JPS54143071A - Electron-beam exposure system - Google Patents

Electron-beam exposure system

Info

Publication number
JPS54143071A
JPS54143071A JP5168878A JP5168878A JPS54143071A JP S54143071 A JPS54143071 A JP S54143071A JP 5168878 A JP5168878 A JP 5168878A JP 5168878 A JP5168878 A JP 5168878A JP S54143071 A JPS54143071 A JP S54143071A
Authority
JP
Japan
Prior art keywords
information
pattern
size
exposure
stay time
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5168878A
Other languages
Japanese (ja)
Other versions
JPS5828730B2 (en
Inventor
Takeari Uema
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP53051688A priority Critical patent/JPS5828730B2/en
Publication of JPS54143071A publication Critical patent/JPS54143071A/en
Publication of JPS5828730B2 publication Critical patent/JPS5828730B2/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To form a highly-precise pattern regardless of its area by controlling exposure to the optimum degree by automatically changing the stay time for an electron beam corresponding to the size of the pattern to be exposed. CONSTITUTION:Beam-stay-time information is stored 16 from central processor 1 via write circuit 13. Position information on an exposure pattern is supplied to scanner 6 via registers 2 and 3, and size information is via registers 4 and 5; and beam 1 is deflected 10 and 11 via amplifiers 7 and 8 respectively. The size information assigns the address of the memory via decoders 14 and 15 to read out 17 the information, thereby setting the stay time to register 18. Basic CP19 is converted and interpolated by the information of register 18 and then supplied to scanner 6; and then, the beam stay time is prolonged corresponding to the number of interpolation and the exposure is quickened automatically corresponding to the size of the pattern to be exposed, so that the reduction of the pattern size due to the adjacent effect of the beam will never occur.
JP53051688A 1978-04-28 1978-04-28 Electron beam exposure equipment Expired JPS5828730B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP53051688A JPS5828730B2 (en) 1978-04-28 1978-04-28 Electron beam exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53051688A JPS5828730B2 (en) 1978-04-28 1978-04-28 Electron beam exposure equipment

Publications (2)

Publication Number Publication Date
JPS54143071A true JPS54143071A (en) 1979-11-07
JPS5828730B2 JPS5828730B2 (en) 1983-06-17

Family

ID=12893824

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53051688A Expired JPS5828730B2 (en) 1978-04-28 1978-04-28 Electron beam exposure equipment

Country Status (1)

Country Link
JP (1) JPS5828730B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57211232A (en) * 1981-06-23 1982-12-25 Toshiba Mach Co Ltd Raster scanning type electron beam exposure
JPS61224418A (en) * 1985-03-29 1986-10-06 Jeol Ltd Ion beam lithography equipment

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60131235U (en) * 1984-02-10 1985-09-03 ダイハツ工業株式会社 Press movable gauge

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51147262A (en) * 1975-06-13 1976-12-17 Fujitsu Ltd Electronic beam exposure method
JPS52119079A (en) * 1976-03-31 1977-10-06 Fujitsu Ltd Electron beam exposure

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51147262A (en) * 1975-06-13 1976-12-17 Fujitsu Ltd Electronic beam exposure method
JPS52119079A (en) * 1976-03-31 1977-10-06 Fujitsu Ltd Electron beam exposure

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57211232A (en) * 1981-06-23 1982-12-25 Toshiba Mach Co Ltd Raster scanning type electron beam exposure
JPS61224418A (en) * 1985-03-29 1986-10-06 Jeol Ltd Ion beam lithography equipment

Also Published As

Publication number Publication date
JPS5828730B2 (en) 1983-06-17

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