JPS56144538A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS56144538A
JPS56144538A JP4678880A JP4678880A JPS56144538A JP S56144538 A JPS56144538 A JP S56144538A JP 4678880 A JP4678880 A JP 4678880A JP 4678880 A JP4678880 A JP 4678880A JP S56144538 A JPS56144538 A JP S56144538A
Authority
JP
Japan
Prior art keywords
etching
semiconductor device
hours
photoresist
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4678880A
Other languages
Japanese (ja)
Inventor
Hiroshi Misawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Denshi KK
Original Assignee
Hitachi Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Denshi KK filed Critical Hitachi Denshi KK
Priority to JP4678880A priority Critical patent/JPS56144538A/en
Publication of JPS56144538A publication Critical patent/JPS56144538A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To prevent the exfoliation of a photoresist even if a semiconductor device is left for hours by performing the first etching for post baking wherein light etching is applied after leaving the semiconductor device for hours. CONSTITUTION:The following are finished with continuous work: 1; wafer washing, 2; driving, 3; photoresist application, 4; prebaking, 5; allignment, 6; development and fixing, 7; post baking, 8; etching, 9; post etching. After that, a semiconductor device is left for hours and 10; light etching is executed. The etching hours at this light etching is very short comparing with the etching hours for the 8. Therefore, the photoresist will not be exfoliated and a side etching phenomenon or the like will not occur. In this way, if the semiconductor device is left for 24hr, deterioration that the adhesive intensity of photoresist, the wafer surface becomes weak and the occurrence of abnormal phenomena can be prevented.
JP4678880A 1980-04-11 1980-04-11 Manufacture of semiconductor device Pending JPS56144538A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4678880A JPS56144538A (en) 1980-04-11 1980-04-11 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4678880A JPS56144538A (en) 1980-04-11 1980-04-11 Manufacture of semiconductor device

Publications (1)

Publication Number Publication Date
JPS56144538A true JPS56144538A (en) 1981-11-10

Family

ID=12757062

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4678880A Pending JPS56144538A (en) 1980-04-11 1980-04-11 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS56144538A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62241333A (en) * 1986-04-11 1987-10-22 Rohm Co Ltd Manufacture of semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62241333A (en) * 1986-04-11 1987-10-22 Rohm Co Ltd Manufacture of semiconductor device

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