JPS5439579A - Semiconductor device of field effect type - Google Patents
Semiconductor device of field effect typeInfo
- Publication number
- JPS5439579A JPS5439579A JP10560677A JP10560677A JPS5439579A JP S5439579 A JPS5439579 A JP S5439579A JP 10560677 A JP10560677 A JP 10560677A JP 10560677 A JP10560677 A JP 10560677A JP S5439579 A JPS5439579 A JP S5439579A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- field effect
- effect type
- increase
- amolification
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
Abstract
PURPOSE: To enable to increase the gate width remarkably and to increase the amolification factor and the degree of integration, by taking cubic constitution for the active region and placing the gate electrodes with opposing each other.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10560677A JPS5439579A (en) | 1977-09-02 | 1977-09-02 | Semiconductor device of field effect type |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10560677A JPS5439579A (en) | 1977-09-02 | 1977-09-02 | Semiconductor device of field effect type |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5439579A true JPS5439579A (en) | 1979-03-27 |
Family
ID=14412154
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10560677A Pending JPS5439579A (en) | 1977-09-02 | 1977-09-02 | Semiconductor device of field effect type |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5439579A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS583287A (en) * | 1981-06-30 | 1983-01-10 | Fujitsu Ltd | Vertical cylindrical mos field effect transistor |
JPS60264246A (en) * | 1984-06-13 | 1985-12-27 | 鐘淵化学工業株式会社 | Continuous manufacture of laminated board for electricity |
US4663644A (en) * | 1983-12-26 | 1987-05-05 | Hitachi, Ltd. | Semiconductor device and method of manufacturing the same |
JPS62272570A (en) * | 1986-03-24 | 1987-11-26 | シリコニクス インコ−ポレイテツド | Planar vertical channel dmos structure |
US5087509A (en) * | 1989-05-22 | 1992-02-11 | Mitsubishi Metal Corporation | Substrate used for fabrication of thick film circuit |
US5134448A (en) * | 1990-01-29 | 1992-07-28 | Motorola, Inc. | MOSFET with substrate source contact |
-
1977
- 1977-09-02 JP JP10560677A patent/JPS5439579A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS583287A (en) * | 1981-06-30 | 1983-01-10 | Fujitsu Ltd | Vertical cylindrical mos field effect transistor |
US4663644A (en) * | 1983-12-26 | 1987-05-05 | Hitachi, Ltd. | Semiconductor device and method of manufacturing the same |
JPS60264246A (en) * | 1984-06-13 | 1985-12-27 | 鐘淵化学工業株式会社 | Continuous manufacture of laminated board for electricity |
JPH047699B2 (en) * | 1984-06-13 | 1992-02-12 | Kanegafuchi Chemical Ind | |
JPS62272570A (en) * | 1986-03-24 | 1987-11-26 | シリコニクス インコ−ポレイテツド | Planar vertical channel dmos structure |
US5087509A (en) * | 1989-05-22 | 1992-02-11 | Mitsubishi Metal Corporation | Substrate used for fabrication of thick film circuit |
US5134448A (en) * | 1990-01-29 | 1992-07-28 | Motorola, Inc. | MOSFET with substrate source contact |
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