JPS5527147B2 - - Google Patents
Info
- Publication number
- JPS5527147B2 JPS5527147B2 JP6474676A JP6474676A JPS5527147B2 JP S5527147 B2 JPS5527147 B2 JP S5527147B2 JP 6474676 A JP6474676 A JP 6474676A JP 6474676 A JP6474676 A JP 6474676A JP S5527147 B2 JPS5527147 B2 JP S5527147B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Chemical Vapour Deposition (AREA)
- Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6474676A JPS52147578A (en) | 1976-06-02 | 1976-06-02 | Process and apparatus for forming continuously patterned coating film of pattern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6474676A JPS52147578A (en) | 1976-06-02 | 1976-06-02 | Process and apparatus for forming continuously patterned coating film of pattern |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52147578A JPS52147578A (en) | 1977-12-08 |
| JPS5527147B2 true JPS5527147B2 (sv) | 1980-07-18 |
Family
ID=13267019
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6474676A Granted JPS52147578A (en) | 1976-06-02 | 1976-06-02 | Process and apparatus for forming continuously patterned coating film of pattern |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS52147578A (sv) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015511989A (ja) * | 2011-12-23 | 2015-04-23 | ソレクセル、インコーポレイテッド | 生産性の高い半導体の金属被覆及び相互接続の噴霧処理 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5528316A (en) * | 1978-08-17 | 1980-02-28 | Tdk Corp | Ion plating apparatus |
| JPWO2010032817A1 (ja) * | 2008-09-19 | 2012-02-16 | 株式会社アルバック | プラズマディスプレイパネルの基板への保護膜の形成方法及び同保護膜の形成装置 |
-
1976
- 1976-06-02 JP JP6474676A patent/JPS52147578A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015511989A (ja) * | 2011-12-23 | 2015-04-23 | ソレクセル、インコーポレイテッド | 生産性の高い半導体の金属被覆及び相互接続の噴霧処理 |
| JP2017133108A (ja) * | 2011-12-23 | 2017-08-03 | ソレクセル、インコーポレイテッド | 生産性の高い半導体の金属被覆及び相互接続の噴霧処理 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS52147578A (en) | 1977-12-08 |