JPS5523163A - Polyvinyl alcohol type photosensitive resin and its preparation - Google Patents
Polyvinyl alcohol type photosensitive resin and its preparationInfo
- Publication number
- JPS5523163A JPS5523163A JP9680378A JP9680378A JPS5523163A JP S5523163 A JPS5523163 A JP S5523163A JP 9680378 A JP9680378 A JP 9680378A JP 9680378 A JP9680378 A JP 9680378A JP S5523163 A JPS5523163 A JP S5523163A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive resin
- polyvinyl alcohol
- preparation
- type photosensitive
- alcohol type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Immobilizing And Processing Of Enzymes And Microorganisms (AREA)
- Pyridine Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
PURPOSE: To obtain a readily water-soluble, highly photosensitive resin useful as photo resists and an aqueous coating base, by reaction of polyvinyl alcohol, etc., with a styrylpyridinium salt having a formyl group.
CONSTITUTION: The objective photosensitive resin composed of the structural unit of formula II can be obtained by reaction of polyvinyl alcohol or a partially-saporified polyvinyl acetate with a formyl group-contg styrylpyridinium salt of formula I (R is H, alkyl, or lower hydroxyalkyl, X- is an anion of strong acid).
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9680378A JPS5523163A (en) | 1978-08-09 | 1978-08-09 | Polyvinyl alcohol type photosensitive resin and its preparation |
US06/062,490 US4272620A (en) | 1978-08-09 | 1979-07-31 | Polyvinyl alcohol-styrylpyridinium photosensitive resins and method for manufacture thereof |
GB7927178A GB2030575B (en) | 1978-08-09 | 1979-08-03 | Photosensitive resin and method for manufacture thereof |
DE2932376A DE2932376C2 (en) | 1978-08-09 | 1979-08-09 | Photosensitive polyvinyl alcohol derivatives, process for their preparation and their use in screen printing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9680378A JPS5523163A (en) | 1978-08-09 | 1978-08-09 | Polyvinyl alcohol type photosensitive resin and its preparation |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5523163A true JPS5523163A (en) | 1980-02-19 |
JPS565761B2 JPS565761B2 (en) | 1981-02-06 |
Family
ID=14174768
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9680378A Granted JPS5523163A (en) | 1978-08-09 | 1978-08-09 | Polyvinyl alcohol type photosensitive resin and its preparation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5523163A (en) |
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56137889A (en) * | 1980-03-31 | 1981-10-28 | Agency Of Ind Science & Technol | Immobilized enzyme and its production |
JPS56147804A (en) * | 1980-04-17 | 1981-11-17 | Agency Of Ind Science & Technol | Photosensitive resin material for forming fluorescent surface of cathode ray tube |
JPS59102232A (en) * | 1982-12-03 | 1984-06-13 | Agency Of Ind Science & Technol | Photosensitive resin composition for use in screen printing plate |
JPS6287394A (en) * | 1985-10-14 | 1987-04-21 | Shin Etsu Chem Co Ltd | Mesh composite material for screen printing |
JPS62129107A (en) * | 1985-11-29 | 1987-06-11 | Agency Of Ind Science & Technol | New separating membrane |
EP0373537A1 (en) | 1988-12-14 | 1990-06-20 | THE STATE OF JAPAN, as Represented by the DIRECTOR GENERAL of the AGENCY of INDUSTRIAL SCIENCE and TECHNOLOGY | Photosensitive poly(vinyl alcohol) derivative |
WO1998013394A1 (en) * | 1996-09-27 | 1998-04-02 | Sun Chemical Corporation | Water soluble and oxygen-impermeable polymeric layers |
US5948592A (en) * | 1997-10-20 | 1999-09-07 | Fuji Chemicals Industrial Co., Ltd. | Water-soluble photoresist composition |
US6020093A (en) * | 1998-05-13 | 2000-02-01 | Toyo Gosei Kogyo, Ltd. | Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions |
US6136507A (en) * | 1998-03-12 | 2000-10-24 | Goo Chemical Co., Ltd. | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
US6140007A (en) * | 1997-04-30 | 2000-10-31 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive compositions and pattern formation method |
US6140018A (en) * | 1998-08-05 | 2000-10-31 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive resin and composition thereof derived from saponified poly(vinyl acetate) and pattern formation method |
