JPS56139533A - Enhancement of heat resistance of polyphenylsilsesquioxane - Google Patents

Enhancement of heat resistance of polyphenylsilsesquioxane

Info

Publication number
JPS56139533A
JPS56139533A JP4284180A JP4284180A JPS56139533A JP S56139533 A JPS56139533 A JP S56139533A JP 4284180 A JP4284180 A JP 4284180A JP 4284180 A JP4284180 A JP 4284180A JP S56139533 A JPS56139533 A JP S56139533A
Authority
JP
Japan
Prior art keywords
polyphenylsilsesquioxane
heat resistance
enhancement
polymer
distribution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4284180A
Other languages
Japanese (ja)
Inventor
Kinya Eguchi
Yutaka Hiratsuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4284180A priority Critical patent/JPS56139533A/en
Publication of JPS56139533A publication Critical patent/JPS56139533A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To obtain a polyphenylsilsesquioxane with excellent heat resistance, by depositing a polymer of specified MW from a solution of a polyphenylsilsesquioxane widely ranging in MW distribution.
CONSTITUTION: A polyphenylsilsesquioxane of the formula widely ranging in MW distribution is dissolved in an org. solvent (e.g., benzene or methylene chloride). The resulting solution is filtered after a polymer of MW≥100,000 is selectively deposited as a precipitate by the addition of acetone, to obtain a polyphenylsilsesquioxane with high heat resistance.
USE: A material for the tip-coating membrane of a semiconductor device sealed with a ceramic.
COPYRIGHT: (C)1981,JPO&Japio
JP4284180A 1980-04-03 1980-04-03 Enhancement of heat resistance of polyphenylsilsesquioxane Pending JPS56139533A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4284180A JPS56139533A (en) 1980-04-03 1980-04-03 Enhancement of heat resistance of polyphenylsilsesquioxane

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4284180A JPS56139533A (en) 1980-04-03 1980-04-03 Enhancement of heat resistance of polyphenylsilsesquioxane

Publications (1)

Publication Number Publication Date
JPS56139533A true JPS56139533A (en) 1981-10-31

Family

ID=12647208

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4284180A Pending JPS56139533A (en) 1980-04-03 1980-04-03 Enhancement of heat resistance of polyphenylsilsesquioxane

Country Status (1)

Country Link
JP (1) JPS56139533A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0112168A2 (en) * 1982-12-16 1984-06-27 Fujitsu Limited Silicone-type coating resin solution and its preparation
US6177199B1 (en) 1999-01-07 2001-01-23 Alliedsignal Inc. Dielectric films from organohydridosiloxane resins with low organic content
US6218020B1 (en) 1999-01-07 2001-04-17 Alliedsignal Inc. Dielectric films from organohydridosiloxane resins with high organic content
US6218497B1 (en) 1997-04-21 2001-04-17 Alliedsignal Inc. Organohydridosiloxane resins with low organic content

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0112168A2 (en) * 1982-12-16 1984-06-27 Fujitsu Limited Silicone-type coating resin solution and its preparation
US6218497B1 (en) 1997-04-21 2001-04-17 Alliedsignal Inc. Organohydridosiloxane resins with low organic content
US6177199B1 (en) 1999-01-07 2001-01-23 Alliedsignal Inc. Dielectric films from organohydridosiloxane resins with low organic content
US6218020B1 (en) 1999-01-07 2001-04-17 Alliedsignal Inc. Dielectric films from organohydridosiloxane resins with high organic content

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