JPS56144538A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS56144538A JPS56144538A JP4678880A JP4678880A JPS56144538A JP S56144538 A JPS56144538 A JP S56144538A JP 4678880 A JP4678880 A JP 4678880A JP 4678880 A JP4678880 A JP 4678880A JP S56144538 A JPS56144538 A JP S56144538A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- semiconductor device
- hours
- photoresist
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 5
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000005530 etching Methods 0.000 abstract 9
- 229920002120 photoresistant polymer Polymers 0.000 abstract 4
- 230000002159 abnormal effect Effects 0.000 abstract 1
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 230000006866 deterioration Effects 0.000 abstract 1
- 238000004299 exfoliation Methods 0.000 abstract 1
- 238000005406 washing Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE:To prevent the exfoliation of a photoresist even if a semiconductor device is left for hours by performing the first etching for post baking wherein light etching is applied after leaving the semiconductor device for hours. CONSTITUTION:The following are finished with continuous work: 1; wafer washing, 2; driving, 3; photoresist application, 4; prebaking, 5; allignment, 6; development and fixing, 7; post baking, 8; etching, 9; post etching. After that, a semiconductor device is left for hours and 10; light etching is executed. The etching hours at this light etching is very short comparing with the etching hours for the 8. Therefore, the photoresist will not be exfoliated and a side etching phenomenon or the like will not occur. In this way, if the semiconductor device is left for 24hr, deterioration that the adhesive intensity of photoresist, the wafer surface becomes weak and the occurrence of abnormal phenomena can be prevented.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4678880A JPS56144538A (en) | 1980-04-11 | 1980-04-11 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4678880A JPS56144538A (en) | 1980-04-11 | 1980-04-11 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56144538A true JPS56144538A (en) | 1981-11-10 |
Family
ID=12757062
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4678880A Pending JPS56144538A (en) | 1980-04-11 | 1980-04-11 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56144538A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62241333A (en) * | 1986-04-11 | 1987-10-22 | Rohm Co Ltd | Manufacture of semiconductor device |
-
1980
- 1980-04-11 JP JP4678880A patent/JPS56144538A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62241333A (en) * | 1986-04-11 | 1987-10-22 | Rohm Co Ltd | Manufacture of semiconductor device |
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