JPS5385017U - - Google Patents
Info
- Publication number
- JPS5385017U JPS5385017U JP16866276U JP16866276U JPS5385017U JP S5385017 U JPS5385017 U JP S5385017U JP 16866276 U JP16866276 U JP 16866276U JP 16866276 U JP16866276 U JP 16866276U JP S5385017 U JPS5385017 U JP S5385017U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16866276U JPS5385017U (en) | 1976-12-15 | 1976-12-15 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16866276U JPS5385017U (en) | 1976-12-15 | 1976-12-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5385017U true JPS5385017U (en) | 1978-07-13 |
Family
ID=28776284
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16866276U Pending JPS5385017U (en) | 1976-12-15 | 1976-12-15 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5385017U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20240041252A (en) | 2022-09-22 | 2024-03-29 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Polymer, chemically amplified positive resist composition, resist patterning process, and mask blank |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5136211B2 (en) * | 1974-10-25 | 1976-10-07 |
-
1976
- 1976-12-15 JP JP16866276U patent/JPS5385017U/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5136211B2 (en) * | 1974-10-25 | 1976-10-07 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20240041252A (en) | 2022-09-22 | 2024-03-29 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Polymer, chemically amplified positive resist composition, resist patterning process, and mask blank |