JPS5410729A - Photomask - Google Patents
PhotomaskInfo
- Publication number
- JPS5410729A JPS5410729A JP7631177A JP7631177A JPS5410729A JP S5410729 A JPS5410729 A JP S5410729A JP 7631177 A JP7631177 A JP 7631177A JP 7631177 A JP7631177 A JP 7631177A JP S5410729 A JPS5410729 A JP S5410729A
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7631177A JPS5410729A (en) | 1977-06-27 | 1977-06-27 | Photomask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7631177A JPS5410729A (en) | 1977-06-27 | 1977-06-27 | Photomask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5410729A true JPS5410729A (en) | 1979-01-26 |
Family
ID=13601815
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7631177A Pending JPS5410729A (en) | 1977-06-27 | 1977-06-27 | Photomask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5410729A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6033556A (en) * | 1983-08-05 | 1985-02-20 | Konishiroku Photo Ind Co Ltd | Material of photomask for dry etching |
JPS6093439A (en) * | 1983-10-27 | 1985-05-25 | Konishiroku Photo Ind Co Ltd | Photomask |
JPS60120359A (en) * | 1983-12-05 | 1985-06-27 | Tokyo Optical Co Ltd | Manufacture of optical mask substrate and reflection type optical mask using optical mask substrate |
JPH05145374A (en) * | 1991-11-22 | 1993-06-11 | Mitsubishi Electric Corp | 90× phase shifter |
JP2011221377A (en) * | 2010-04-13 | 2011-11-04 | Ulvac Seimaku Kk | Mask blank, method for producing photo mask, and photo mask |
-
1977
- 1977-06-27 JP JP7631177A patent/JPS5410729A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6033556A (en) * | 1983-08-05 | 1985-02-20 | Konishiroku Photo Ind Co Ltd | Material of photomask for dry etching |
JPH0430576B2 (en) * | 1983-08-05 | 1992-05-22 | ||
JPS6093439A (en) * | 1983-10-27 | 1985-05-25 | Konishiroku Photo Ind Co Ltd | Photomask |
JPH0433023B2 (en) * | 1983-10-27 | 1992-06-01 | Konishiroku Photo Ind | |
JPS60120359A (en) * | 1983-12-05 | 1985-06-27 | Tokyo Optical Co Ltd | Manufacture of optical mask substrate and reflection type optical mask using optical mask substrate |
JPH0435060B2 (en) * | 1983-12-05 | 1992-06-09 | Topcon Corp | |
JPH05145374A (en) * | 1991-11-22 | 1993-06-11 | Mitsubishi Electric Corp | 90× phase shifter |
JP2011221377A (en) * | 2010-04-13 | 2011-11-04 | Ulvac Seimaku Kk | Mask blank, method for producing photo mask, and photo mask |
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