JPS5368578A - Photo mask - Google Patents
Photo maskInfo
- Publication number
- JPS5368578A JPS5368578A JP14335176A JP14335176A JPS5368578A JP S5368578 A JPS5368578 A JP S5368578A JP 14335176 A JP14335176 A JP 14335176A JP 14335176 A JP14335176 A JP 14335176A JP S5368578 A JPS5368578 A JP S5368578A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- mask
- photo mask
- photo
- free energy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To prevent the tacky adhesion of a mask and a resist and reduce the production of defects at the etching by beforehand making the surface free energy of the resist side surface of the mask lower than the surface free energy of the surface of the substrate in contact with the resist at the time of contacting three of photo mask, photo resist and work substrate.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14335176A JPS5368578A (en) | 1976-12-01 | 1976-12-01 | Photo mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14335176A JPS5368578A (en) | 1976-12-01 | 1976-12-01 | Photo mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5368578A true JPS5368578A (en) | 1978-06-19 |
Family
ID=15336755
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14335176A Pending JPS5368578A (en) | 1976-12-01 | 1976-12-01 | Photo mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5368578A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6565704B2 (en) * | 1998-07-08 | 2003-05-20 | Nitto Denko Corporation | Process for the removal of resist material |
JP2018535446A (en) * | 2016-01-27 | 2018-11-29 | エルジー・ケム・リミテッド | Film mask, manufacturing method thereof, and pattern forming method using the same |
US10969686B2 (en) | 2016-01-27 | 2021-04-06 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby |
US11029596B2 (en) | 2016-01-27 | 2021-06-08 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby |
-
1976
- 1976-12-01 JP JP14335176A patent/JPS5368578A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6565704B2 (en) * | 1998-07-08 | 2003-05-20 | Nitto Denko Corporation | Process for the removal of resist material |
JP2018535446A (en) * | 2016-01-27 | 2018-11-29 | エルジー・ケム・リミテッド | Film mask, manufacturing method thereof, and pattern forming method using the same |
US10969677B2 (en) | 2016-01-27 | 2021-04-06 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask |
US10969686B2 (en) | 2016-01-27 | 2021-04-06 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby |
US11029596B2 (en) | 2016-01-27 | 2021-06-08 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby |
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