JPS5564233A - Peeling solution for positive type photoresist - Google Patents
Peeling solution for positive type photoresistInfo
- Publication number
- JPS5564233A JPS5564233A JP13624778A JP13624778A JPS5564233A JP S5564233 A JPS5564233 A JP S5564233A JP 13624778 A JP13624778 A JP 13624778A JP 13624778 A JP13624778 A JP 13624778A JP S5564233 A JPS5564233 A JP S5564233A
- Authority
- JP
- Japan
- Prior art keywords
- peeling solution
- positive type
- type photoresist
- trichloro
- ethylene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13624778A JPS5564233A (en) | 1978-11-07 | 1978-11-07 | Peeling solution for positive type photoresist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13624778A JPS5564233A (en) | 1978-11-07 | 1978-11-07 | Peeling solution for positive type photoresist |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5564233A true JPS5564233A (en) | 1980-05-14 |
Family
ID=15170719
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13624778A Pending JPS5564233A (en) | 1978-11-07 | 1978-11-07 | Peeling solution for positive type photoresist |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5564233A (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0095171A2 (en) * | 1982-05-24 | 1983-11-30 | Daikin Kogyo Co., Ltd. | Composition for cleaning surface of substrate |
JPS59232154A (ja) * | 1983-06-15 | 1984-12-26 | Toagosei Chem Ind Co Ltd | レジストインク洗浄用組成物 |
US5824604A (en) * | 1996-01-23 | 1998-10-20 | Mattson Technology, Inc. | Hydrocarbon-enhanced dry stripping of photoresist |
US6379576B2 (en) | 1997-11-17 | 2002-04-30 | Mattson Technology, Inc. | Systems and methods for variable mode plasma enhanced processing of semiconductor wafers |
-
1978
- 1978-11-07 JP JP13624778A patent/JPS5564233A/ja active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0095171A2 (en) * | 1982-05-24 | 1983-11-30 | Daikin Kogyo Co., Ltd. | Composition for cleaning surface of substrate |
JPS59232154A (ja) * | 1983-06-15 | 1984-12-26 | Toagosei Chem Ind Co Ltd | レジストインク洗浄用組成物 |
JPH0244343B2 (ja) * | 1983-06-15 | 1990-10-03 | Toa Gosei Chem Ind | |
US5824604A (en) * | 1996-01-23 | 1998-10-20 | Mattson Technology, Inc. | Hydrocarbon-enhanced dry stripping of photoresist |
US6379576B2 (en) | 1997-11-17 | 2002-04-30 | Mattson Technology, Inc. | Systems and methods for variable mode plasma enhanced processing of semiconductor wafers |
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