JPS5368578A - Photo mask - Google Patents

Photo mask

Info

Publication number
JPS5368578A
JPS5368578A JP14335176A JP14335176A JPS5368578A JP S5368578 A JPS5368578 A JP S5368578A JP 14335176 A JP14335176 A JP 14335176A JP 14335176 A JP14335176 A JP 14335176A JP S5368578 A JPS5368578 A JP S5368578A
Authority
JP
Japan
Prior art keywords
resist
mask
photo mask
photo
free energy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14335176A
Other languages
Japanese (ja)
Inventor
Hiroshi Yanagisawa
Toshiharu Matsuzawa
Tetsukazu Hashimoto
Kikuo Doda
Nobuo Hasegawa
Yorio Moriguchi
Masahiko Tsujita
Hiromitsu Mishimagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP14335176A priority Critical patent/JPS5368578A/en
Publication of JPS5368578A publication Critical patent/JPS5368578A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To prevent the tacky adhesion of a mask and a resist and reduce the production of defects at the etching by beforehand making the surface free energy of the resist side surface of the mask lower than the surface free energy of the surface of the substrate in contact with the resist at the time of contacting three of photo mask, photo resist and work substrate.
COPYRIGHT: (C)1978,JPO&Japio
JP14335176A 1976-12-01 1976-12-01 Photo mask Pending JPS5368578A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14335176A JPS5368578A (en) 1976-12-01 1976-12-01 Photo mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14335176A JPS5368578A (en) 1976-12-01 1976-12-01 Photo mask

Publications (1)

Publication Number Publication Date
JPS5368578A true JPS5368578A (en) 1978-06-19

Family

ID=15336755

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14335176A Pending JPS5368578A (en) 1976-12-01 1976-12-01 Photo mask

Country Status (1)

Country Link
JP (1) JPS5368578A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6565704B2 (en) * 1998-07-08 2003-05-20 Nitto Denko Corporation Process for the removal of resist material
JP2018535446A (en) * 2016-01-27 2018-11-29 エルジー・ケム・リミテッド Film mask, manufacturing method thereof, and pattern forming method using the same
US10969686B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
US11029596B2 (en) 2016-01-27 2021-06-08 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6565704B2 (en) * 1998-07-08 2003-05-20 Nitto Denko Corporation Process for the removal of resist material
JP2018535446A (en) * 2016-01-27 2018-11-29 エルジー・ケム・リミテッド Film mask, manufacturing method thereof, and pattern forming method using the same
US10969677B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask
US10969686B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
US11029596B2 (en) 2016-01-27 2021-06-08 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby

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