JPS55102468A - Curing of photosensitive resin layer - Google Patents
Curing of photosensitive resin layerInfo
- Publication number
- JPS55102468A JPS55102468A JP964279A JP964279A JPS55102468A JP S55102468 A JPS55102468 A JP S55102468A JP 964279 A JP964279 A JP 964279A JP 964279 A JP964279 A JP 964279A JP S55102468 A JPS55102468 A JP S55102468A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive resin
- thickness
- discharge lamp
- ultraviolet ray
- cured
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To produce cured layer of thickness more than 100μ having good quality in excellent workability and providing power efficiency by a method wherein liquid photosensitive resin curable by irradiation of ultraviolet ray in the range of wavelength less than 4,500Å is irradiated with specific light energy using flash discharge lamp.
CONSTITUTION: Printing ink, coating mateial, etc. utilizing uncured liquid photosensitive resin having main photosensitive characteristic in the range of wavelength less than 4,500Å is cured by the use of ultraviolet ray irradiation. At this time, instead of the conventional mercury discharge lamp, a flash discharge lamp comsisting of glass tube containing sealed rate gas such as Xe gas and that provides momentarily total design light quantity is applied as ultraviolet ray irradiation source. Emitted light energy J (Joule) is controlled so that 0.002≤J/Sd≤2 holds, where S(cm2) is the area to be irradiated and d(μ) is the thickness after cured. Liquid photosensitive resin exceeding 100μ thickness can be instantaneously formed into good cured layer without needing long operation time.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP964279A JPS55102468A (en) | 1979-02-01 | 1979-02-01 | Curing of photosensitive resin layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP964279A JPS55102468A (en) | 1979-02-01 | 1979-02-01 | Curing of photosensitive resin layer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55102468A true JPS55102468A (en) | 1980-08-05 |
Family
ID=11725866
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP964279A Pending JPS55102468A (en) | 1979-02-01 | 1979-02-01 | Curing of photosensitive resin layer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55102468A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4548688A (en) * | 1983-05-23 | 1985-10-22 | Fusion Semiconductor Systems | Hardening of photoresist |
-
1979
- 1979-02-01 JP JP964279A patent/JPS55102468A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4548688A (en) * | 1983-05-23 | 1985-10-22 | Fusion Semiconductor Systems | Hardening of photoresist |
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