JPS5411677A - Mask used for fine line lithography and method of producing same - Google Patents
Mask used for fine line lithography and method of producing sameInfo
- Publication number
- JPS5411677A JPS5411677A JP7143778A JP7143778A JPS5411677A JP S5411677 A JPS5411677 A JP S5411677A JP 7143778 A JP7143778 A JP 7143778A JP 7143778 A JP7143778 A JP 7143778A JP S5411677 A JPS5411677 A JP S5411677A
- Authority
- JP
- Japan
- Prior art keywords
- fine line
- mask used
- producing same
- line lithography
- lithography
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Weting (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US81046977A | 1977-06-27 | 1977-06-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5411677A true JPS5411677A (en) | 1979-01-27 |
JPS6327849B2 JPS6327849B2 (en) | 1988-06-06 |
Family
ID=25203923
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7143778A Granted JPS5411677A (en) | 1977-06-27 | 1978-06-12 | Mask used for fine line lithography and method of producing same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5411677A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55150023U (en) * | 1979-04-16 | 1980-10-29 | ||
JPS5931027A (en) * | 1982-08-13 | 1984-02-18 | Seiko Epson Corp | Manufacture of x-ray mask |
JPS5986051A (en) * | 1982-11-08 | 1984-05-18 | Mitsubishi Electric Corp | Production of mask for x-ray exposure |
JPS5989422A (en) * | 1982-11-15 | 1984-05-23 | Mitsubishi Electric Corp | Manufacture of x-ray mask |
JPS5992531A (en) * | 1982-11-17 | 1984-05-28 | Mitsubishi Electric Corp | Mask for x-ray exposure |
JPS63283023A (en) * | 1987-05-14 | 1988-11-18 | Oki Electric Ind Co Ltd | Manufacture of membrane for x-ray exposure mask |
JP2020072114A (en) * | 2018-10-29 | 2020-05-07 | 国立研究開発法人産業技術総合研究所 | Method of forming fine metal bump and fine metal bump |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3743842A (en) * | 1972-01-14 | 1973-07-03 | Massachusetts Inst Technology | Soft x-ray lithographic apparatus and process |
JPS5057778A (en) * | 1973-09-17 | 1975-05-20 | ||
JPS50120270A (en) * | 1974-02-15 | 1975-09-20 | ||
JPS52173A (en) * | 1975-06-23 | 1977-01-05 | Toshiba Corp | X-ray etching mask |
-
1978
- 1978-06-12 JP JP7143778A patent/JPS5411677A/en active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3743842A (en) * | 1972-01-14 | 1973-07-03 | Massachusetts Inst Technology | Soft x-ray lithographic apparatus and process |
JPS5057778A (en) * | 1973-09-17 | 1975-05-20 | ||
JPS50120270A (en) * | 1974-02-15 | 1975-09-20 | ||
JPS52173A (en) * | 1975-06-23 | 1977-01-05 | Toshiba Corp | X-ray etching mask |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55150023U (en) * | 1979-04-16 | 1980-10-29 | ||
JPS5931027A (en) * | 1982-08-13 | 1984-02-18 | Seiko Epson Corp | Manufacture of x-ray mask |
JPS5986051A (en) * | 1982-11-08 | 1984-05-18 | Mitsubishi Electric Corp | Production of mask for x-ray exposure |
JPS5989422A (en) * | 1982-11-15 | 1984-05-23 | Mitsubishi Electric Corp | Manufacture of x-ray mask |
JPS5992531A (en) * | 1982-11-17 | 1984-05-28 | Mitsubishi Electric Corp | Mask for x-ray exposure |
JPS63283023A (en) * | 1987-05-14 | 1988-11-18 | Oki Electric Ind Co Ltd | Manufacture of membrane for x-ray exposure mask |
JP2020072114A (en) * | 2018-10-29 | 2020-05-07 | 国立研究開発法人産業技術総合研究所 | Method of forming fine metal bump and fine metal bump |
Also Published As
Publication number | Publication date |
---|---|
JPS6327849B2 (en) | 1988-06-06 |
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