JPS5538966A - Nitriding method for titanium and titanium alloy - Google Patents

Nitriding method for titanium and titanium alloy

Info

Publication number
JPS5538966A
JPS5538966A JP11221478A JP11221478A JPS5538966A JP S5538966 A JPS5538966 A JP S5538966A JP 11221478 A JP11221478 A JP 11221478A JP 11221478 A JP11221478 A JP 11221478A JP S5538966 A JPS5538966 A JP S5538966A
Authority
JP
Japan
Prior art keywords
powder
oxygen
parts
alloy
nitrogen gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11221478A
Other languages
Japanese (ja)
Inventor
Katsumi Muroi
Hideo Nakae
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11221478A priority Critical patent/JPS5538966A/en
Publication of JPS5538966A publication Critical patent/JPS5538966A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/24—Nitriding

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)

Abstract

PURPOSE:To form excellent nitride layer without formation of oxide coating, by nitriding Ti or Ti alloy with usual nitrogen after filling a metal powder, which possesses affinity to oxygen of the same degree as that of Ti, around the Ti or Ti alloy. CONSTITUTION:Parts 2 to be nitrided made of Ti metal or Ti alloy such as Ti-6Al- 4V etc. are previously put into a pipe 4, and Ti powder of 100 mesh is filled to the space around the parts 2. For the Ti powder is used a powder previously nitrided to TiN. At the inlet of the reaction pipe 4 is packed fresh Ti powder 3. The pipe is heated to 850 deg.C while introducing usual nitrogen gas contg. very small amount of oxygen for 20hrs. to nitride the surface of the parts 2. The small amount of oxygen is consumed for the reaction with Ti powder 3 to form TiO2, consequently the nitrogen gas which nitrides the surface of the parts 2 contains no oxygen, so that nitride layer is formed by use of inexpensive usual nitrogen gas.
JP11221478A 1978-09-14 1978-09-14 Nitriding method for titanium and titanium alloy Pending JPS5538966A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11221478A JPS5538966A (en) 1978-09-14 1978-09-14 Nitriding method for titanium and titanium alloy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11221478A JPS5538966A (en) 1978-09-14 1978-09-14 Nitriding method for titanium and titanium alloy

Publications (1)

Publication Number Publication Date
JPS5538966A true JPS5538966A (en) 1980-03-18

Family

ID=14581102

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11221478A Pending JPS5538966A (en) 1978-09-14 1978-09-14 Nitriding method for titanium and titanium alloy

Country Status (1)

Country Link
JP (1) JPS5538966A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57118015A (en) * 1981-01-16 1982-07-22 Fuji Photo Film Co Ltd Manufacture of amorphous silicon
JPS5837652A (en) * 1981-08-11 1983-03-04 Konishiroku Photo Ind Co Ltd Electrostatic image developing toner
JPS63241156A (en) * 1988-03-12 1988-10-06 Ohara:Kk Nitriding treatment for titanium product
JPH02120282A (en) * 1988-10-29 1990-05-08 Univ Osaka Production of nitride ceramics molding having arbitrary shape
WO2013090987A1 (en) * 2011-12-22 2013-06-27 The University Of Queensland Method of treatment

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57118015A (en) * 1981-01-16 1982-07-22 Fuji Photo Film Co Ltd Manufacture of amorphous silicon
JPS5837652A (en) * 1981-08-11 1983-03-04 Konishiroku Photo Ind Co Ltd Electrostatic image developing toner
JPS63241156A (en) * 1988-03-12 1988-10-06 Ohara:Kk Nitriding treatment for titanium product
JPH02120282A (en) * 1988-10-29 1990-05-08 Univ Osaka Production of nitride ceramics molding having arbitrary shape
JPH0541593B2 (en) * 1988-10-29 1993-06-23 Osaka Daigakucho
WO2013090987A1 (en) * 2011-12-22 2013-06-27 The University Of Queensland Method of treatment

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