JPS55142332A - Photosensitive composition for lithographic plate - Google Patents
Photosensitive composition for lithographic plateInfo
- Publication number
- JPS55142332A JPS55142332A JP4996379A JP4996379A JPS55142332A JP S55142332 A JPS55142332 A JP S55142332A JP 4996379 A JP4996379 A JP 4996379A JP 4996379 A JP4996379 A JP 4996379A JP S55142332 A JPS55142332 A JP S55142332A
- Authority
- JP
- Japan
- Prior art keywords
- plate
- resin
- photosensitive composition
- printing
- acrylic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
PURPOSE: To enhance the sensitivity and printing resistance of a printing plate without lowering the developability of a PS plate by mixing polyvinyl chlorobenzal resin into an acrylic diazo photosensitive composition.
CONSTITUTION: A photosensitive composition for a PS plate is prepared by adding a multicomponent copolymer of an acrylic monomer having a hydroxy group and other acrylic monomer and polyvinyl chlorobenzal resin obtd. by reacting polyvinyl alcohol and p-chlorobenzaldehyde to a compound, as a water insoluble diazo photosensitive material, obtd. by coupling diazo resin with org. sulfonic acid. The amount of the benzal resin added is 3W30% of the amount of the acrylic copolymer, and a dye, a stabilizer, etc. may be added. This composition is coated onto a PS plate, dried, imagewise exposed, and developed with a developer contg. phenyl cellosolve, benzotriazole . amine adduct and a surfactant. The resulting plate is then lined with rubber to obtain a printing plate having wear resistance, high sensitivity and superior printing resistance.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4996379A JPS55142332A (en) | 1979-04-23 | 1979-04-23 | Photosensitive composition for lithographic plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4996379A JPS55142332A (en) | 1979-04-23 | 1979-04-23 | Photosensitive composition for lithographic plate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55142332A true JPS55142332A (en) | 1980-11-06 |
JPS6352370B2 JPS6352370B2 (en) | 1988-10-18 |
Family
ID=12845670
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4996379A Granted JPS55142332A (en) | 1979-04-23 | 1979-04-23 | Photosensitive composition for lithographic plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55142332A (en) |
-
1979
- 1979-04-23 JP JP4996379A patent/JPS55142332A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6352370B2 (en) | 1988-10-18 |
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