JPS5411677A - Mask used for fine line lithography and method of producing same - Google Patents

Mask used for fine line lithography and method of producing same

Info

Publication number
JPS5411677A
JPS5411677A JP7143778A JP7143778A JPS5411677A JP S5411677 A JPS5411677 A JP S5411677A JP 7143778 A JP7143778 A JP 7143778A JP 7143778 A JP7143778 A JP 7143778A JP S5411677 A JPS5411677 A JP S5411677A
Authority
JP
Japan
Prior art keywords
fine line
mask used
producing same
line lithography
lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7143778A
Other languages
Japanese (ja)
Other versions
JPS6327849B2 (en
Inventor
Buruuku Jiyoonzu Adeison
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Boeing North American Inc
Original Assignee
Rockwell International Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rockwell International Corp filed Critical Rockwell International Corp
Publication of JPS5411677A publication Critical patent/JPS5411677A/en
Publication of JPS6327849B2 publication Critical patent/JPS6327849B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Weting (AREA)
  • Electron Beam Exposure (AREA)
JP7143778A 1977-06-27 1978-06-12 Mask used for fine line lithography and method of producing same Granted JPS5411677A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US81046977A 1977-06-27 1977-06-27

Publications (2)

Publication Number Publication Date
JPS5411677A true JPS5411677A (en) 1979-01-27
JPS6327849B2 JPS6327849B2 (en) 1988-06-06

Family

ID=25203923

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7143778A Granted JPS5411677A (en) 1977-06-27 1978-06-12 Mask used for fine line lithography and method of producing same

Country Status (1)

Country Link
JP (1) JPS5411677A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55150023U (en) * 1979-04-16 1980-10-29
JPS5931027A (en) * 1982-08-13 1984-02-18 Seiko Epson Corp Manufacture of x-ray mask
JPS5986051A (en) * 1982-11-08 1984-05-18 Mitsubishi Electric Corp Production of mask for x-ray exposure
JPS5989422A (en) * 1982-11-15 1984-05-23 Mitsubishi Electric Corp Manufacture of x-ray mask
JPS5992531A (en) * 1982-11-17 1984-05-28 Mitsubishi Electric Corp Mask for x-ray exposure
JPS63283023A (en) * 1987-05-14 1988-11-18 Oki Electric Ind Co Ltd Manufacture of membrane for x-ray exposure mask
JP2020072114A (en) * 2018-10-29 2020-05-07 国立研究開発法人産業技術総合研究所 Method of forming fine metal bump and fine metal bump

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3743842A (en) * 1972-01-14 1973-07-03 Massachusetts Inst Technology Soft x-ray lithographic apparatus and process
JPS5057778A (en) * 1973-09-17 1975-05-20
JPS50120270A (en) * 1974-02-15 1975-09-20
JPS52173A (en) * 1975-06-23 1977-01-05 Toshiba Corp X-ray etching mask

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3743842A (en) * 1972-01-14 1973-07-03 Massachusetts Inst Technology Soft x-ray lithographic apparatus and process
JPS5057778A (en) * 1973-09-17 1975-05-20
JPS50120270A (en) * 1974-02-15 1975-09-20
JPS52173A (en) * 1975-06-23 1977-01-05 Toshiba Corp X-ray etching mask

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55150023U (en) * 1979-04-16 1980-10-29
JPS5931027A (en) * 1982-08-13 1984-02-18 Seiko Epson Corp Manufacture of x-ray mask
JPS5986051A (en) * 1982-11-08 1984-05-18 Mitsubishi Electric Corp Production of mask for x-ray exposure
JPS5989422A (en) * 1982-11-15 1984-05-23 Mitsubishi Electric Corp Manufacture of x-ray mask
JPS5992531A (en) * 1982-11-17 1984-05-28 Mitsubishi Electric Corp Mask for x-ray exposure
JPS63283023A (en) * 1987-05-14 1988-11-18 Oki Electric Ind Co Ltd Manufacture of membrane for x-ray exposure mask
JP2020072114A (en) * 2018-10-29 2020-05-07 国立研究開発法人産業技術総合研究所 Method of forming fine metal bump and fine metal bump

Also Published As

Publication number Publication date
JPS6327849B2 (en) 1988-06-06

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