JPS5382502A - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- JPS5382502A JPS5382502A JP13456076A JP13456076A JPS5382502A JP S5382502 A JPS5382502 A JP S5382502A JP 13456076 A JP13456076 A JP 13456076A JP 13456076 A JP13456076 A JP 13456076A JP S5382502 A JPS5382502 A JP S5382502A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive composition
- photosensitive
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13456076A JPS5382502A (en) | 1976-11-09 | 1976-11-09 | Photosensitive composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13456076A JPS5382502A (en) | 1976-11-09 | 1976-11-09 | Photosensitive composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5382502A true JPS5382502A (en) | 1978-07-21 |
JPS555099B2 JPS555099B2 (en) | 1980-02-04 |
Family
ID=15131177
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13456076A Granted JPS5382502A (en) | 1976-11-09 | 1976-11-09 | Photosensitive composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5382502A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009099083A1 (en) * | 2008-02-05 | 2009-08-13 | Nec Corporation | Acrylamide polymers, acrylamide compounds, chemically amplified photosensitive resin compositions and pattern formation method |
-
1976
- 1976-11-09 JP JP13456076A patent/JPS5382502A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009099083A1 (en) * | 2008-02-05 | 2009-08-13 | Nec Corporation | Acrylamide polymers, acrylamide compounds, chemically amplified photosensitive resin compositions and pattern formation method |
JPWO2009099083A1 (en) * | 2008-02-05 | 2011-05-26 | 日本電気株式会社 | Acrylamide polymer, acrylamide compound, chemically amplified photosensitive resin composition and pattern forming method |
Also Published As
Publication number | Publication date |
---|---|
JPS555099B2 (en) | 1980-02-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5336223A (en) | Photosensitive composition | |
ZA775351B (en) | Light-sensitive copying composition | |
JPS5359016A (en) | Pharmatoceutical composition | |
JPS5326331A (en) | Decayeddtooth preventing composition | |
JPS5316787A (en) | Specificcreactive composition | |
AU2732277A (en) | Soil-hardening composition | |
JPS5336222A (en) | Photosensitive composition | |
JPS5355360A (en) | Heattactivating composition | |
JPS549619A (en) | Photosensitive composition | |
JPS52143827A (en) | Improved lighttsensitive composition | |
JPS52117437A (en) | Antiicoccidium composition | |
JPS522520A (en) | Photosensitive composition | |
JPS5312984A (en) | Photosensitive composition | |
JPS5341436A (en) | Antiiparasite composition | |
IL51365A0 (en) | Coccidiocidal composition | |
JPS52142752A (en) | Moistureeresistant composition | |
JPS5333151A (en) | Toner composition | |
JPS52102023A (en) | Novel relief photosensitive composition | |
IE44735L (en) | Fibrinogenase composition | |
JPS5380460A (en) | Oillinnwater type emulsion composition | |
JPS5312983A (en) | Photosensitive composition | |
JPS5289914A (en) | Photosensitive composition | |
JPS52103201A (en) | Photoosensitive composition | |
JPS5287046A (en) | Photoconductor | |
JPS5382502A (en) | Photosensitive composition |