JPS55120181A - Fabricating method of photovoltaic device - Google Patents

Fabricating method of photovoltaic device

Info

Publication number
JPS55120181A
JPS55120181A JP2780279A JP2780279A JPS55120181A JP S55120181 A JPS55120181 A JP S55120181A JP 2780279 A JP2780279 A JP 2780279A JP 2780279 A JP2780279 A JP 2780279A JP S55120181 A JPS55120181 A JP S55120181A
Authority
JP
Japan
Prior art keywords
electrodes
generating sections
layer
coated
amorphous silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2780279A
Other languages
Japanese (ja)
Other versions
JPH0228906B2 (en
Inventor
Yukinori Kuwano
Terutoyo Imai
Masakazu Umetani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP2780279A priority Critical patent/JPS55120181A/en
Publication of JPS55120181A publication Critical patent/JPS55120181A/en
Publication of JPH0228906B2 publication Critical patent/JPH0228906B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/042PV modules or arrays of single PV cells
    • H01L31/0445PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
    • H01L31/046PV modules composed of a plurality of thin film solar cells deposited on the same substrate
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Abstract

PURPOSE:To exactly eliminate leakage current in a photovoltaic device and be adapted for a mass production of the device by continuously forming a plurality of generating sections using amorphous silicon layers and removing the boundaries with plasma when separating into the continuous generating sections. CONSTITUTION:A plurality of the first electrodes 12 made of tin oxide, indium oxide, indium oxide.tin or the like are coated in space on a flat insulating substrate 7 such as glass transmitting visible light rays. Then, an amorphous silicon layer 11 consisting of a p-type layer 3, a non-doped layer 4 and an n-type layer 5 is coated on the entire surface including the electrodes 12 to form continuous generating sections first. Then, the second electrodes 13 made of Al, Cr or the like are formed on the electrodes 12, the exposed layer 11 not provided with the electrodes 13 is etched and removed to the bottom of the layer 4 with plasma atmosphere, and the continuous generating sections are retained only between the electrodes 12 and 13. When the independent generating sections are then connected in series, no undesired leakage current is produced therebetween.
JP2780279A 1979-03-09 1979-03-09 Fabricating method of photovoltaic device Granted JPS55120181A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2780279A JPS55120181A (en) 1979-03-09 1979-03-09 Fabricating method of photovoltaic device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2780279A JPS55120181A (en) 1979-03-09 1979-03-09 Fabricating method of photovoltaic device

Publications (2)

Publication Number Publication Date
JPS55120181A true JPS55120181A (en) 1980-09-16
JPH0228906B2 JPH0228906B2 (en) 1990-06-27

Family

ID=12231099

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2780279A Granted JPS55120181A (en) 1979-03-09 1979-03-09 Fabricating method of photovoltaic device

Country Status (1)

Country Link
JP (1) JPS55120181A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58155770A (en) * 1982-03-10 1983-09-16 Matsushita Electric Ind Co Ltd Substrate for amorphous silicon solar cell
WO2011001842A1 (en) * 2009-07-03 2011-01-06 Semiconductor Energy Laboratory Co., Ltd. Photoelectric conversion device and manufacturing method thereof
US9437758B2 (en) 2011-02-21 2016-09-06 Semiconductor Energy Laboratory Co., Ltd. Photoelectric conversion device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4042418A (en) * 1976-08-02 1977-08-16 Westinghouse Electric Corporation Photovoltaic device and method of making same

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4042418A (en) * 1976-08-02 1977-08-16 Westinghouse Electric Corporation Photovoltaic device and method of making same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58155770A (en) * 1982-03-10 1983-09-16 Matsushita Electric Ind Co Ltd Substrate for amorphous silicon solar cell
JPH0125234B2 (en) * 1982-03-10 1989-05-16 Matsushita Electric Ind Co Ltd
WO2011001842A1 (en) * 2009-07-03 2011-01-06 Semiconductor Energy Laboratory Co., Ltd. Photoelectric conversion device and manufacturing method thereof
US9496428B2 (en) 2009-07-03 2016-11-15 Semiconductor Energy Laboratory Co., Ltd. Photoelectric conversion device and manufacturing method thereof
US9437758B2 (en) 2011-02-21 2016-09-06 Semiconductor Energy Laboratory Co., Ltd. Photoelectric conversion device

Also Published As

Publication number Publication date
JPH0228906B2 (en) 1990-06-27

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