JPS55129339A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS55129339A
JPS55129339A JP3764079A JP3764079A JPS55129339A JP S55129339 A JPS55129339 A JP S55129339A JP 3764079 A JP3764079 A JP 3764079A JP 3764079 A JP3764079 A JP 3764079A JP S55129339 A JPS55129339 A JP S55129339A
Authority
JP
Japan
Prior art keywords
composition
resin composition
photosensitive resin
solid
phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3764079A
Other languages
Japanese (ja)
Other versions
JPS6355056B2 (en
Inventor
Fusae Nakanishi
Hachiro Nakanishi
Masao Kato
Shuzo Hattori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP3764079A priority Critical patent/JPS55129339A/en
Publication of JPS55129339A publication Critical patent/JPS55129339A/en
Publication of JPS6355056B2 publication Critical patent/JPS6355056B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To obtain the title composition having superior operability, resolving power, etc. and capable of easily setting its photosensitive wavelength zone by dispersing fine crystals of a solid-phase-photopolymerizable olefin compound in a synthetic resin matrix. CONSTITUTION:A solid-phase-photopolymerizable olefin compound such as p- formylcinnamic acid or m-phenylenediacrylic acid is dispersed in a synthetic resin matrix such as polyolefin, acrylic resin or polyamide resin in a fine crystal state of about 10-100mu in particle size to obtain a photosensitive resin composition. A sensitizer such as 1,2-benzanthraquinone or 2-nitrofluorene may be blended into the composition.
JP3764079A 1979-03-29 1979-03-29 Photosensitive resin composition Granted JPS55129339A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3764079A JPS55129339A (en) 1979-03-29 1979-03-29 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3764079A JPS55129339A (en) 1979-03-29 1979-03-29 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS55129339A true JPS55129339A (en) 1980-10-07
JPS6355056B2 JPS6355056B2 (en) 1988-11-01

Family

ID=12503239

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3764079A Granted JPS55129339A (en) 1979-03-29 1979-03-29 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS55129339A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1989012262A1 (en) * 1988-06-03 1989-12-14 Tsugu Tanaka Photosensitive material having optically heterogeneous structure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1989012262A1 (en) * 1988-06-03 1989-12-14 Tsugu Tanaka Photosensitive material having optically heterogeneous structure

Also Published As

Publication number Publication date
JPS6355056B2 (en) 1988-11-01

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