JPS5472103A - Image making substance for flat plate printing with improved image visibility - Google Patents

Image making substance for flat plate printing with improved image visibility

Info

Publication number: JPS5472103A
Authority: JP; Japan
Prior art keywords: image; flat plate; plate printing; making substance; visibility
Prior art date: 1977-10-03
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP12194578A

Other languages

Japanese (ja)

Inventor

Goruda Yuujin

Reonaado Uirukusu Aran

Esu Doitsuchiyu Arubaato

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Polychrome Corp

Original Assignee

Polychrome Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1977-10-03

Filing date

1978-10-03

Publication date

1979-06-09

1978-10-03 Application filed by Polychrome Corp filed Critical Polychrome Corp

1979-06-09 Publication of JPS5472103A publication Critical patent/JPS5472103A/en

Status Pending legal-status Critical Current

Links

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

Engineering & Computer Science (AREA)
Architecture (AREA)
Structural Engineering (AREA)
Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)

JP12194578A 1977-10-03 1978-10-03 Image making substance for flat plate printing with improved image visibility Pending JPS5472103A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US83877477A	1977-10-03	1977-10-03

Publications (1)

Publication Number	Publication Date
JPS5472103A true JPS5472103A (en)	1979-06-09

Family

ID=25278012

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP12194578A Pending JPS5472103A (en)	1977-10-03	1978-10-03	Image making substance for flat plate printing with improved image visibility

Country Status (7)

Country	Link
JP (1)	JPS5472103A (en)
AU (1)	AU4029478A (en)
DE (1)	DE2843069A1 (en)
FR (1)	FR2404870A1 (en)
GB (1)	GB2005855A (en)
NL (1)	NL7809997A (en)
SE (1)	SE7810323L (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS57163234A (en) *	1981-04-01	1982-10-07	Fuji Photo Film Co Ltd	Photosensitive composition
US4350753A (en) *	1981-06-15	1982-09-21	Polychrome Corporation	Positive acting composition yielding pre-development high visibility image after radiation exposure comprising radiation sensitive diazo oxide and haloalkyl-s-triazine with novolak and dyestuff
DE3144480A1 (en) *	1981-11-09	1983-05-19	Hoechst Ag, 6230 Frankfurt	LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE COPY MATERIAL MADE THEREOF
JPS5929245A (en) *	1982-08-11	1984-02-16	Hitachi Ltd	Photosensitive composition and formation of pattern using it
GB2139369B (en) *	1983-05-06	1987-01-21	Sericol Group Ltd	Photosensitive systems showing visible indication of exposure
FR2558274A1 (en) *	1984-01-17	1985-07-19	Chemistry Technology Sa	Process for the production of positive images on a substrate from a positive transparent plate employing a diazo sensitive surface
EP0161660B1 (en) *	1984-05-14	1991-10-09	Kabushiki Kaisha Toshiba	Pattern forming method and composition for pattern formation to be used therefor
TWI791249B (en) *	2021-07-27	2023-02-01	財團法人工業技術研究院	Impregnation liquid and activated carbon cloth and method of forming the same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB1347759A (en) *	1971-06-17	1974-02-27	Howson Algraphy Ltd	Light sensitive materials
JPS5626012B2 (en) *	1973-12-07	1981-06-16
DE2331377C2 (en) *	1973-06-20	1982-10-14	Hoechst Ag, 6000 Frankfurt	Photosensitive copying material
DE2641100C2 (en) *	1976-09-13	1987-02-26	Hoechst Ag, 6230 Frankfurt	Light-sensitive mixture

1978
- 1978-09-27 GB GB7838286A patent/GB2005855A/en not_active Withdrawn
- 1978-09-28 AU AU40294/78A patent/AU4029478A/en active Pending
- 1978-10-02 SE SE7810323A patent/SE7810323L/en not_active Application Discontinuation
- 1978-10-03 JP JP12194578A patent/JPS5472103A/en active Pending
- 1978-10-03 FR FR7828267A patent/FR2404870A1/en not_active Withdrawn
- 1978-10-03 DE DE19782843069 patent/DE2843069A1/en not_active Withdrawn
- 1978-10-03 NL NL7809997A patent/NL7809997A/en not_active Application Discontinuation

Also Published As

Publication number	Publication date
GB2005855A (en)	1979-04-25
SE7810323L (en)	1979-05-17
FR2404870A1 (en)	1979-04-27
DE2843069A1 (en)	1979-04-12
AU4029478A (en)	1980-04-03
NL7809997A (en)	1979-04-05

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