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Hitachi Ltd
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Hitachi Ltd
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Priority to JP8426077ApriorityCriticalpatent/JPS5419655A/en
Publication of JPS5419655ApublicationCriticalpatent/JPS5419655A/en
Internal Circuitry In Semiconductor Integrated Circuit Devices
(AREA)
Abstract
PURPOSE: To achieve flatterning of passivation films and enable wiring structure of high reliability free from cracking, etc. to be conomically formed by forming the passivation films in stepwise layers.