JPS5523163A - Polyvinyl alcohol type photosensitive resin and its preparation - Google Patents

Polyvinyl alcohol type photosensitive resin and its preparation

Info

Publication number
JPS5523163A
JPS5523163A JP9680378A JP9680378A JPS5523163A JP S5523163 A JPS5523163 A JP S5523163A JP 9680378 A JP9680378 A JP 9680378A JP 9680378 A JP9680378 A JP 9680378A JP S5523163 A JPS5523163 A JP S5523163A
Authority
JP
Japan
Prior art keywords
photosensitive resin
polyvinyl alcohol
preparation
type photosensitive
alcohol type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9680378A
Other languages
Japanese (ja)
Other versions
JPS565761B2 (en
Inventor
Kunihiro Ichimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP9680378A priority Critical patent/JPS5523163A/en
Priority to US06/062,490 priority patent/US4272620A/en
Priority to GB7927178A priority patent/GB2030575B/en
Priority to DE2932376A priority patent/DE2932376C2/en
Publication of JPS5523163A publication Critical patent/JPS5523163A/en
Publication of JPS565761B2 publication Critical patent/JPS565761B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Immobilizing And Processing Of Enzymes And Microorganisms (AREA)
  • Pyridine Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

PURPOSE: To obtain a readily water-soluble, highly photosensitive resin useful as photo resists and an aqueous coating base, by reaction of polyvinyl alcohol, etc., with a styrylpyridinium salt having a formyl group.
CONSTITUTION: The objective photosensitive resin composed of the structural unit of formula II can be obtained by reaction of polyvinyl alcohol or a partially-saporified polyvinyl acetate with a formyl group-contg styrylpyridinium salt of formula I (R is H, alkyl, or lower hydroxyalkyl, X- is an anion of strong acid).
COPYRIGHT: (C)1980,JPO&Japio
JP9680378A 1978-08-09 1978-08-09 Polyvinyl alcohol type photosensitive resin and its preparation Granted JPS5523163A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP9680378A JPS5523163A (en) 1978-08-09 1978-08-09 Polyvinyl alcohol type photosensitive resin and its preparation
US06/062,490 US4272620A (en) 1978-08-09 1979-07-31 Polyvinyl alcohol-styrylpyridinium photosensitive resins and method for manufacture thereof
GB7927178A GB2030575B (en) 1978-08-09 1979-08-03 Photosensitive resin and method for manufacture thereof
DE2932376A DE2932376C2 (en) 1978-08-09 1979-08-09 Photosensitive polyvinyl alcohol derivatives, process for their preparation and their use in screen printing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9680378A JPS5523163A (en) 1978-08-09 1978-08-09 Polyvinyl alcohol type photosensitive resin and its preparation

Publications (2)

Publication Number Publication Date
JPS5523163A true JPS5523163A (en) 1980-02-19
JPS565761B2 JPS565761B2 (en) 1981-02-06

Family

ID=14174768

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9680378A Granted JPS5523163A (en) 1978-08-09 1978-08-09 Polyvinyl alcohol type photosensitive resin and its preparation

Country Status (1)

Country Link
JP (1) JPS5523163A (en)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56137889A (en) * 1980-03-31 1981-10-28 Agency Of Ind Science & Technol Immobilized enzyme and its production
JPS56147804A (en) * 1980-04-17 1981-11-17 Agency Of Ind Science & Technol Photosensitive resin material for forming fluorescent surface of cathode ray tube
JPS59102232A (en) * 1982-12-03 1984-06-13 Agency Of Ind Science & Technol Photosensitive resin composition for use in screen printing plate
JPS6287394A (en) * 1985-10-14 1987-04-21 Shin Etsu Chem Co Ltd Mesh composite material for screen printing
JPS62129107A (en) * 1985-11-29 1987-06-11 Agency Of Ind Science & Technol New separating membrane
EP0373537A1 (en) 1988-12-14 1990-06-20 THE STATE OF JAPAN, as Represented by the DIRECTOR GENERAL of the AGENCY of INDUSTRIAL SCIENCE and TECHNOLOGY Photosensitive poly(vinyl alcohol) derivative
WO1998013394A1 (en) * 1996-09-27 1998-04-02 Sun Chemical Corporation Water soluble and oxygen-impermeable polymeric layers
US5948592A (en) * 1997-10-20 1999-09-07 Fuji Chemicals Industrial Co., Ltd. Water-soluble photoresist composition
US6020093A (en) * 1998-05-13 2000-02-01 Toyo Gosei Kogyo, Ltd. Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions
US6136507A (en) * 1998-03-12 2000-10-24 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
US6140007A (en) * 1997-04-30 2000-10-31 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method
US6140018A (en) * 1998-08-05 2000-10-31 Toyo Gosei Kogyo Co., Ltd. Photosensitive resin and composition thereof derived from saponified poly(vinyl acetate) and pattern formation method
US6238841B1 (en) 1998-05-12 2001-05-29 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
US6342330B2 (en) 1998-09-24 2002-01-29 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method
JP2005202066A (en) * 2004-01-14 2005-07-28 Fuji Photo Film Co Ltd Light-sensitive transfer sheet, light-sensitive laminate, image pattern forming method, and wiring pattern forming method
KR100477984B1 (en) * 1997-08-30 2005-12-30 삼성에스디아이 주식회사 Photosensitive polymer for photoresist and manufacturing method thereof
JP2016193985A (en) * 2015-03-31 2016-11-17 株式会社Adeka Polymer and photocurable composition

