH0453053U (en) * | 1990-09-14 | 1992-05-06 |
-
1979
- 1979-08-31 JP JP11156079A patent/JPS5635765A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6292309U (en) * | 1985-11-29 | 1987-06-12 | ||
JPH01126410U (en) * | 1988-02-20 | 1989-08-29 | ||
JPH0453053U (en) * | 1990-09-14 | 1992-05-06 |
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