JPS55148798A - Manufacture of zinc elecroplated steel sheet - Google Patents

Manufacture of zinc elecroplated steel sheet

Info

Publication number
JPS55148798A
JPS55148798A JP5628679A JP5628679A JPS55148798A JP S55148798 A JPS55148798 A JP S55148798A JP 5628679 A JP5628679 A JP 5628679A JP 5628679 A JP5628679 A JP 5628679A JP S55148798 A JPS55148798 A JP S55148798A
Authority
JP
Japan
Prior art keywords
strip
flowing speed
plate
anode
distribution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5628679A
Other languages
Japanese (ja)
Other versions
JPS6115960B2 (en
Inventor
Shiyuuzou Fukuda
Yutaka Okubo
Tatsuro Anami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Engineering Corp
Original Assignee
NKK Corp
Nippon Kokan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NKK Corp, Nippon Kokan Ltd filed Critical NKK Corp
Priority to JP5628679A priority Critical patent/JPS55148798A/en
Publication of JPS55148798A publication Critical patent/JPS55148798A/en
Publication of JPS6115960B2 publication Critical patent/JPS6115960B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electroplating Methods And Accessories (AREA)

Abstract

PURPOSE: To destroy the concentration boundary layer easy to form on the strip surface and to improve the production efficiency by heightening the boundary electric current density, by providing baffle plate on the anode board in plating bath in the rectangular direction against the strip.
CONSTITUTION: The baffle plate 8 is provided on the anode board 4 in the continuous process horizontal zinc plating bath in the rectangular direction against the strip 3 and distance between the anode 4 and the strip 3, is narrowed locally. Hereby, distribution of liquid flowing speed at the plate 8 part is made 9 shown by the figure and the flowing speed distribution accompanied by the strip 3, is changed compared with the usual flowing speed distribution. For example, relative flowing speed is raised about 17% when the distance from the end of the plate 8 to the strip 3, is made d/3. By the above method, application of the high current density is made possible and a high productivity is obtained.
COPYRIGHT: (C)1980,JPO&Japio
JP5628679A 1979-05-10 1979-05-10 Manufacture of zinc elecroplated steel sheet Granted JPS55148798A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5628679A JPS55148798A (en) 1979-05-10 1979-05-10 Manufacture of zinc elecroplated steel sheet

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5628679A JPS55148798A (en) 1979-05-10 1979-05-10 Manufacture of zinc elecroplated steel sheet

Publications (2)

Publication Number Publication Date
JPS55148798A true JPS55148798A (en) 1980-11-19
JPS6115960B2 JPS6115960B2 (en) 1986-04-26

Family

ID=13022849

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5628679A Granted JPS55148798A (en) 1979-05-10 1979-05-10 Manufacture of zinc elecroplated steel sheet

Country Status (1)

Country Link
JP (1) JPS55148798A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5931881A (en) * 1982-08-12 1984-02-21 Sumitomo Metal Ind Ltd Electroplating method
JPS5944299U (en) * 1982-09-16 1984-03-23 ゼリア新薬工業株式会社 Lou test tube
JP2004172437A (en) * 2002-11-21 2004-06-17 Mitsubishi Electric Corp Method and apparatus for chemical treatment, and manufacturing method of semiconductor device using the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5931881A (en) * 1982-08-12 1984-02-21 Sumitomo Metal Ind Ltd Electroplating method
JPS631392B2 (en) * 1982-08-12 1988-01-12 Sumitomo Metal Ind
JPS5944299U (en) * 1982-09-16 1984-03-23 ゼリア新薬工業株式会社 Lou test tube
JPS6019587Y2 (en) * 1982-09-16 1985-06-12 ゼリア新薬工業株式会社 Lou test tube
JP2004172437A (en) * 2002-11-21 2004-06-17 Mitsubishi Electric Corp Method and apparatus for chemical treatment, and manufacturing method of semiconductor device using the same

Also Published As

Publication number Publication date
JPS6115960B2 (en) 1986-04-26

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