JPS55102468A - Curing of photosensitive resin layer - Google Patents

Curing of photosensitive resin layer

Info

Publication number
JPS55102468A
JPS55102468A JP964279A JP964279A JPS55102468A JP S55102468 A JPS55102468 A JP S55102468A JP 964279 A JP964279 A JP 964279A JP 964279 A JP964279 A JP 964279A JP S55102468 A JPS55102468 A JP S55102468A
Authority
JP
Japan
Prior art keywords
photosensitive resin
thickness
discharge lamp
ultraviolet ray
cured
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP964279A
Other languages
Japanese (ja)
Inventor
Tatsumi Hiramoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Ushio Inc
Original Assignee
Ushio Denki KK
Ushio Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK, Ushio Inc filed Critical Ushio Denki KK
Priority to JP964279A priority Critical patent/JPS55102468A/en
Publication of JPS55102468A publication Critical patent/JPS55102468A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To produce cured layer of thickness more than 100μ having good quality in excellent workability and providing power efficiency by a method wherein liquid photosensitive resin curable by irradiation of ultraviolet ray in the range of wavelength less than 4,500Å is irradiated with specific light energy using flash discharge lamp.
CONSTITUTION: Printing ink, coating mateial, etc. utilizing uncured liquid photosensitive resin having main photosensitive characteristic in the range of wavelength less than 4,500Å is cured by the use of ultraviolet ray irradiation. At this time, instead of the conventional mercury discharge lamp, a flash discharge lamp comsisting of glass tube containing sealed rate gas such as Xe gas and that provides momentarily total design light quantity is applied as ultraviolet ray irradiation source. Emitted light energy J (Joule) is controlled so that 0.002≤J/Sd≤2 holds, where S(cm2) is the area to be irradiated and d(μ) is the thickness after cured. Liquid photosensitive resin exceeding 100μ thickness can be instantaneously formed into good cured layer without needing long operation time.
COPYRIGHT: (C)1980,JPO&Japio
JP964279A 1979-02-01 1979-02-01 Curing of photosensitive resin layer Pending JPS55102468A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP964279A JPS55102468A (en) 1979-02-01 1979-02-01 Curing of photosensitive resin layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP964279A JPS55102468A (en) 1979-02-01 1979-02-01 Curing of photosensitive resin layer

Publications (1)

Publication Number Publication Date
JPS55102468A true JPS55102468A (en) 1980-08-05

Family

ID=11725866

Family Applications (1)

Application Number Title Priority Date Filing Date
JP964279A Pending JPS55102468A (en) 1979-02-01 1979-02-01 Curing of photosensitive resin layer

Country Status (1)

Country Link
JP (1) JPS55102468A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4548688A (en) * 1983-05-23 1985-10-22 Fusion Semiconductor Systems Hardening of photoresist

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4548688A (en) * 1983-05-23 1985-10-22 Fusion Semiconductor Systems Hardening of photoresist

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