JPS5534205A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS5534205A
JPS5534205A JP10492778A JP10492778A JPS5534205A JP S5534205 A JPS5534205 A JP S5534205A JP 10492778 A JP10492778 A JP 10492778A JP 10492778 A JP10492778 A JP 10492778A JP S5534205 A JPS5534205 A JP S5534205A
Authority
JP
Japan
Prior art keywords
photosensitive composition
maleic acid
vinyl ether
acid copolymer
high polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10492778A
Other languages
Japanese (ja)
Inventor
Hajime Morishita
Saburo Nonogaki
Toshikatsu Manabe
Shoko Nishizawa
Yoshifumi Tomita
Michiaki Hashimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP10492778A priority Critical patent/JPS5534205A/en
Publication of JPS5534205A publication Critical patent/JPS5534205A/en
Pending legal-status Critical Current

Links

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  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)

Abstract

PURPOSE: A photosensitive composition free from causing discoloration and precipitation even stored as a solution in a solvent, comprising an aromatic diazonium salt and a methyl vinyl ether-maleic acid copolymer.
CONSTITUTION: A composition comprising (A) an aromatic diazonium salt and (B) 0.5W50wt%, preferably 1W40wt%, based on (A) of a methyl vinyl ether- maleic acid copolymer, and, if necessary, 0.5W450wt% based on (A) of another organic high polymer for improving the coating performance when formed into a coating material. Hydroxypropyl methyl cellulose, acacia, polyvinyl alcohol, polyacrylamide, etc. may be cited as the high polymer.
COPYRIGHT: (C)1980,JPO&Japio
JP10492778A 1978-08-30 1978-08-30 Photosensitive composition Pending JPS5534205A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10492778A JPS5534205A (en) 1978-08-30 1978-08-30 Photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10492778A JPS5534205A (en) 1978-08-30 1978-08-30 Photosensitive composition

Publications (1)

Publication Number Publication Date
JPS5534205A true JPS5534205A (en) 1980-03-10

Family

ID=14393723

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10492778A Pending JPS5534205A (en) 1978-08-30 1978-08-30 Photosensitive composition

Country Status (1)

Country Link
JP (1) JPS5534205A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS579036A (en) * 1980-06-20 1982-01-18 Hitachi Ltd Formation of pattern by using photosensitive compound
JPH08503983A (en) * 1992-11-25 1996-04-30 ヘキスト、セラニーズ、コーポレーション Reduction of metal ions in bottom antireflective coatings for photoresists

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4891980A (en) * 1972-03-07 1973-11-29
JPS4893401A (en) * 1972-03-13 1973-12-03

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4891980A (en) * 1972-03-07 1973-11-29
JPS4893401A (en) * 1972-03-13 1973-12-03

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS579036A (en) * 1980-06-20 1982-01-18 Hitachi Ltd Formation of pattern by using photosensitive compound
JPH08503983A (en) * 1992-11-25 1996-04-30 ヘキスト、セラニーズ、コーポレーション Reduction of metal ions in bottom antireflective coatings for photoresists

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