JPS5521119A - Wafer continuously processing apparatus - Google Patents
Wafer continuously processing apparatusInfo
- Publication number
- JPS5521119A JPS5521119A JP9359278A JP9359278A JPS5521119A JP S5521119 A JPS5521119 A JP S5521119A JP 9359278 A JP9359278 A JP 9359278A JP 9359278 A JP9359278 A JP 9359278A JP S5521119 A JPS5521119 A JP S5521119A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- washing
- etch
- washing tank
- processing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Weting (AREA)
Abstract
PURPOSE: To perform effectively an etch-washing so that liquid would come into full contact with the back and surface by washing a wafer in an annular etch-washing tank while carrying its circumferential portion firmly.
CONSTITUTION: A wafer 12 to 15 are arranged to be positioned in a predetermined distance along an annular bottom face of an etch-washing tank by utilizing a wafer sustaining plate 4 constituted by putting one of two sector plates 4a and 4b on another to be awshed preferably. According to such a construction, the wafer can be carried only in the circumferential portion of the washing tank to efficiently achieve the etch-washing by permitting the liquid to come into full contact with the back and front face of the wafer.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9359278A JPS5521119A (en) | 1978-08-02 | 1978-08-02 | Wafer continuously processing apparatus |
US06/061,049 US4282825A (en) | 1978-08-02 | 1979-07-26 | Surface treatment device |
DE19792931308 DE2931308A1 (en) | 1978-08-02 | 1979-08-01 | SURFACE TREATMENT DEVICE |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9359278A JPS5521119A (en) | 1978-08-02 | 1978-08-02 | Wafer continuously processing apparatus |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14416978A Division JPS5521193A (en) | 1978-08-02 | 1978-11-24 | Wafer processing device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5521119A true JPS5521119A (en) | 1980-02-15 |
Family
ID=14086562
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9359278A Pending JPS5521119A (en) | 1978-08-02 | 1978-08-02 | Wafer continuously processing apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5521119A (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50145077A (en) * | 1974-05-10 | 1975-11-21 | ||
JPS5110944A (en) * | 1974-07-17 | 1976-01-28 | Shinshu Seiki Kk | HATSUNET SUHETSUDO |
-
1978
- 1978-08-02 JP JP9359278A patent/JPS5521119A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50145077A (en) * | 1974-05-10 | 1975-11-21 | ||
JPS5110944A (en) * | 1974-07-17 | 1976-01-28 | Shinshu Seiki Kk | HATSUNET SUHETSUDO |
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