JPS5571311A - Vibrator - Google Patents

Vibrator

Info

Publication number
JPS5571311A
JPS5571311A JP14501678A JP14501678A JPS5571311A JP S5571311 A JPS5571311 A JP S5571311A JP 14501678 A JP14501678 A JP 14501678A JP 14501678 A JP14501678 A JP 14501678A JP S5571311 A JPS5571311 A JP S5571311A
Authority
JP
Japan
Prior art keywords
vibration
adhere
thin film
side face
tuning fork
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14501678A
Other languages
Japanese (ja)
Inventor
Seiji Higashichi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP14501678A priority Critical patent/JPS5571311A/en
Publication of JPS5571311A publication Critical patent/JPS5571311A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/15Constructional features of resonators consisting of piezoelectric or electrostrictive material
    • H03H9/21Crystal tuning forks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)

Abstract

PURPOSE:To make it possible to obtain a small-size superior tuning fork vibration characteristic by causing a ZnO thin film to adhere to the arm part side face, which is the main vibration part of a tuning fork vibration piece, and causing a glass material to adhere to the base part side face. CONSTITUTION:Tuning fork vibration piece 1 consists of an elinver material, and ZnO thin film 2 is caused to adhere to the arm part side face, which constitutes the main vibration part of vibration piece 1, by sputtering, etc., and glass material 4 is caused to adhere to the base part side face by sputtering, etc., and exciting electrode 3 is arranged on thin film 2 and glass material 4. Thus, needless vibration is not generated because thin film 3 is not arranged in the turning fork base part, so that a small-size and superior tuning fork vibration characteristic can be obtained.
JP14501678A 1978-11-24 1978-11-24 Vibrator Pending JPS5571311A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14501678A JPS5571311A (en) 1978-11-24 1978-11-24 Vibrator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14501678A JPS5571311A (en) 1978-11-24 1978-11-24 Vibrator

Publications (1)

Publication Number Publication Date
JPS5571311A true JPS5571311A (en) 1980-05-29

Family

ID=15375478

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14501678A Pending JPS5571311A (en) 1978-11-24 1978-11-24 Vibrator

Country Status (1)

Country Link
JP (1) JPS5571311A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6947519B2 (en) 2000-09-18 2005-09-20 Canon Kabushiki Kaisha X-ray exposure apparatus and method, semiconductor manufacturing apparatus, and microstructure
US6947518B2 (en) 1999-05-28 2005-09-20 Mitsubishi Denki Kabushiki Kaisha X-ray exposure apparatus, X-ray exposure method, X-ray mask, X-ray mirror, synchrotron radiation apparatus, synchrotron radiation method and semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6947518B2 (en) 1999-05-28 2005-09-20 Mitsubishi Denki Kabushiki Kaisha X-ray exposure apparatus, X-ray exposure method, X-ray mask, X-ray mirror, synchrotron radiation apparatus, synchrotron radiation method and semiconductor device
US6947519B2 (en) 2000-09-18 2005-09-20 Canon Kabushiki Kaisha X-ray exposure apparatus and method, semiconductor manufacturing apparatus, and microstructure

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