JPS5360882A - Generating apparatus for activated gas - Google Patents

Generating apparatus for activated gas

Info

Publication number
JPS5360882A
JPS5360882A JP13622676A JP13622676A JPS5360882A JP S5360882 A JPS5360882 A JP S5360882A JP 13622676 A JP13622676 A JP 13622676A JP 13622676 A JP13622676 A JP 13622676A JP S5360882 A JPS5360882 A JP S5360882A
Authority
JP
Japan
Prior art keywords
activated gas
wall
generating apparatus
generating
electric power
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13622676A
Other languages
Japanese (ja)
Other versions
JPS6013740B2 (en
Inventor
Sakae Arai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP13622676A priority Critical patent/JPS6013740B2/en
Publication of JPS5360882A publication Critical patent/JPS5360882A/en
Publication of JPS6013740B2 publication Critical patent/JPS6013740B2/en
Expired legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

PURPOSE: To cool efficiently the wall of the activation chamber for generating the activated gas so as to lengthen the life of the wall and, moreover, to cool without lowering the efficiency of microwave electric power, by equipping the area for passing the cooling liquid to the wall of the activation chamber for generating the activated gas by irradiating the microwave electric power to the gas under reduced pressure.
COPYRIGHT: (C)1978,JPO&Japio
JP13622676A 1976-11-15 1976-11-15 Activated gas generator Expired JPS6013740B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13622676A JPS6013740B2 (en) 1976-11-15 1976-11-15 Activated gas generator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13622676A JPS6013740B2 (en) 1976-11-15 1976-11-15 Activated gas generator

Publications (2)

Publication Number Publication Date
JPS5360882A true JPS5360882A (en) 1978-05-31
JPS6013740B2 JPS6013740B2 (en) 1985-04-09

Family

ID=15170230

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13622676A Expired JPS6013740B2 (en) 1976-11-15 1976-11-15 Activated gas generator

Country Status (1)

Country Link
JP (1) JPS6013740B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57178316A (en) * 1981-04-27 1982-11-02 Hitachi Ltd Manufacture of semiconductor element and device therefor
JPS5984526A (en) * 1982-11-08 1984-05-16 Fujitsu Ltd Microwave processing apparatus
JPS59219470A (en) * 1983-05-25 1984-12-10 Furukawa Electric Co Ltd:The Plasma surface treatment
JP2007026861A (en) * 2005-07-15 2007-02-01 Tokyo Electron Ltd Remote plasma generation unit, electric-field distribution measurement device therefor, processor, characteristic adjustment method for remote plasma generation unit
JP2010103121A (en) * 1995-02-16 2010-05-06 Mks Instruments Inc Liquid-cooling microwave plasma applicator for microwave plasma system, and liquid-cooling dielectric window
JP2014194955A (en) * 2014-06-20 2014-10-09 Saida Fds Inc Microwave device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0252417A (en) * 1988-08-17 1990-02-22 Fujitsu Ltd Wafer holder apparatus for electron beam exposure system

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57178316A (en) * 1981-04-27 1982-11-02 Hitachi Ltd Manufacture of semiconductor element and device therefor
JPS5984526A (en) * 1982-11-08 1984-05-16 Fujitsu Ltd Microwave processing apparatus
JPS59219470A (en) * 1983-05-25 1984-12-10 Furukawa Electric Co Ltd:The Plasma surface treatment
JP2010103121A (en) * 1995-02-16 2010-05-06 Mks Instruments Inc Liquid-cooling microwave plasma applicator for microwave plasma system, and liquid-cooling dielectric window
JP2007026861A (en) * 2005-07-15 2007-02-01 Tokyo Electron Ltd Remote plasma generation unit, electric-field distribution measurement device therefor, processor, characteristic adjustment method for remote plasma generation unit
JP2014194955A (en) * 2014-06-20 2014-10-09 Saida Fds Inc Microwave device

Also Published As

Publication number Publication date
JPS6013740B2 (en) 1985-04-09

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