JPS5410729A - Photomask - Google Patents

Photomask

Info

Publication number
JPS5410729A
JPS5410729A JP7631177A JP7631177A JPS5410729A JP S5410729 A JPS5410729 A JP S5410729A JP 7631177 A JP7631177 A JP 7631177A JP 7631177 A JP7631177 A JP 7631177A JP S5410729 A JPS5410729 A JP S5410729A
Authority
JP
Japan
Prior art keywords
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7631177A
Other languages
Japanese (ja)
Inventor
Susumu Takeuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP7631177A priority Critical patent/JPS5410729A/en
Publication of JPS5410729A publication Critical patent/JPS5410729A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP7631177A 1977-06-27 1977-06-27 Photomask Pending JPS5410729A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7631177A JPS5410729A (en) 1977-06-27 1977-06-27 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7631177A JPS5410729A (en) 1977-06-27 1977-06-27 Photomask

Publications (1)

Publication Number Publication Date
JPS5410729A true JPS5410729A (en) 1979-01-26

Family

ID=13601815

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7631177A Pending JPS5410729A (en) 1977-06-27 1977-06-27 Photomask

Country Status (1)

Country Link
JP (1) JPS5410729A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6033556A (en) * 1983-08-05 1985-02-20 Konishiroku Photo Ind Co Ltd Material of photomask for dry etching
JPS6093439A (en) * 1983-10-27 1985-05-25 Konishiroku Photo Ind Co Ltd Photomask
JPS60120359A (en) * 1983-12-05 1985-06-27 Tokyo Optical Co Ltd Manufacture of optical mask substrate and reflection type optical mask using optical mask substrate
JPH05145374A (en) * 1991-11-22 1993-06-11 Mitsubishi Electric Corp 90× phase shifter
JP2011221377A (en) * 2010-04-13 2011-11-04 Ulvac Seimaku Kk Mask blank, method for producing photo mask, and photo mask

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6033556A (en) * 1983-08-05 1985-02-20 Konishiroku Photo Ind Co Ltd Material of photomask for dry etching
JPH0430576B2 (en) * 1983-08-05 1992-05-22
JPS6093439A (en) * 1983-10-27 1985-05-25 Konishiroku Photo Ind Co Ltd Photomask
JPH0433023B2 (en) * 1983-10-27 1992-06-01 Konishiroku Photo Ind
JPS60120359A (en) * 1983-12-05 1985-06-27 Tokyo Optical Co Ltd Manufacture of optical mask substrate and reflection type optical mask using optical mask substrate
JPH0435060B2 (en) * 1983-12-05 1992-06-09 Topcon Corp
JPH05145374A (en) * 1991-11-22 1993-06-11 Mitsubishi Electric Corp 90× phase shifter
JP2011221377A (en) * 2010-04-13 2011-11-04 Ulvac Seimaku Kk Mask blank, method for producing photo mask, and photo mask

Similar Documents

Publication Publication Date Title
AU4201478A (en) Step-stools
AU515984B2 (en) 4-substituted-pyrazoles
AU3526278A (en) L-sucrose
AU4022878A (en) Thiopropionamides
AU3677378A (en) N-acylmethyl-chloroacetanilides
AU3828478A (en) Benzodiazepine-diones
AU4286678A (en) 4a-aryl-octahydro-1h-2-pyrindines
JPS5410729A (en) Photomask
AU3785078A (en) Piperidino-propanols
AU3918778A (en) Beta-substituted-diketones
JPS53134367A (en) Xxray mask
AU3939078A (en) 2-chlorosulfinylazetidin-4-ones
AU4216378A (en) Antibiotic-a-40104
BG28612A1 (en) Auto- train
AU3939978A (en) 2-guanidinomethyl-indoline
AU4255778A (en) 3-di-n-propyl-acetoxy-benzodiazepin-2-ones
AU4026278A (en) Thienobenzazepines
AU3774978A (en) Butyl-p-benzoylbenzoates
AU3355078A (en) Aryl-hexafuranosides
AU3533578A (en) Micro-mill-mixer
AU4225778A (en) Imino-bridged benzocycloheptapyridines
AU3845478A (en) Isoquinoline-diones
JPS5432072A (en) Photomask
JPS5387598A (en) Mask
AU520181B2 (en) Lkylthiophenoxypropanolamines