JPS5455177A - Soft x-ray condensing apparatus for soft x-ray exposure - Google Patents

Soft x-ray condensing apparatus for soft x-ray exposure

Info

Publication number
JPS5455177A
JPS5455177A JP12175877A JP12175877A JPS5455177A JP S5455177 A JPS5455177 A JP S5455177A JP 12175877 A JP12175877 A JP 12175877A JP 12175877 A JP12175877 A JP 12175877A JP S5455177 A JPS5455177 A JP S5455177A
Authority
JP
Japan
Prior art keywords
soft
rays
reflecting plates
reflecting
reflecting plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12175877A
Other languages
Japanese (ja)
Other versions
JPS5444637B2 (en
Inventor
Seitaro Matsuo
Shinichi Yamazaki
Satoru Nakayama
Hideo Yoshihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP12175877A priority Critical patent/JPS5455177A/en
Publication of JPS5455177A publication Critical patent/JPS5455177A/en
Publication of JPS5444637B2 publication Critical patent/JPS5444637B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To increase X-ray intensity and shorten exposure time by providing plural disc form reflecting plates concentrically encircling the focus at the center of soft X- rays and yet letting them incline with a critical angle to the incident rays of the soft X-rays.
CONSTITUTION: With the focus 1' at the center of soft X-rays 1 as a common axis, a plurality of thin reflecting plates 2a thru 2n are formed concentrically thereto. These reflecting plates 2a thru 2n are formed in the truncated cone face wherein while the heights are made equal to the short portions between the two planes normal to the common axis, the widths are made narrow with the central reflecting plate 2n and are made wider as they go closer to the upper part and spread most on the outer circumferential reflecting plate 2a. Further these reflecting plates are made circular and are inclined at angles closer to the critical angle θc=1.6×105λρ0.5 radiun where the material density of the reflecting plate surface portions is let to be ρ(g/cm3) and the wavelength of the soft X-rays to be λ(cm). In this way, the intensity of parallel X-rays is increased, the out-of-focusing at the pattern transfer eliminated and exposure time shortened
COPYRIGHT: (C)1979,JPO&Japio
JP12175877A 1977-10-11 1977-10-11 Soft x-ray condensing apparatus for soft x-ray exposure Granted JPS5455177A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12175877A JPS5455177A (en) 1977-10-11 1977-10-11 Soft x-ray condensing apparatus for soft x-ray exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12175877A JPS5455177A (en) 1977-10-11 1977-10-11 Soft x-ray condensing apparatus for soft x-ray exposure

Publications (2)

Publication Number Publication Date
JPS5455177A true JPS5455177A (en) 1979-05-02
JPS5444637B2 JPS5444637B2 (en) 1979-12-27

Family

ID=14819148

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12175877A Granted JPS5455177A (en) 1977-10-11 1977-10-11 Soft x-ray condensing apparatus for soft x-ray exposure

Country Status (1)

Country Link
JP (1) JPS5455177A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5627930A (en) * 1979-08-13 1981-03-18 American Science & Eng Inc Xxray lithographic system
JP2005501221A (en) * 2001-01-23 2005-01-13 カール ツァイス エスエムテー アーゲー Concentrator with unused area for illumination optics using wavelengths shorter than 193 nm
WO2005006414A1 (en) * 2003-07-14 2005-01-20 Nikon Corporation Focusing optical system, light source unit, illumination optical apparatus, and exposure apparatus
US7977651B2 (en) 1998-05-05 2011-07-12 Carl Zeiss Smt Gmbh Illumination system particularly for microlithography

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5627930A (en) * 1979-08-13 1981-03-18 American Science & Eng Inc Xxray lithographic system
JPS5753657B2 (en) * 1979-08-13 1982-11-13
US7977651B2 (en) 1998-05-05 2011-07-12 Carl Zeiss Smt Gmbh Illumination system particularly for microlithography
JP2005501221A (en) * 2001-01-23 2005-01-13 カール ツァイス エスエムテー アーゲー Concentrator with unused area for illumination optics using wavelengths shorter than 193 nm
US7460212B2 (en) 2001-01-23 2008-12-02 Carl-Zeiss Smt Ag Collector configured of mirror shells
WO2005006414A1 (en) * 2003-07-14 2005-01-20 Nikon Corporation Focusing optical system, light source unit, illumination optical apparatus, and exposure apparatus
JP2005032972A (en) * 2003-07-14 2005-02-03 Nikon Corp Light condensing optical system, light source unit, lighting optical apparatus, and aligner
US7385212B2 (en) 2003-07-14 2008-06-10 Nikon Corporation Collector optical system, light source unit, illumination optical apparatus, and exposure apparatus

Also Published As

Publication number Publication date
JPS5444637B2 (en) 1979-12-27

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