JPS5456099A - Formation method for alumina or silica-alumina film - Google Patents
Formation method for alumina or silica-alumina filmInfo
- Publication number
- JPS5456099A JPS5456099A JP12320377A JP12320377A JPS5456099A JP S5456099 A JPS5456099 A JP S5456099A JP 12320377 A JP12320377 A JP 12320377A JP 12320377 A JP12320377 A JP 12320377A JP S5456099 A JPS5456099 A JP S5456099A
- Authority
- JP
- Japan
- Prior art keywords
- cpd
- alumina
- kinds
- chelate
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Surface Treatment Of Glass (AREA)
- Silicon Compounds (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
- Chemically Coating (AREA)
Abstract
PURPOSE: To obtain a uniform dense continuous transparent film by coating the surface of a substrate such as glass with a soln. of polyalumino chelate cpd. contg. two kinds of structural units, in a limited molar ratio, consisting of specific org. Akl cpd. residues.
CONSTITUTION: The surface of a substrate such as glass, metal or ceramics is coated with a soln. of polyalumino chelate cpd. e.g. of formula III having two kinds of structural units to obtain an alumina film. The units are represented by formula I (where X is one or more kinds of not more than 12 C org. cpd. residues forming a chelate ring with Akl) and formula II (where Y is one or more out of a not more than 10 C hydrocarbon cpd. residue, alkoxy, a carboxylic acid residue, OH, H and halogen), and the molar ratio is 1≥[X]/([X]+[Y])≥0.6
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52123203A JPS605524B2 (en) | 1977-10-13 | 1977-10-13 | Alumina or silica-alumina film formation method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52123203A JPS605524B2 (en) | 1977-10-13 | 1977-10-13 | Alumina or silica-alumina film formation method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5456099A true JPS5456099A (en) | 1979-05-04 |
JPS605524B2 JPS605524B2 (en) | 1985-02-12 |
Family
ID=14854739
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52123203A Expired JPS605524B2 (en) | 1977-10-13 | 1977-10-13 | Alumina or silica-alumina film formation method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS605524B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6184380A (en) * | 1984-10-01 | 1986-04-28 | Nitto Kasei Kk | Formation of conductive oxide tin film on base body |
-
1977
- 1977-10-13 JP JP52123203A patent/JPS605524B2/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6184380A (en) * | 1984-10-01 | 1986-04-28 | Nitto Kasei Kk | Formation of conductive oxide tin film on base body |
Also Published As
Publication number | Publication date |
---|---|
JPS605524B2 (en) | 1985-02-12 |
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