JPS5471980A - Adhesion method of semiconductor wafer to lapping surface plate - Google Patents

Adhesion method of semiconductor wafer to lapping surface plate

Info

Publication number
JPS5471980A
JPS5471980A JP13906477A JP13906477A JPS5471980A JP S5471980 A JPS5471980 A JP S5471980A JP 13906477 A JP13906477 A JP 13906477A JP 13906477 A JP13906477 A JP 13906477A JP S5471980 A JPS5471980 A JP S5471980A
Authority
JP
Japan
Prior art keywords
surface plate
wafer
sheet
semiconductor wafer
lapping
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13906477A
Other languages
Japanese (ja)
Other versions
JPS5931213B2 (en
Inventor
Isamu Yamamoto
Hiroyuki Yoshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP52139064A priority Critical patent/JPS5931213B2/en
Publication of JPS5471980A publication Critical patent/JPS5471980A/en
Publication of JPS5931213B2 publication Critical patent/JPS5931213B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

PURPOSE:To reduce the number of processes of adhering wafer to surface plate and avoid damage of wiring surface when adhering, by placing a fiber material sheet soaked with thermoplastic adhesive when mounting a semiconductor wafer onto a lapping surface plate, and lapping the wafer after heating and pressing. CONSTITUTION:An adhesion sheet 7 having callulose soaked with thermoplastic adhesive is placed on the adhesion surface of a lapping surface plate 4, and a semiconductor wafer 1 having electrode is mounted thereon with the electrode surface dewnward, being in close contact with the sheet 7. Then pressure is applied by using a heated spindle 8. Then pressure is applied by using a heated spindle 8. Thus, the adhesive contained in the sheet 7 melts out from the wafer 1 side and the surface plate 4 side, so that the wafer 1 is bonded with the surface plate 4 by way of the sheet 7. Removing the spindle 8, the melted adhesive 9 is cooled together with the wafer 1 and the surface plate 4, so that the adhesion of the wafer 1 and the surface plate is reinforced.
JP52139064A 1977-11-18 1977-11-18 How to bond a semiconductor wafer to a lap surface plate Expired JPS5931213B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52139064A JPS5931213B2 (en) 1977-11-18 1977-11-18 How to bond a semiconductor wafer to a lap surface plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52139064A JPS5931213B2 (en) 1977-11-18 1977-11-18 How to bond a semiconductor wafer to a lap surface plate

Publications (2)

Publication Number Publication Date
JPS5471980A true JPS5471980A (en) 1979-06-08
JPS5931213B2 JPS5931213B2 (en) 1984-07-31

Family

ID=15236643

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52139064A Expired JPS5931213B2 (en) 1977-11-18 1977-11-18 How to bond a semiconductor wafer to a lap surface plate

Country Status (1)

Country Link
JP (1) JPS5931213B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6290944A (en) * 1985-10-17 1987-04-25 Toshiba Ceramics Co Ltd Silicon wafer bonding device
JPS63162155A (en) * 1982-09-23 1988-07-05 ウィリアム・ディー・ブディンガー Work mounting method for grinding
JP2011522429A (en) * 2008-06-06 2011-07-28 ゲブリューダー シュミット ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー Method and corresponding arrangement for fixing a silicon block on a target support

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63162155A (en) * 1982-09-23 1988-07-05 ウィリアム・ディー・ブディンガー Work mounting method for grinding
JPH0426982B2 (en) * 1982-09-23 1992-05-08 Deii Budeingaa Uiriamu
JPS6290944A (en) * 1985-10-17 1987-04-25 Toshiba Ceramics Co Ltd Silicon wafer bonding device
JPH0582966B2 (en) * 1985-10-17 1993-11-24 Toshiba Ceramics Co
JP2011522429A (en) * 2008-06-06 2011-07-28 ゲブリューダー シュミット ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー Method and corresponding arrangement for fixing a silicon block on a target support

Also Published As

Publication number Publication date
JPS5931213B2 (en) 1984-07-31

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