JPS55142332A - Photosensitive composition for lithographic plate - Google Patents

Photosensitive composition for lithographic plate

Info

Publication number
JPS55142332A
JPS55142332A JP4996379A JP4996379A JPS55142332A JP S55142332 A JPS55142332 A JP S55142332A JP 4996379 A JP4996379 A JP 4996379A JP 4996379 A JP4996379 A JP 4996379A JP S55142332 A JPS55142332 A JP S55142332A
Authority
JP
Japan
Prior art keywords
plate
resin
photosensitive composition
printing
acrylic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4996379A
Other languages
Japanese (ja)
Other versions
JPS6352370B2 (en
Inventor
Takateru Asano
Kenji Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Yakuhin Kogyo KK
Original Assignee
Fuji Yakuhin Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Yakuhin Kogyo KK filed Critical Fuji Yakuhin Kogyo KK
Priority to JP4996379A priority Critical patent/JPS55142332A/en
Publication of JPS55142332A publication Critical patent/JPS55142332A/en
Publication of JPS6352370B2 publication Critical patent/JPS6352370B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE: To enhance the sensitivity and printing resistance of a printing plate without lowering the developability of a PS plate by mixing polyvinyl chlorobenzal resin into an acrylic diazo photosensitive composition.
CONSTITUTION: A photosensitive composition for a PS plate is prepared by adding a multicomponent copolymer of an acrylic monomer having a hydroxy group and other acrylic monomer and polyvinyl chlorobenzal resin obtd. by reacting polyvinyl alcohol and p-chlorobenzaldehyde to a compound, as a water insoluble diazo photosensitive material, obtd. by coupling diazo resin with org. sulfonic acid. The amount of the benzal resin added is 3W30% of the amount of the acrylic copolymer, and a dye, a stabilizer, etc. may be added. This composition is coated onto a PS plate, dried, imagewise exposed, and developed with a developer contg. phenyl cellosolve, benzotriazole . amine adduct and a surfactant. The resulting plate is then lined with rubber to obtain a printing plate having wear resistance, high sensitivity and superior printing resistance.
COPYRIGHT: (C)1980,JPO&Japio
JP4996379A 1979-04-23 1979-04-23 Photosensitive composition for lithographic plate Granted JPS55142332A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4996379A JPS55142332A (en) 1979-04-23 1979-04-23 Photosensitive composition for lithographic plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4996379A JPS55142332A (en) 1979-04-23 1979-04-23 Photosensitive composition for lithographic plate

Publications (2)

Publication Number Publication Date
JPS55142332A true JPS55142332A (en) 1980-11-06
JPS6352370B2 JPS6352370B2 (en) 1988-10-18

Family

ID=12845670

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4996379A Granted JPS55142332A (en) 1979-04-23 1979-04-23 Photosensitive composition for lithographic plate

Country Status (1)

Country Link
JP (1) JPS55142332A (en)

Also Published As

Publication number Publication date
JPS6352370B2 (en) 1988-10-18

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