JPS5455177A - Soft x-ray condensing apparatus for soft x-ray exposure - Google Patents
Soft x-ray condensing apparatus for soft x-ray exposureInfo
- Publication number
- JPS5455177A JPS5455177A JP12175877A JP12175877A JPS5455177A JP S5455177 A JPS5455177 A JP S5455177A JP 12175877 A JP12175877 A JP 12175877A JP 12175877 A JP12175877 A JP 12175877A JP S5455177 A JPS5455177 A JP S5455177A
- Authority
- JP
- Japan
- Prior art keywords
- soft
- rays
- reflecting plates
- reflecting
- reflecting plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To increase X-ray intensity and shorten exposure time by providing plural disc form reflecting plates concentrically encircling the focus at the center of soft X- rays and yet letting them incline with a critical angle to the incident rays of the soft X-rays.
CONSTITUTION: With the focus 1' at the center of soft X-rays 1 as a common axis, a plurality of thin reflecting plates 2a thru 2n are formed concentrically thereto. These reflecting plates 2a thru 2n are formed in the truncated cone face wherein while the heights are made equal to the short portions between the two planes normal to the common axis, the widths are made narrow with the central reflecting plate 2n and are made wider as they go closer to the upper part and spread most on the outer circumferential reflecting plate 2a. Further these reflecting plates are made circular and are inclined at angles closer to the critical angle θc=1.6×105λρ0.5 radiun where the material density of the reflecting plate surface portions is let to be ρ(g/cm3) and the wavelength of the soft X-rays to be λ(cm). In this way, the intensity of parallel X-rays is increased, the out-of-focusing at the pattern transfer eliminated and exposure time shortened
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12175877A JPS5455177A (en) | 1977-10-11 | 1977-10-11 | Soft x-ray condensing apparatus for soft x-ray exposure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12175877A JPS5455177A (en) | 1977-10-11 | 1977-10-11 | Soft x-ray condensing apparatus for soft x-ray exposure |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5455177A true JPS5455177A (en) | 1979-05-02 |
JPS5444637B2 JPS5444637B2 (en) | 1979-12-27 |
Family
ID=14819148
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12175877A Granted JPS5455177A (en) | 1977-10-11 | 1977-10-11 | Soft x-ray condensing apparatus for soft x-ray exposure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5455177A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5627930A (en) * | 1979-08-13 | 1981-03-18 | American Science & Eng Inc | Xxray lithographic system |
JP2005501221A (en) * | 2001-01-23 | 2005-01-13 | カール ツァイス エスエムテー アーゲー | Concentrator with unused area for illumination optics using wavelengths shorter than 193 nm |
WO2005006414A1 (en) * | 2003-07-14 | 2005-01-20 | Nikon Corporation | Focusing optical system, light source unit, illumination optical apparatus, and exposure apparatus |
US7977651B2 (en) | 1998-05-05 | 2011-07-12 | Carl Zeiss Smt Gmbh | Illumination system particularly for microlithography |
-
1977
- 1977-10-11 JP JP12175877A patent/JPS5455177A/en active Granted
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5627930A (en) * | 1979-08-13 | 1981-03-18 | American Science & Eng Inc | Xxray lithographic system |
JPS5753657B2 (en) * | 1979-08-13 | 1982-11-13 | ||
US7977651B2 (en) | 1998-05-05 | 2011-07-12 | Carl Zeiss Smt Gmbh | Illumination system particularly for microlithography |
JP2005501221A (en) * | 2001-01-23 | 2005-01-13 | カール ツァイス エスエムテー アーゲー | Concentrator with unused area for illumination optics using wavelengths shorter than 193 nm |
US7460212B2 (en) | 2001-01-23 | 2008-12-02 | Carl-Zeiss Smt Ag | Collector configured of mirror shells |
WO2005006414A1 (en) * | 2003-07-14 | 2005-01-20 | Nikon Corporation | Focusing optical system, light source unit, illumination optical apparatus, and exposure apparatus |
JP2005032972A (en) * | 2003-07-14 | 2005-02-03 | Nikon Corp | Light condensing optical system, light source unit, lighting optical apparatus, and aligner |
US7385212B2 (en) | 2003-07-14 | 2008-06-10 | Nikon Corporation | Collector optical system, light source unit, illumination optical apparatus, and exposure apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPS5444637B2 (en) | 1979-12-27 |
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