JPS5473576A - Spin coating method and spin coater - Google Patents

Spin coating method and spin coater

Info

Publication number
JPS5473576A
JPS5473576A JP14136277A JP14136277A JPS5473576A JP S5473576 A JPS5473576 A JP S5473576A JP 14136277 A JP14136277 A JP 14136277A JP 14136277 A JP14136277 A JP 14136277A JP S5473576 A JPS5473576 A JP S5473576A
Authority
JP
Japan
Prior art keywords
substrate
resist
coating
chamber
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14136277A
Other languages
Japanese (ja)
Other versions
JPS6214092B2 (en
Inventor
Shuji Kondo
Kazuhiko Tsuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP14136277A priority Critical patent/JPS5473576A/en
Publication of JPS5473576A publication Critical patent/JPS5473576A/en
Publication of JPS6214092B2 publication Critical patent/JPS6214092B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

PURPOSE: To perform spin coating by placing a substrate to face downward and be opposed to the surface of coating solution and building up part of the coating solution surface to raised form and contacting the same to the substrate.
CONSTITUTION: A substrate 101 with its surface to be coated being faced downward is secured to a rotary base 17 and a spindle 18 is slided to place the substrate in the position I near the photo resist solution surface 16. When a pressure gas is introduced into a chamber 13 and a diaphragm 14 is expanded, the liquid surface 16 builds up and deposits on approximately the entire surface of the substrate. Next, the chamber 13 is reduced of pressure to return the liquid surface to a normal position. The base 17 is then rotation-driven 701 and the base 17 is pulled up to the position II, whereby the resist coating film is formed on the substrate surface. The unsable gel form resist is separated and recovered into an enclosure bath 21 in this position, thus the majority of the resist is recovered into the chamber 12. Since the coating surface is facing downward, the dropping and deposition of the gel form particles on this surface do not occur and the homogeneous coating film may be obtained.
COPYRIGHT: (C)1979,JPO&Japio
JP14136277A 1977-11-24 1977-11-24 Spin coating method and spin coater Granted JPS5473576A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14136277A JPS5473576A (en) 1977-11-24 1977-11-24 Spin coating method and spin coater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14136277A JPS5473576A (en) 1977-11-24 1977-11-24 Spin coating method and spin coater

Publications (2)

Publication Number Publication Date
JPS5473576A true JPS5473576A (en) 1979-06-12
JPS6214092B2 JPS6214092B2 (en) 1987-03-31

Family

ID=15290206

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14136277A Granted JPS5473576A (en) 1977-11-24 1977-11-24 Spin coating method and spin coater

Country Status (1)

Country Link
JP (1) JPS5473576A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59208832A (en) * 1983-05-13 1984-11-27 Hitachi Tokyo Electronics Co Ltd Applicator
JPS60189936A (en) * 1984-03-12 1985-09-27 Nippon Kogaku Kk <Nikon> Producting device of semiconductor
JPS61104623A (en) * 1984-10-29 1986-05-22 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Rotary coater
JP2001198513A (en) * 2000-01-17 2001-07-24 Dainippon Screen Mfg Co Ltd Substrate coating device
CN109675744A (en) * 2017-09-29 2019-04-26 临海市劳尔机械有限公司 A kind of glasses lens plated flush coater

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02123591U (en) * 1989-03-22 1990-10-11
JPH0393598U (en) * 1990-01-16 1991-09-24

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59208832A (en) * 1983-05-13 1984-11-27 Hitachi Tokyo Electronics Co Ltd Applicator
JPS60189936A (en) * 1984-03-12 1985-09-27 Nippon Kogaku Kk <Nikon> Producting device of semiconductor
JPS61104623A (en) * 1984-10-29 1986-05-22 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Rotary coater
JPH0248136B2 (en) * 1984-10-29 1990-10-24 Intaanashonaru Bijinesu Mashiinzu Corp
JP2001198513A (en) * 2000-01-17 2001-07-24 Dainippon Screen Mfg Co Ltd Substrate coating device
JP4513999B2 (en) * 2000-01-17 2010-07-28 株式会社Ｓｏｋｕｄｏ Substrate coating device
CN109675744A (en) * 2017-09-29 2019-04-26 临海市劳尔机械有限公司 A kind of glasses lens plated flush coater

Also Published As

Publication number Publication date
JPS6214092B2 (en) 1987-03-31

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