JPS56128941A - Resin composition for positive type resist - Google Patents
Resin composition for positive type resistInfo
- Publication number
- JPS56128941A JPS56128941A JP3242880A JP3242880A JPS56128941A JP S56128941 A JPS56128941 A JP S56128941A JP 3242880 A JP3242880 A JP 3242880A JP 3242880 A JP3242880 A JP 3242880A JP S56128941 A JPS56128941 A JP S56128941A
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- temp
- positive type
- type resist
- reactivity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
Abstract
PURPOSE:To obtain a resist of high resolution and high sensitivity by mixing a polymer A which causes thermal crosslinking in a specific temp. range, and a polymer B which has good compatibility with the polymer A while having no reactivity at said temp. within a specific weight ratio range. CONSTITUTION:The polymer A of which the number average mol.wt. (MN) through polystyrene conversion by a gel permeation chromatography method is between 10,000-1,000,000 and which crosslinks at 100-250 deg.C is obtained as a copolymer with methacrylate, for example, glycidyl methacrylate. On the other hand, the composition prepd. by dissolving the polymer B or copolymer of polymethacrylate etc. which has no reactivity at the above-mentioned temp., has good compatibility with the polymer A and of which the MN by said method is 10,000- 1,000,000 and the polymer A in a good solvent at the ratios expressed by the formula is used as the positive type resist. This yields the composition having excellent adhesiveness to substrates, etching resistance, heat resistance, etc.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3242880A JPS56128941A (en) | 1980-03-14 | 1980-03-14 | Resin composition for positive type resist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3242880A JPS56128941A (en) | 1980-03-14 | 1980-03-14 | Resin composition for positive type resist |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56128941A true JPS56128941A (en) | 1981-10-08 |
Family
ID=12358676
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3242880A Pending JPS56128941A (en) | 1980-03-14 | 1980-03-14 | Resin composition for positive type resist |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56128941A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58116532A (en) * | 1981-12-29 | 1983-07-11 | Fujitsu Ltd | Pattern formation |
JPS63165844A (en) * | 1986-12-27 | 1988-07-09 | Terumo Corp | Resist material |
JP2008095087A (en) * | 2006-09-15 | 2008-04-24 | Mitsubishi Rayon Co Ltd | Polymer, method for producing the same, resist composition, and its application |
-
1980
- 1980-03-14 JP JP3242880A patent/JPS56128941A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58116532A (en) * | 1981-12-29 | 1983-07-11 | Fujitsu Ltd | Pattern formation |
JPH0262859B2 (en) * | 1981-12-29 | 1990-12-26 | Fujitsu Ltd | |
JPS63165844A (en) * | 1986-12-27 | 1988-07-09 | Terumo Corp | Resist material |
JP2008095087A (en) * | 2006-09-15 | 2008-04-24 | Mitsubishi Rayon Co Ltd | Polymer, method for producing the same, resist composition, and its application |
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