JPS55156947A - Lithographic plate preparation - Google Patents
Lithographic plate preparationInfo
- Publication number
- JPS55156947A JPS55156947A JP6327079A JP6327079A JPS55156947A JP S55156947 A JPS55156947 A JP S55156947A JP 6327079 A JP6327079 A JP 6327079A JP 6327079 A JP6327079 A JP 6327079A JP S55156947 A JPS55156947 A JP S55156947A
- Authority
- JP
- Japan
- Prior art keywords
- water
- solvent
- photosensitive layer
- printing
- silicone rubber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE:To facilitate reproduction of sharp fine dots, by dissolving off the printing elements of a photosensitive layer with a specified processing solution, rubbing the printing face with water or a solvent consisting mainly of water, and stripping the silicone rubber layer of the printing elements. CONSTITUTION:A photoadhesive photosensitive layer is formed on a substrate made of Al or the like and a silicone rubber layer is formed to prepare a nonaqueous lithographic plate. A positive film with dot area rates changed stepwise is closely contacted to this plate, and exposed to a light from an ultrahigh pressure mercury lamp. The photosensitive material is immersed in a solvent or 2 or more solvent mixture (a mixture of water, ether, or glycols, or the like), poor solvent for the photosensitive layer of non-printing element area (the exposed area) and good solvent for the photosensitive layer of the printing element area, and after immersion, this is taken out and allowed to be blown with air to remove the attached processing solution. Then, the plate face is rubbed with a pad penetrated by water or a solvent mixture containing 50% or more water, thus permitting the silicone rubber layer of the element area to be stripped and a lithographic plate to be obtained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6327079A JPS55156947A (en) | 1979-05-24 | 1979-05-24 | Lithographic plate preparation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6327079A JPS55156947A (en) | 1979-05-24 | 1979-05-24 | Lithographic plate preparation |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55156947A true JPS55156947A (en) | 1980-12-06 |
JPS6333140B2 JPS6333140B2 (en) | 1988-07-04 |
Family
ID=13224430
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6327079A Granted JPS55156947A (en) | 1979-05-24 | 1979-05-24 | Lithographic plate preparation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55156947A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59146054A (en) * | 1983-02-09 | 1984-08-21 | Toray Ind Inc | Developing solution for lithographic printing plate requiring no damping water |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5170004A (en) * | 1974-12-13 | 1976-06-17 | Toray Industries | Heibaninsatsubanno seizoho |
JPS5353403A (en) * | 1976-10-22 | 1978-05-15 | Asahi Chemical Ind | Original form for press plate and method of producing waterrfree lithographic press plate adopting same |
JPS5462003A (en) * | 1977-10-25 | 1979-05-18 | Mitsumura Printing | Method of anastatic printing |
JPS5489805A (en) * | 1977-12-27 | 1979-07-17 | Toray Industries | Makeup method of planographic printing plate |
-
1979
- 1979-05-24 JP JP6327079A patent/JPS55156947A/en active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5170004A (en) * | 1974-12-13 | 1976-06-17 | Toray Industries | Heibaninsatsubanno seizoho |
JPS5353403A (en) * | 1976-10-22 | 1978-05-15 | Asahi Chemical Ind | Original form for press plate and method of producing waterrfree lithographic press plate adopting same |
JPS5462003A (en) * | 1977-10-25 | 1979-05-18 | Mitsumura Printing | Method of anastatic printing |
JPS5489805A (en) * | 1977-12-27 | 1979-07-17 | Toray Industries | Makeup method of planographic printing plate |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59146054A (en) * | 1983-02-09 | 1984-08-21 | Toray Ind Inc | Developing solution for lithographic printing plate requiring no damping water |
Also Published As
Publication number | Publication date |
---|---|
JPS6333140B2 (en) | 1988-07-04 |
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