JPS5498244A - Method of forming positive photo resist image - Google Patents
Method of forming positive photo resist imageInfo
- Publication number
- JPS5498244A JPS5498244A JP431978A JP431978A JPS5498244A JP S5498244 A JPS5498244 A JP S5498244A JP 431978 A JP431978 A JP 431978A JP 431978 A JP431978 A JP 431978A JP S5498244 A JPS5498244 A JP S5498244A
- Authority
- JP
- Japan
- Prior art keywords
- photo resist
- resist image
- forming positive
- positive photo
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP431978A JPS5498244A (en) | 1978-01-20 | 1978-01-20 | Method of forming positive photo resist image |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP431978A JPS5498244A (en) | 1978-01-20 | 1978-01-20 | Method of forming positive photo resist image |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5498244A true JPS5498244A (en) | 1979-08-03 |
JPS5635860B2 JPS5635860B2 (en) | 1981-08-20 |
Family
ID=11581142
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP431978A Granted JPS5498244A (en) | 1978-01-20 | 1978-01-20 | Method of forming positive photo resist image |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5498244A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60263143A (en) * | 1984-06-01 | 1985-12-26 | ローム アンド ハース コンパニー | Thermally stable copolymer image and formation thereof |
JPS61212846A (en) * | 1985-03-16 | 1986-09-20 | Goou Kagaku Kogyo Kk | Production of wiring board |
JPS62170965A (en) * | 1986-01-23 | 1987-07-28 | Toray Ind Inc | Photoengraving method for laminate for image formation |
JPS63141048A (en) * | 1986-10-23 | 1988-06-13 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | Image formation |
JPH02971A (en) * | 1988-02-26 | 1990-01-05 | Mitsubishi Electric Corp | Formation of resist pattern |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49127615A (en) * | 1973-04-07 | 1974-12-06 | ||
GB1492620A (en) * | 1974-02-01 | 1977-11-23 | Fuji Photo Film Co Ltd | Ortho-quinonediazide light-sensitive copying material |
JPS52150619A (en) * | 1976-06-10 | 1977-12-14 | Toray Industries | Photosensitive resin composition |
-
1978
- 1978-01-20 JP JP431978A patent/JPS5498244A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49127615A (en) * | 1973-04-07 | 1974-12-06 | ||
GB1492620A (en) * | 1974-02-01 | 1977-11-23 | Fuji Photo Film Co Ltd | Ortho-quinonediazide light-sensitive copying material |
JPS52150619A (en) * | 1976-06-10 | 1977-12-14 | Toray Industries | Photosensitive resin composition |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60263143A (en) * | 1984-06-01 | 1985-12-26 | ローム アンド ハース コンパニー | Thermally stable copolymer image and formation thereof |
JPS61212846A (en) * | 1985-03-16 | 1986-09-20 | Goou Kagaku Kogyo Kk | Production of wiring board |
JPS62170965A (en) * | 1986-01-23 | 1987-07-28 | Toray Ind Inc | Photoengraving method for laminate for image formation |
JPS63141048A (en) * | 1986-10-23 | 1988-06-13 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | Image formation |
JPH02971A (en) * | 1988-02-26 | 1990-01-05 | Mitsubishi Electric Corp | Formation of resist pattern |
Also Published As
Publication number | Publication date |
---|---|
JPS5635860B2 (en) | 1981-08-20 |
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