JPS5428313B2 - - Google Patents
Info
- Publication number
- JPS5428313B2 JPS5428313B2 JP14371375A JP14371375A JPS5428313B2 JP S5428313 B2 JPS5428313 B2 JP S5428313B2 JP 14371375 A JP14371375 A JP 14371375A JP 14371375 A JP14371375 A JP 14371375A JP S5428313 B2 JPS5428313 B2 JP S5428313B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/047—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation by radiant heating of the substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14371375A JPS5266884A (en) | 1975-12-01 | 1975-12-01 | Process for forming film on base material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14371375A JPS5266884A (en) | 1975-12-01 | 1975-12-01 | Process for forming film on base material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5266884A JPS5266884A (en) | 1977-06-02 |
JPS5428313B2 true JPS5428313B2 (ja) | 1979-09-14 |
Family
ID=15345237
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14371375A Granted JPS5266884A (en) | 1975-12-01 | 1975-12-01 | Process for forming film on base material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5266884A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20200049866A1 (en) * | 2018-08-13 | 2020-02-13 | Chien-Chin MAI | Optical film and backlight module using same |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5645759A (en) * | 1979-09-20 | 1981-04-25 | Matsushita Electric Ind Co Ltd | Preparation of vapor growth film |
JPS5973045A (ja) * | 1982-10-19 | 1984-04-25 | Inoue Japax Res Inc | 表面被覆方法 |
JPH062946B2 (ja) * | 1984-12-08 | 1994-01-12 | 株式会社井上ジャパックス研究所 | 炭化珪素薄膜の形成方法 |
JPS62136017A (ja) * | 1985-12-10 | 1987-06-19 | Stanley Electric Co Ltd | レ−ザ−励起cvd法によるアモルフアスシリコンの製造方法 |
JP2568006B2 (ja) * | 1990-08-23 | 1996-12-25 | インターナショナル・ビジネス・マシーンズ・コーポレイション | イオン化空気により対象物から電荷を放電させる方法及びそのための装置 |
-
1975
- 1975-12-01 JP JP14371375A patent/JPS5266884A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20200049866A1 (en) * | 2018-08-13 | 2020-02-13 | Chien-Chin MAI | Optical film and backlight module using same |
Also Published As
Publication number | Publication date |
---|---|
JPS5266884A (en) | 1977-06-02 |