JPS5367684A - Method and apparatus for continuously coating glass or ceramic substrate by cathode sputtering - Google Patents
Method and apparatus for continuously coating glass or ceramic substrate by cathode sputteringInfo
- Publication number
- JPS5367684A JPS5367684A JP14144577A JP14144577A JPS5367684A JP S5367684 A JPS5367684 A JP S5367684A JP 14144577 A JP14144577 A JP 14144577A JP 14144577 A JP14144577 A JP 14144577A JP S5367684 A JPS5367684 A JP S5367684A
- Authority
- JP
- Japan
- Prior art keywords
- ceramic substrate
- coating glass
- cathode sputtering
- continuously coating
- continuously
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/4505—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19762653736 DE2653736A1 (en) | 1976-11-26 | 1976-11-26 | METHOD AND DEVICE FOR CONTINUOUS COATING OF GLASS OR CERAMIC SUBSTRATES USING CATHODE SPRAYING |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5367684A true JPS5367684A (en) | 1978-06-16 |
Family
ID=5994034
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14144577A Pending JPS5367684A (en) | 1976-11-26 | 1977-11-25 | Method and apparatus for continuously coating glass or ceramic substrate by cathode sputtering |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS5367684A (en) |
CH (1) | CH620946A5 (en) |
DE (1) | DE2653736A1 (en) |
FR (1) | FR2372243A1 (en) |
IT (1) | IT1089022B (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61119672A (en) * | 1984-11-14 | 1986-06-06 | Ulvac Corp | Vent method of load lock chamber |
JPS6461645A (en) * | 1987-09-01 | 1989-03-08 | Yasuda Susumu | Dangerous harmful gas detecting method |
JP2012507634A (en) * | 2008-11-06 | 2012-03-29 | ライボルト オプティクス ゲゼルシャフト ミット ベシュレンクテル ハフツング | Test glass fluctuation system |
CN111926306A (en) * | 2020-09-22 | 2020-11-13 | 上海陛通半导体能源科技股份有限公司 | Deposition equipment based on multi-process-cavity transmission and wafer deposition method |
CN114823432A (en) * | 2022-06-28 | 2022-07-29 | 江苏邑文微电子科技有限公司 | Semiconductor vacuum transmission platform and control method thereof |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4640221A (en) * | 1985-10-30 | 1987-02-03 | International Business Machines Corporation | Vacuum deposition system with improved mass flow control |
DE102007022431A1 (en) * | 2007-05-09 | 2008-11-13 | Leybold Optics Gmbh | Plasma-coating assembly for flat surfaces e.g. thin film solar cells has moving electrode and fixed electrode |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1321861A (en) * | 1970-01-13 | 1973-07-04 | Ultra Electronics Ltd | Vacuum deposition |
DE2116190C3 (en) * | 1971-04-02 | 1979-08-30 | Flachglas Ag Delog-Detag, 4650 Gelsenkirchen | Device for coating large-area plates such as glass panes, ceramic or plastic plates and the like by means of cathode sputtering |
-
1976
- 1976-11-26 DE DE19762653736 patent/DE2653736A1/en not_active Withdrawn
-
1977
- 1977-10-27 CH CH1306677A patent/CH620946A5/en not_active IP Right Cessation
- 1977-11-21 FR FR7734925A patent/FR2372243A1/en not_active Withdrawn
- 1977-11-24 IT IT2998477A patent/IT1089022B/en active
- 1977-11-25 JP JP14144577A patent/JPS5367684A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61119672A (en) * | 1984-11-14 | 1986-06-06 | Ulvac Corp | Vent method of load lock chamber |
JPS6461645A (en) * | 1987-09-01 | 1989-03-08 | Yasuda Susumu | Dangerous harmful gas detecting method |
JP2012507634A (en) * | 2008-11-06 | 2012-03-29 | ライボルト オプティクス ゲゼルシャフト ミット ベシュレンクテル ハフツング | Test glass fluctuation system |
US9157147B2 (en) | 2008-11-06 | 2015-10-13 | Leybold Optics Gmbh | Test glass changing system |
CN111926306A (en) * | 2020-09-22 | 2020-11-13 | 上海陛通半导体能源科技股份有限公司 | Deposition equipment based on multi-process-cavity transmission and wafer deposition method |
CN114823432A (en) * | 2022-06-28 | 2022-07-29 | 江苏邑文微电子科技有限公司 | Semiconductor vacuum transmission platform and control method thereof |
CN114823432B (en) * | 2022-06-28 | 2022-09-02 | 江苏邑文微电子科技有限公司 | Semiconductor vacuum transmission platform and control method thereof |
Also Published As
Publication number | Publication date |
---|---|
DE2653736A1 (en) | 1978-06-01 |
IT1089022B (en) | 1985-06-10 |
FR2372243A1 (en) | 1978-06-23 |
CH620946A5 (en) | 1980-12-31 |
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