JPS5575945A - Optical fiber coating method - Google Patents
Optical fiber coating methodInfo
- Publication number
- JPS5575945A JPS5575945A JP15194779A JP15194779A JPS5575945A JP S5575945 A JPS5575945 A JP S5575945A JP 15194779 A JP15194779 A JP 15194779A JP 15194779 A JP15194779 A JP 15194779A JP S5575945 A JPS5575945 A JP S5575945A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- reaction
- optical fiber
- opening
- fiber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To continuously form a film round an optical fiber at a high speed by introducing inert gas into isolation chambers connecting to both ends of a reaction chamber; feeding reaction gases into the reaction chamber; heating them to induce chemical reaction; and contacting the reaction product to the optical fiber continuously passing through the reaction chamber in continuous coating of the fiber by a chemical vapor phase deposition method.
CONSTITUTION: Inert gas is introduced from inlets 18, 19 into isolation chambers 12, 16 isolating reaction chamber 14 from the surrounding air. Optical fiber 10 is continuously sent into chamber 12 chrough opening 11, coated in chamber 14 as follows, and drawn out through opening 15, chamber 16 and opening 17: reaction gases, e.g. NH3 and silane accompanied by carrier gas N2 are introduced into chamber 14 from inlet 20 and heated with heating coil 22 to induce chemical reaction, thereby forming a film of several ÅW1000Å or more in thickness on the surface of fiber 10.
COPYRIGHT: (C)1980,JPO&Japio
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US96324278A | 1978-11-24 | 1978-11-24 | |
US963242 | 2004-10-12 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5575945A true JPS5575945A (en) | 1980-06-07 |
JPS6025381B2 JPS6025381B2 (en) | 1985-06-18 |
Family
ID=25506963
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP54151947A Expired JPS6025381B2 (en) | 1978-11-24 | 1979-11-22 | Optical fiber coating furnace |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6025381B2 (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57209845A (en) * | 1981-06-18 | 1982-12-23 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of optical fiber |
JPS58110031U (en) * | 1982-10-12 | 1983-07-27 | 株式会社フジクラ | Optical fiber reinforcement device |
JPS61292607A (en) * | 1985-06-17 | 1986-12-23 | アルカテル・エヌ・ブイ | Glass fiber coated at high temperature |
JPH0274542A (en) * | 1988-04-07 | 1990-03-14 | Sumitomo Electric Ind Ltd | Optical fiber coater |
JPH03285848A (en) * | 1990-04-02 | 1991-12-17 | Hitachi Cable Ltd | Manufacture of carbon coating fiber |
JP2006513126A (en) * | 2003-01-23 | 2006-04-20 | スリーエム イノベイティブ プロパティズ カンパニー | Plasma reactor including a spiral electrode |
-
1979
- 1979-11-22 JP JP54151947A patent/JPS6025381B2/en not_active Expired
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57209845A (en) * | 1981-06-18 | 1982-12-23 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of optical fiber |
JPH0366271B2 (en) * | 1981-06-18 | 1991-10-16 | Nippon Denshin Denwa Kk | |
JPS58110031U (en) * | 1982-10-12 | 1983-07-27 | 株式会社フジクラ | Optical fiber reinforcement device |
JPS61292607A (en) * | 1985-06-17 | 1986-12-23 | アルカテル・エヌ・ブイ | Glass fiber coated at high temperature |
JPH0274542A (en) * | 1988-04-07 | 1990-03-14 | Sumitomo Electric Ind Ltd | Optical fiber coater |
JPH03285848A (en) * | 1990-04-02 | 1991-12-17 | Hitachi Cable Ltd | Manufacture of carbon coating fiber |
JP2006513126A (en) * | 2003-01-23 | 2006-04-20 | スリーエム イノベイティブ プロパティズ カンパニー | Plasma reactor including a spiral electrode |
Also Published As
Publication number | Publication date |
---|---|
JPS6025381B2 (en) | 1985-06-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4854263B1 (en) | Inlet manifold and methods for increasing gas dissociation and for PECVD of dielectric films | |
TW362118B (en) | Method for depositing amorphous SiNC coatings | |
ES8500874A1 (en) | Chemical vapor deposition of titanium nitride and like films. | |
AU538152B2 (en) | Chemical vapour deposition apparatus and process | |
ES457596A1 (en) | Process of forming a metal or metal compound coating on a face of a glass substrate and apparatus suitable for use in forming such coating | |
MY107107A (en) | Method for preparing vaporized reactants for chemical vapor deposition. | |
TW331652B (en) | Thin film vapor deposition apparatus | |
TW328971B (en) | Method for depositing Si-O containing coatings | |
EP0371796A3 (en) | Apparatus and process for chemical vapor deposition | |
JPS5772318A (en) | Vapor growth method | |
KR870000750A (en) | How to chemically vapor coat a silicon dioxide film | |
JPS5575945A (en) | Optical fiber coating method | |
ES2009963A6 (en) | Apparatus for coating a substrate. | |
JPS57123969A (en) | Formation of zinc oxide film by vapor phase method using plasma | |
JPS5767009A (en) | Formation of film | |
JPS55164072A (en) | Coating | |
JPS5351187A (en) | Gas phase chemical evaporation apparatus | |
JPS54123599A (en) | Forming method for silicon nitride film | |
JPS55102237A (en) | Method and apparatus for plasma processing | |
JPS6447018A (en) | Vapor growth device | |
JPS5751139A (en) | Preparation of base material for optical fiber | |
JPS54106081A (en) | Growth method in vapor phase | |
JPS6428295A (en) | Vapor growth process and apparatus therefor | |
JPS6473078A (en) | C.v.d. device | |
JPS5485274A (en) | Surface-hardened resin |