JPS5571311A - Vibrator - Google Patents
VibratorInfo
- Publication number
- JPS5571311A JPS5571311A JP14501678A JP14501678A JPS5571311A JP S5571311 A JPS5571311 A JP S5571311A JP 14501678 A JP14501678 A JP 14501678A JP 14501678 A JP14501678 A JP 14501678A JP S5571311 A JPS5571311 A JP S5571311A
- Authority
- JP
- Japan
- Prior art keywords
- vibration
- adhere
- thin film
- side face
- tuning fork
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 abstract 4
- 239000010409 thin film Substances 0.000 abstract 4
- 239000011521 glass Substances 0.000 abstract 3
- 238000004544 sputter deposition Methods 0.000 abstract 2
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/21—Crystal tuning forks
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Abstract
PURPOSE:To make it possible to obtain a small-size superior tuning fork vibration characteristic by causing a ZnO thin film to adhere to the arm part side face, which is the main vibration part of a tuning fork vibration piece, and causing a glass material to adhere to the base part side face. CONSTITUTION:Tuning fork vibration piece 1 consists of an elinver material, and ZnO thin film 2 is caused to adhere to the arm part side face, which constitutes the main vibration part of vibration piece 1, by sputtering, etc., and glass material 4 is caused to adhere to the base part side face by sputtering, etc., and exciting electrode 3 is arranged on thin film 2 and glass material 4. Thus, needless vibration is not generated because thin film 3 is not arranged in the turning fork base part, so that a small-size and superior tuning fork vibration characteristic can be obtained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14501678A JPS5571311A (en) | 1978-11-24 | 1978-11-24 | Vibrator |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14501678A JPS5571311A (en) | 1978-11-24 | 1978-11-24 | Vibrator |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5571311A true JPS5571311A (en) | 1980-05-29 |
Family
ID=15375478
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14501678A Pending JPS5571311A (en) | 1978-11-24 | 1978-11-24 | Vibrator |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5571311A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6947519B2 (en) | 2000-09-18 | 2005-09-20 | Canon Kabushiki Kaisha | X-ray exposure apparatus and method, semiconductor manufacturing apparatus, and microstructure |
US6947518B2 (en) | 1999-05-28 | 2005-09-20 | Mitsubishi Denki Kabushiki Kaisha | X-ray exposure apparatus, X-ray exposure method, X-ray mask, X-ray mirror, synchrotron radiation apparatus, synchrotron radiation method and semiconductor device |
-
1978
- 1978-11-24 JP JP14501678A patent/JPS5571311A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6947518B2 (en) | 1999-05-28 | 2005-09-20 | Mitsubishi Denki Kabushiki Kaisha | X-ray exposure apparatus, X-ray exposure method, X-ray mask, X-ray mirror, synchrotron radiation apparatus, synchrotron radiation method and semiconductor device |
US6947519B2 (en) | 2000-09-18 | 2005-09-20 | Canon Kabushiki Kaisha | X-ray exposure apparatus and method, semiconductor manufacturing apparatus, and microstructure |
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