JPS5535373A - Photosensitive resin composition for screen process - Google Patents

Photosensitive resin composition for screen process

Info

Publication number
JPS5535373A
JPS5535373A JP10875078A JP10875078A JPS5535373A JP S5535373 A JPS5535373 A JP S5535373A JP 10875078 A JP10875078 A JP 10875078A JP 10875078 A JP10875078 A JP 10875078A JP S5535373 A JPS5535373 A JP S5535373A
Authority
JP
Japan
Prior art keywords
high molecular
molecular latex
water
resin composition
monomer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10875078A
Other languages
Japanese (ja)
Inventor
Tomoo Funkawa
Nobuyoshi Miyata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kansai Paint Co Ltd
Original Assignee
Kansai Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kansai Paint Co Ltd filed Critical Kansai Paint Co Ltd
Priority to JP10875078A priority Critical patent/JPS5535373A/en
Publication of JPS5535373A publication Critical patent/JPS5535373A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To enhance the screen coating properties, physical and chemical properties (e.g. water resistance), by using high molecular latex.
CONSTITUTION: A photosensitive resin composition for screen process is formed by dispersing and dissolving photosensitizing agent and, if necessary, crosslinkable oligomer into an alkaline water-soluble high molecular latex obtained by reacting unsaturated epoxy monomer with water disperse high molecular latex solution possessing acid radical and amideradical. the water disperse high molecular latex possessing acid radical and amide radical is prepared by various known emulsion polymerization methods, using, e.g., unsaturated amide monomer, unsaturated acid monomer, and, if necessary, one or more than one kind of vinyl monomers which are copolymerizable therewith.
COPYRIGHT: (C)1980,JPO&Japio
JP10875078A 1978-09-04 1978-09-04 Photosensitive resin composition for screen process Pending JPS5535373A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10875078A JPS5535373A (en) 1978-09-04 1978-09-04 Photosensitive resin composition for screen process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10875078A JPS5535373A (en) 1978-09-04 1978-09-04 Photosensitive resin composition for screen process

Publications (1)

Publication Number Publication Date
JPS5535373A true JPS5535373A (en) 1980-03-12

Family

ID=14492549

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10875078A Pending JPS5535373A (en) 1978-09-04 1978-09-04 Photosensitive resin composition for screen process

Country Status (1)

Country Link
JP (1) JPS5535373A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59147346A (en) * 1983-02-10 1984-08-23 Nippon Soda Co Ltd Acid-developable polybutadiene type photosensitive resin
JPS6264814A (en) * 1985-09-17 1987-03-23 Japan Synthetic Rubber Co Ltd Production of copolymer
WO2002033013A1 (en) * 2000-10-14 2002-04-25 Avecia B.V. Polymeric aqueous coating compositions
WO2002033012A3 (en) * 2000-10-14 2003-03-13 Avecia Bv Aqueous vinyl polymer coating compositions

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59147346A (en) * 1983-02-10 1984-08-23 Nippon Soda Co Ltd Acid-developable polybutadiene type photosensitive resin
JPS6264814A (en) * 1985-09-17 1987-03-23 Japan Synthetic Rubber Co Ltd Production of copolymer
WO2002033013A1 (en) * 2000-10-14 2002-04-25 Avecia B.V. Polymeric aqueous coating compositions
WO2002033012A3 (en) * 2000-10-14 2003-03-13 Avecia Bv Aqueous vinyl polymer coating compositions
US7223813B2 (en) 2000-10-14 2007-05-29 Dsm Ip Assets B.V. Aqueous vinyl polymer coating compositions

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