JPS5534205A - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- JPS5534205A JPS5534205A JP10492778A JP10492778A JPS5534205A JP S5534205 A JPS5534205 A JP S5534205A JP 10492778 A JP10492778 A JP 10492778A JP 10492778 A JP10492778 A JP 10492778A JP S5534205 A JPS5534205 A JP S5534205A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive composition
- maleic acid
- vinyl ether
- acid copolymer
- high polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
Abstract
PURPOSE: A photosensitive composition free from causing discoloration and precipitation even stored as a solution in a solvent, comprising an aromatic diazonium salt and a methyl vinyl ether-maleic acid copolymer.
CONSTITUTION: A composition comprising (A) an aromatic diazonium salt and (B) 0.5W50wt%, preferably 1W40wt%, based on (A) of a methyl vinyl ether- maleic acid copolymer, and, if necessary, 0.5W450wt% based on (A) of another organic high polymer for improving the coating performance when formed into a coating material. Hydroxypropyl methyl cellulose, acacia, polyvinyl alcohol, polyacrylamide, etc. may be cited as the high polymer.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10492778A JPS5534205A (en) | 1978-08-30 | 1978-08-30 | Photosensitive composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10492778A JPS5534205A (en) | 1978-08-30 | 1978-08-30 | Photosensitive composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5534205A true JPS5534205A (en) | 1980-03-10 |
Family
ID=14393723
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10492778A Pending JPS5534205A (en) | 1978-08-30 | 1978-08-30 | Photosensitive composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5534205A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS579036A (en) * | 1980-06-20 | 1982-01-18 | Hitachi Ltd | Formation of pattern by using photosensitive compound |
JPH08503983A (en) * | 1992-11-25 | 1996-04-30 | ヘキスト、セラニーズ、コーポレーション | Reduction of metal ions in bottom antireflective coatings for photoresists |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4891980A (en) * | 1972-03-07 | 1973-11-29 | ||
JPS4893401A (en) * | 1972-03-13 | 1973-12-03 |
-
1978
- 1978-08-30 JP JP10492778A patent/JPS5534205A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4891980A (en) * | 1972-03-07 | 1973-11-29 | ||
JPS4893401A (en) * | 1972-03-13 | 1973-12-03 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS579036A (en) * | 1980-06-20 | 1982-01-18 | Hitachi Ltd | Formation of pattern by using photosensitive compound |
JPH08503983A (en) * | 1992-11-25 | 1996-04-30 | ヘキスト、セラニーズ、コーポレーション | Reduction of metal ions in bottom antireflective coatings for photoresists |
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