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0220121A3 (en) * 1985-10-14 1987-07-01 Shin-Etsu Chemical Co., Ltd. A method for the preparation of a screen mesh for screen printing

Cited By (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56137889A (en) * 1980-03-31 1981-10-28 Agency Of Ind Science & Technol Immobilized enzyme and its production
JPS5830035B2 (en) * 1980-03-31 1983-06-27 工業技術院長 Method for producing immobilized enzyme
JPS56147804A (en) * 1980-04-17 1981-11-17 Agency Of Ind Science & Technol Photosensitive resin material for forming fluorescent surface of cathode ray tube
JPS59102232A (en) * 1982-12-03 1984-06-13 Agency Of Ind Science & Technol Photosensitive resin composition for use in screen printing plate
JPH0336215B2 (en) * 1982-12-03 1991-05-30 Kogyo Gijutsu Incho
JPS6287394A (en) * 1985-10-14 1987-04-21 Shin Etsu Chem Co Ltd Mesh composite material for screen printing
JPH0467515B2 (en) * 1985-10-14 1992-10-28 Shinetsu Chem Ind Co
JPS62129107A (en) * 1985-11-29 1987-06-11 Agency Of Ind Science & Technol New separating membrane
JPH0239931B2 (en) * 1985-11-29 1990-09-07 Kogyo Gijutsuin
EP0373537A1 (en) 1988-12-14 1990-06-20 THE STATE OF JAPAN, as Represented by the DIRECTOR GENERAL of the AGENCY of INDUSTRIAL SCIENCE and TECHNOLOGY Photosensitive poly(vinyl alcohol) derivative
WO1998013394A1 (en) * 1996-09-27 1998-04-02 Sun Chemical Corporation Water soluble and oxygen-impermeable polymeric layers
US6140007A (en) * 1997-04-30 2000-10-31 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method
KR100477984B1 (en) * 1997-08-30 2005-12-30 삼성에스디아이 주식회사 Photosensitive polymer for photoresist and manufacturing method thereof
US5948592A (en) * 1997-10-20 1999-09-07 Fuji Chemicals Industrial Co., Ltd. Water-soluble photoresist composition
US6136507A (en) * 1998-03-12 2000-10-24 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
US6322952B1 (en) 1998-03-12 2001-11-27 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
US6475702B2 (en) 1998-03-12 2002-11-05 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
US6238841B1 (en) 1998-05-12 2001-05-29 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
US6020093A (en) * 1998-05-13 2000-02-01 Toyo Gosei Kogyo, Ltd. Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions
US6140018A (en) * 1998-08-05 2000-10-31 Toyo Gosei Kogyo Co., Ltd. Photosensitive resin and composition thereof derived from saponified poly(vinyl acetate) and pattern formation method
US6342330B2 (en) 1998-09-24 2002-01-29 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method
JP2005202066A (en) * 2004-01-14 2005-07-28 Fuji Photo Film Co Ltd Light-sensitive transfer sheet, light-sensitive laminate, image pattern forming method, and wiring pattern forming method
JP2016193985A (en) * 2015-03-31 2016-11-17 株式会社Adeka Polymer and photocurable composition

Also Published As

Publication number Publication date
JPS565761B2 (en) 1981-02-06

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