JPS5623739A - Manufactue of semiconductor element having buried layer - Google Patents
Manufactue of semiconductor element having buried layerInfo
- Publication number
- JPS5623739A JPS5623739A JP9913579A JP9913579A JPS5623739A JP S5623739 A JPS5623739 A JP S5623739A JP 9913579 A JP9913579 A JP 9913579A JP 9913579 A JP9913579 A JP 9913579A JP S5623739 A JPS5623739 A JP S5623739A
- Authority
- JP
- Japan
- Prior art keywords
- type
- layer
- density
- plane
- compensating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02373—Group 14 semiconducting materials
- H01L21/02381—Silicon, silicon germanium, germanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02524—Group 14 semiconducting materials
- H01L21/02532—Silicon, silicon germanium, germanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/0257—Doping during depositing
- H01L21/02573—Conductivity type
- H01L21/02576—N-type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Junction Field-Effect Transistors (AREA)
Abstract
PURPOSE:To obtain the extremely effective buried gate in the semiconductor element by epitaxially growing an n-type compensating layer and a low density n-type layer lower in density than the compensating layer continuously on an i or n<->-type layer and n<+>-type layer buried therein. CONSTITUTION:An i or n<->-type epitaxial layer 2 and an SiO2 film 3 are superimposed on an n<+>-type Si substrate 1, and openings 3a are perforated in striped state. Then, a p<+>-type buried gate 4 is formed thereon, an SiO2 film 5 on the surface is etched, and a thin n-type compensating layer 10 and a low density n-type layer 6 lower in density than the compensating layer 10 are continuously epitaxially grown in vapor phase and laminated. In this case, the vapor phase growing temperature x is located in a plane yz at 1,100 deg.C and 1,150 deg.C, and when the compensating layer 10 is formed under the conditions contained in the region formed by a curved plane including accumulated gas flow amount y=0.9(l/min) in a plane zx and diffusing surface density z=5X10<18>/cm<3> in a plane xy, and definite point A (1,100, 0.90, 1.5X10<19>)-H(1,150, 1.10, 8.5X10<18>), it can prevent the channel inversion and there can be obtained the accurate buried gate layer with preferable reproducibility.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9913579A JPS5623739A (en) | 1979-08-04 | 1979-08-04 | Manufactue of semiconductor element having buried layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9913579A JPS5623739A (en) | 1979-08-04 | 1979-08-04 | Manufactue of semiconductor element having buried layer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5623739A true JPS5623739A (en) | 1981-03-06 |
JPS576685B2 JPS576685B2 (en) | 1982-02-06 |
Family
ID=14239278
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9913579A Granted JPS5623739A (en) | 1979-08-04 | 1979-08-04 | Manufactue of semiconductor element having buried layer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5623739A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6216578A (en) * | 1985-07-15 | 1987-01-24 | Toyo Electric Mfg Co Ltd | Manufacture of semiconductor element substrate with buried layer |
JPH03161248A (en) * | 1989-11-15 | 1991-07-11 | Okuma Mach Works Ltd | Indexing control device for tool rest of nc lathe |
WO2002079551A1 (en) * | 2001-03-30 | 2002-10-10 | Koninklijke Philips Electronics N.V. | Suppression of n-type autodoping in low-temperature si and sige epitaxy |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3660180A (en) * | 1969-02-27 | 1972-05-02 | Ibm | Constrainment of autodoping in epitaxial deposition |
US3669769A (en) * | 1970-09-29 | 1972-06-13 | Ibm | Method for minimizing autodoping in epitaxial deposition |
US3847686A (en) * | 1970-05-27 | 1974-11-12 | Gen Electric | Method of forming silicon epitaxial layers |
JPS53135571A (en) * | 1977-05-02 | 1978-11-27 | Hitachi Ltd | Vapor phase growth method for semiconductor |
-
1979
- 1979-08-04 JP JP9913579A patent/JPS5623739A/en active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3660180A (en) * | 1969-02-27 | 1972-05-02 | Ibm | Constrainment of autodoping in epitaxial deposition |
US3847686A (en) * | 1970-05-27 | 1974-11-12 | Gen Electric | Method of forming silicon epitaxial layers |
US3669769A (en) * | 1970-09-29 | 1972-06-13 | Ibm | Method for minimizing autodoping in epitaxial deposition |
JPS53135571A (en) * | 1977-05-02 | 1978-11-27 | Hitachi Ltd | Vapor phase growth method for semiconductor |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6216578A (en) * | 1985-07-15 | 1987-01-24 | Toyo Electric Mfg Co Ltd | Manufacture of semiconductor element substrate with buried layer |
JPH03161248A (en) * | 1989-11-15 | 1991-07-11 | Okuma Mach Works Ltd | Indexing control device for tool rest of nc lathe |
WO2002079551A1 (en) * | 2001-03-30 | 2002-10-10 | Koninklijke Philips Electronics N.V. | Suppression of n-type autodoping in low-temperature si and sige epitaxy |
US6838359B2 (en) | 2001-03-30 | 2005-01-04 | Koninklijke Philips Electronics N.V. | Suppression of n-type autodoping in low-temperature Si and SiGe epitaxy |
Also Published As
Publication number | Publication date |
---|---|
JPS576685B2 (en) | 1982-02-06 |
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