US6238841B1 (en) | 1998-05-12 | 2001-05-29 | Goo Chemical Co., Ltd. | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
US6342330B2 (en) | 1998-09-24 | 2002-01-29 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive compositions and pattern formation method |
JP2005202066A (en) * | 2004-01-14 | 2005-07-28 | Fuji Photo Film Co Ltd | Light-sensitive transfer sheet, light-sensitive laminate, image pattern forming method, and wiring pattern forming method |
KR100477984B1 (en) * | 1997-08-30 | 2005-12-30 | 삼성에스디아이 주식회사 | Photosensitive polymer for photoresist and manufacturing method thereof |
JP2016193985A (en) * | 2015-03-31 | 2016-11-17 | 株式会社Adeka | Polymer and photocurable composition |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0220121A3 (en) * | 1985-10-14 | 1987-07-01 | Shin-Etsu Chemical Co., Ltd. | A method for the preparation of a screen mesh for screen printing |
-
1978
- 1978-08-09 JP JP9680378A patent/JPS5523163A/en active Granted
Cited By (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56137889A (en) * | 1980-03-31 | 1981-10-28 | Agency Of Ind Science & Technol | Immobilized enzyme and its production |
JPS5830035B2 (en) * | 1980-03-31 | 1983-06-27 | 工業技術院長 | Method for producing immobilized enzyme |
JPS56147804A (en) * | 1980-04-17 | 1981-11-17 | Agency Of Ind Science & Technol | Photosensitive resin material for forming fluorescent surface of cathode ray tube |
JPS59102232A (en) * | 1982-12-03 | 1984-06-13 | Agency Of Ind Science & Technol | Photosensitive resin composition for use in screen printing plate |
JPH0336215B2 (en) * | 1982-12-03 | 1991-05-30 | Kogyo Gijutsu Incho | |
JPS6287394A (en) * | 1985-10-14 | 1987-04-21 | Shin Etsu Chem Co Ltd | Mesh composite material for screen printing |
JPH0467515B2 (en) * | 1985-10-14 | 1992-10-28 | Shinetsu Chem Ind Co | |
JPS62129107A (en) * | 1985-11-29 | 1987-06-11 | Agency Of Ind Science & Technol | New separating membrane |
JPH0239931B2 (en) * | 1985-11-29 | 1990-09-07 | Kogyo Gijutsuin | |
EP0373537A1 (en) | 1988-12-14 | 1990-06-20 | THE STATE OF JAPAN, as Represented by the DIRECTOR GENERAL of the AGENCY of INDUSTRIAL SCIENCE and TECHNOLOGY | Photosensitive poly(vinyl alcohol) derivative |
WO1998013394A1 (en) * | 1996-09-27 | 1998-04-02 | Sun Chemical Corporation | Water soluble and oxygen-impermeable polymeric layers |
US6140007A (en) * | 1997-04-30 | 2000-10-31 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive compositions and pattern formation method |
KR100477984B1 (en) * | 1997-08-30 | 2005-12-30 | 삼성에스디아이 주식회사 | Photosensitive polymer for photoresist and manufacturing method thereof |
US5948592A (en) * | 1997-10-20 | 1999-09-07 | Fuji Chemicals Industrial Co., Ltd. | Water-soluble photoresist composition |
US6136507A (en) * | 1998-03-12 | 2000-10-24 | Goo Chemical Co., Ltd. | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
US6322952B1 (en) | 1998-03-12 | 2001-11-27 | Goo Chemical Co., Ltd. | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
US6475702B2 (en) | 1998-03-12 | 2002-11-05 | Goo Chemical Co., Ltd. | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
US6238841B1 (en) | 1998-05-12 | 2001-05-29 | Goo Chemical Co., Ltd. | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards |
US6020093A (en) * | 1998-05-13 | 2000-02-01 | Toyo Gosei Kogyo, Ltd. | Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions |
US6140018A (en) * | 1998-08-05 | 2000-10-31 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive resin and composition thereof derived from saponified poly(vinyl acetate) and pattern formation method |
US6342330B2 (en) | 1998-09-24 | 2002-01-29 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive compositions and pattern formation method |
JP2005202066A (en) * | 2004-01-14 | 2005-07-28 | Fuji Photo Film Co Ltd | Light-sensitive transfer sheet, light-sensitive laminate, image pattern forming method, and wiring pattern forming method |
JP2016193985A (en) * | 2015-03-31 | 2016-11-17 | 株式会社Adeka | Polymer and photocurable composition |
Also Published As
Publication number | Publication date |
---|---|
JPS565761B2 (en) | 1981-02-06 |
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