JPS56150827A - Inspection device for abnormality of mask - Google Patents
Inspection device for abnormality of maskInfo
- Publication number
- JPS56150827A JPS56150827A JP5414180A JP5414180A JPS56150827A JP S56150827 A JPS56150827 A JP S56150827A JP 5414180 A JP5414180 A JP 5414180A JP 5414180 A JP5414180 A JP 5414180A JP S56150827 A JPS56150827 A JP S56150827A
- Authority
- JP
- Japan
- Prior art keywords
- foreign substance
- mask
- section
- light
- substance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
PURPOSE:To enable to perform, without fail, the inspection and removal of the foreign substance on the surface of the mask by a method wherein the mask supporting section, the foreign substance inspecting section where the foreign substance on the substrate surface is inspected and the foreign substance removing device, through which the foreign substance is discharged to outside, are formed. CONSTITUTION:The mask 3, having the prescribed pattern film 16 on the surface of its substrate, is partially inserted to the aperture section provided on the light irradiating section 6 to be used for inspection of a flaw on the mask, and is supported by a plate-spring 17. Then, the light of a lamp 20 is irradiated from above diagonally on the substrate surface of the mask 3. In this case, if there exists a foreign substance 24 such as dust or dirt on the surface of the pattern film 16, the section having dust or dirt is seen brightly because the light is irregularly reflected at the spot having the foreign substance, and the existence of the foreign substance can be inspected without fail. When the foreign substance is detected through said procedures, the substance is removed from the surface of the mask 3 by injecting N2 gas from an N2 gas piping. At the same time, the flown-off foreign substance is sucked into an exhaust pipe by the aid of the sucking force of the exhaust pipe and then discharged to outside.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5414180A JPS56150827A (en) | 1980-04-25 | 1980-04-25 | Inspection device for abnormality of mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5414180A JPS56150827A (en) | 1980-04-25 | 1980-04-25 | Inspection device for abnormality of mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56150827A true JPS56150827A (en) | 1981-11-21 |
Family
ID=12962277
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5414180A Pending JPS56150827A (en) | 1980-04-25 | 1980-04-25 | Inspection device for abnormality of mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56150827A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6124232A (en) * | 1984-07-13 | 1986-02-01 | Hitachi Ltd | Pattern inspecting method |
JPS6211132A (en) * | 1985-07-04 | 1987-01-20 | Hitachi Electronics Eng Co Ltd | Apparatus for inspecting foreign matter |
US6327021B1 (en) | 1998-07-06 | 2001-12-04 | Mitsubishi Denki Kabushiki Kaisha | Mask inspection system and method of manufacturing semiconductor device |
KR100465710B1 (en) * | 2002-10-01 | 2005-01-13 | 엘지전자 주식회사 | inspect device and its method of photomask |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4888982A (en) * | 1972-02-23 | 1973-11-21 | ||
JPS5212565A (en) * | 1975-07-21 | 1977-01-31 | Hitachi Ltd | Sample cleaning device |
JPS5355983A (en) * | 1976-10-31 | 1978-05-20 | Konishiroku Photo Ind Co Ltd | Automatic micro defect detector |
JPS55102233A (en) * | 1979-01-30 | 1980-08-05 | Matsushita Electric Ind Co Ltd | Removing method of dust |
-
1980
- 1980-04-25 JP JP5414180A patent/JPS56150827A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4888982A (en) * | 1972-02-23 | 1973-11-21 | ||
JPS5212565A (en) * | 1975-07-21 | 1977-01-31 | Hitachi Ltd | Sample cleaning device |
JPS5355983A (en) * | 1976-10-31 | 1978-05-20 | Konishiroku Photo Ind Co Ltd | Automatic micro defect detector |
JPS55102233A (en) * | 1979-01-30 | 1980-08-05 | Matsushita Electric Ind Co Ltd | Removing method of dust |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6124232A (en) * | 1984-07-13 | 1986-02-01 | Hitachi Ltd | Pattern inspecting method |
JPS6211132A (en) * | 1985-07-04 | 1987-01-20 | Hitachi Electronics Eng Co Ltd | Apparatus for inspecting foreign matter |
US6327021B1 (en) | 1998-07-06 | 2001-12-04 | Mitsubishi Denki Kabushiki Kaisha | Mask inspection system and method of manufacturing semiconductor device |
KR100465710B1 (en) * | 2002-10-01 | 2005-01-13 | 엘지전자 주식회사 | inspect device and its method of photomask |
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