JPS54138090A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS54138090A
JPS54138090A JP4617278A JP4617278A JPS54138090A JP S54138090 A JPS54138090 A JP S54138090A JP 4617278 A JP4617278 A JP 4617278A JP 4617278 A JP4617278 A JP 4617278A JP S54138090 A JPS54138090 A JP S54138090A
Authority
JP
Japan
Prior art keywords
polyvinyl alcohol
resin
degree
photosensitive resin
resin composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4617278A
Other languages
Japanese (ja)
Other versions
JPS5917729B2 (en
Inventor
Hirofumi Mori
Hitoshi Hori
Susumu Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to JP4617278A priority Critical patent/JPS5917729B2/en
Publication of JPS54138090A publication Critical patent/JPS54138090A/en
Publication of JPS5917729B2 publication Critical patent/JPS5917729B2/en
Expired legal-status Critical Current

Links

Abstract

PURPOSE: Title composition with high adhesion to base sheets that is mainly composed of a polyvinyl acetal resin prepared by acetalization of a polyvinyl alcohol resin of a specific polymerization degree and saponification degree with an unsaturated aldehyde to a prescribed degree.
CONSTITUTION: A monoaldehyde with 1 or more unsaturated group in the molecule such as acrolein or crotonaldehyde, is made to act on a polyvinyl alcohol resin with a polymerization degree of 300 W 3000, and a saponification degree of 70 W 100 mol% to acetalize 1 W 40 equivalent %, preferably 1- W 30 equivalent% of the hydroxyl groups in the polyvinyl alcohol. The resulting resin is incorporated with a photocuring agent or compound to produce said photosensitive resin composition.
COPYRIGHT: (C)1979,JPO&Japio
JP4617278A 1978-04-18 1978-04-18 Photosensitive resin composition Expired JPS5917729B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4617278A JPS5917729B2 (en) 1978-04-18 1978-04-18 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4617278A JPS5917729B2 (en) 1978-04-18 1978-04-18 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS54138090A true JPS54138090A (en) 1979-10-26
JPS5917729B2 JPS5917729B2 (en) 1984-04-23

Family

ID=12739598

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4617278A Expired JPS5917729B2 (en) 1978-04-18 1978-04-18 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS5917729B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6046550A (en) * 1983-06-25 1985-03-13 バスフ アクチエンゲゼルシヤフト Developable photosensitive recording material for producing printing plate, relief plate or resist pattern
JPS61267042A (en) * 1985-05-21 1986-11-26 Fuji Photo Film Co Ltd Photosensitive composition
JP2004269687A (en) * 2003-03-07 2004-09-30 Nippon Shokubai Co Ltd Polyvinyl acetal compound and method for producing the same
JP2017105997A (en) * 2015-12-04 2017-06-15 日本酢ビ・ポバール株式会社 Dispersion assistant for suspension polymerization, manufacturing method of vinyl polymer using the same and vinyl chloride resin

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6046550A (en) * 1983-06-25 1985-03-13 バスフ アクチエンゲゼルシヤフト Developable photosensitive recording material for producing printing plate, relief plate or resist pattern
JPS61267042A (en) * 1985-05-21 1986-11-26 Fuji Photo Film Co Ltd Photosensitive composition
JPH0573016B2 (en) * 1985-05-21 1993-10-13 Fuji Photo Film Co Ltd
JP2004269687A (en) * 2003-03-07 2004-09-30 Nippon Shokubai Co Ltd Polyvinyl acetal compound and method for producing the same
JP2017105997A (en) * 2015-12-04 2017-06-15 日本酢ビ・ポバール株式会社 Dispersion assistant for suspension polymerization, manufacturing method of vinyl polymer using the same and vinyl chloride resin

Also Published As

Publication number Publication date
JPS5917729B2 (en) 1984-04-23

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