JPS5388099A - Methylpolysiloxane - Google Patents
MethylpolysiloxaneInfo
- Publication number
- JPS5388099A JPS5388099A JP231677A JP231677A JPS5388099A JP S5388099 A JPS5388099 A JP S5388099A JP 231677 A JP231677 A JP 231677A JP 231677 A JP231677 A JP 231677A JP S5388099 A JPS5388099 A JP S5388099A
- Authority
- JP
- Japan
- Prior art keywords
- methylpolysiloxane
- insolubilizing
- sicl
- hydrolyzing
- soluble
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To prepare a soluble methylpolysiloxane having a specific structure and free from insolubilizing when stored in solid state, by hydrolyzing CH3 SiCl3, thereafter heat condensing the product.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52002316A JPS6017214B2 (en) | 1977-01-14 | 1977-01-14 | Soluble methylpolysiloxane and its manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52002316A JPS6017214B2 (en) | 1977-01-14 | 1977-01-14 | Soluble methylpolysiloxane and its manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5388099A true JPS5388099A (en) | 1978-08-03 |
JPS6017214B2 JPS6017214B2 (en) | 1985-05-01 |
Family
ID=11525920
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52002316A Expired JPS6017214B2 (en) | 1977-01-14 | 1977-01-14 | Soluble methylpolysiloxane and its manufacturing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6017214B2 (en) |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5550282A (en) * | 1978-10-09 | 1980-04-11 | Toshiba Corp | Fixing apparatus in electrophotographic copier |
JPS5550645A (en) * | 1978-10-06 | 1980-04-12 | Hitachi Ltd | Semiconductor device |
JPS56130947A (en) * | 1980-03-17 | 1981-10-14 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS5740526A (en) * | 1980-08-26 | 1982-03-06 | Japan Synthetic Rubber Co Ltd | Preparation of silicone resin |
JPS60254132A (en) * | 1984-05-31 | 1985-12-14 | Fujitsu Ltd | Pattern forming material |
JPS61108628A (en) * | 1984-11-01 | 1986-05-27 | Fujitsu Ltd | Production of lower-alkylpolysilsesquioxane |
JPS6450533A (en) * | 1987-08-21 | 1989-02-27 | Showa Denko Kk | Wiring board |
US6143855A (en) * | 1997-04-21 | 2000-11-07 | Alliedsignal Inc. | Organohydridosiloxane resins with high organic content |
US6177199B1 (en) | 1999-01-07 | 2001-01-23 | Alliedsignal Inc. | Dielectric films from organohydridosiloxane resins with low organic content |
US6218497B1 (en) | 1997-04-21 | 2001-04-17 | Alliedsignal Inc. | Organohydridosiloxane resins with low organic content |
US6218020B1 (en) | 1999-01-07 | 2001-04-17 | Alliedsignal Inc. | Dielectric films from organohydridosiloxane resins with high organic content |
US6284858B1 (en) | 1997-03-14 | 2001-09-04 | Nippon Steel Chemical Co., Ltd. | Silicone compounds and process for producing the same |
US8992806B2 (en) | 2003-11-18 | 2015-03-31 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50111198A (en) * | 1974-01-28 | 1975-09-01 |
-
1977
- 1977-01-14 JP JP52002316A patent/JPS6017214B2/en not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50111198A (en) * | 1974-01-28 | 1975-09-01 |
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5550645A (en) * | 1978-10-06 | 1980-04-12 | Hitachi Ltd | Semiconductor device |
JPS6058592B2 (en) * | 1978-10-06 | 1985-12-20 | 株式会社日立製作所 | semiconductor equipment |
JPS5550282A (en) * | 1978-10-09 | 1980-04-11 | Toshiba Corp | Fixing apparatus in electrophotographic copier |
JPS56130947A (en) * | 1980-03-17 | 1981-10-14 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS6312899B2 (en) * | 1980-08-26 | 1988-03-23 | Japan Synthetic Rubber Co Ltd | |
JPS5740526A (en) * | 1980-08-26 | 1982-03-06 | Japan Synthetic Rubber Co Ltd | Preparation of silicone resin |
JPS60254132A (en) * | 1984-05-31 | 1985-12-14 | Fujitsu Ltd | Pattern forming material |
JPH0414782B2 (en) * | 1984-05-31 | 1992-03-13 | Fujitsu Ltd | |
JPS6216212B2 (en) * | 1984-11-01 | 1987-04-11 | Fujitsu Ltd | |
JPS61108628A (en) * | 1984-11-01 | 1986-05-27 | Fujitsu Ltd | Production of lower-alkylpolysilsesquioxane |
JPS6450533A (en) * | 1987-08-21 | 1989-02-27 | Showa Denko Kk | Wiring board |
US6284858B1 (en) | 1997-03-14 | 2001-09-04 | Nippon Steel Chemical Co., Ltd. | Silicone compounds and process for producing the same |
US6143855A (en) * | 1997-04-21 | 2000-11-07 | Alliedsignal Inc. | Organohydridosiloxane resins with high organic content |
US6218497B1 (en) | 1997-04-21 | 2001-04-17 | Alliedsignal Inc. | Organohydridosiloxane resins with low organic content |
US6177199B1 (en) | 1999-01-07 | 2001-01-23 | Alliedsignal Inc. | Dielectric films from organohydridosiloxane resins with low organic content |
US6218020B1 (en) | 1999-01-07 | 2001-04-17 | Alliedsignal Inc. | Dielectric films from organohydridosiloxane resins with high organic content |
US8992806B2 (en) | 2003-11-18 | 2015-03-31 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
Also Published As
Publication number | Publication date |
---|---|
JPS6017214B2 (en) | 1985-05-01 |
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