JPS5352072A - Pattern for alignment - Google Patents
Pattern for alignmentInfo
- Publication number
- JPS5352072A JPS5352072A JP12614376A JP12614376A JPS5352072A JP S5352072 A JPS5352072 A JP S5352072A JP 12614376 A JP12614376 A JP 12614376A JP 12614376 A JP12614376 A JP 12614376A JP S5352072 A JPS5352072 A JP S5352072A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- alignment
- wafer
- seciconductor
- lectile
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE: To prevent a photo-resistor - which is applied while being rotated from occurring the drift to improve a positioning precision between a lectile and a wafer, by providing a stripe pattern - which goes toward the radial direction from the center - in an alignment pattern to be formed on a seciconductor wafer.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12614376A JPS5352072A (en) | 1976-10-22 | 1976-10-22 | Pattern for alignment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12614376A JPS5352072A (en) | 1976-10-22 | 1976-10-22 | Pattern for alignment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5352072A true JPS5352072A (en) | 1978-05-12 |
JPS5619734B2 JPS5619734B2 (en) | 1981-05-09 |
Family
ID=14927730
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12614376A Granted JPS5352072A (en) | 1976-10-22 | 1976-10-22 | Pattern for alignment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5352072A (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53111280A (en) * | 1977-03-10 | 1978-09-28 | Canon Inc | Mask or wafer for production of semiconductor elements and device for aligning these |
JPS5533145A (en) * | 1978-08-30 | 1980-03-08 | Dainippon Screen Mfg Co Ltd | Positioning sensor |
JPS5533146A (en) * | 1978-08-30 | 1980-03-08 | Dainippon Screen Mfg Co Ltd | Photoelectric element for detecting and positioning register mark for engraving |
JPS5541739A (en) * | 1978-09-20 | 1980-03-24 | Hitachi Ltd | Micro-projection type mask alignment device |
JPS59101829A (en) * | 1982-12-01 | 1984-06-12 | Canon Inc | Arranging method of alignment mark |
JPS60196944A (en) * | 1984-07-30 | 1985-10-05 | Hitachi Ltd | Method for detecting pattern positioned on wafer |
JPS61123139A (en) * | 1985-10-11 | 1986-06-11 | Canon Inc | Alignment apparatus |
JPS62122129A (en) * | 1986-05-09 | 1987-06-03 | Hitachi Ltd | Detector for position of pattern on wafer |
JPH01103835A (en) * | 1988-08-26 | 1989-04-20 | Hitachi Ltd | Specimen of semiconductor wafer or the like to be exposed |
-
1976
- 1976-10-22 JP JP12614376A patent/JPS5352072A/en active Granted
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6216012B2 (en) * | 1977-03-10 | 1987-04-10 | Canon Kk | |
JPS53111280A (en) * | 1977-03-10 | 1978-09-28 | Canon Inc | Mask or wafer for production of semiconductor elements and device for aligning these |
JPS5533145A (en) * | 1978-08-30 | 1980-03-08 | Dainippon Screen Mfg Co Ltd | Positioning sensor |
JPS5533146A (en) * | 1978-08-30 | 1980-03-08 | Dainippon Screen Mfg Co Ltd | Photoelectric element for detecting and positioning register mark for engraving |
JPS5856402B2 (en) * | 1978-08-30 | 1983-12-14 | 大日本スクリ−ン製造株式会社 | Positioning sensor |
JPS5541739A (en) * | 1978-09-20 | 1980-03-24 | Hitachi Ltd | Micro-projection type mask alignment device |
JPS6227536B2 (en) * | 1978-09-20 | 1987-06-15 | Hitachi Ltd | |
JPS59101829A (en) * | 1982-12-01 | 1984-06-12 | Canon Inc | Arranging method of alignment mark |
JPS60196944A (en) * | 1984-07-30 | 1985-10-05 | Hitachi Ltd | Method for detecting pattern positioned on wafer |
JPS6151415B2 (en) * | 1984-07-30 | 1986-11-08 | Hitachi Ltd | |
JPS61123139A (en) * | 1985-10-11 | 1986-06-11 | Canon Inc | Alignment apparatus |
JPS62122129A (en) * | 1986-05-09 | 1987-06-03 | Hitachi Ltd | Detector for position of pattern on wafer |
JPH0152893B2 (en) * | 1986-05-09 | 1989-11-10 | Hitachi Ltd | |
JPH01103835A (en) * | 1988-08-26 | 1989-04-20 | Hitachi Ltd | Specimen of semiconductor wafer or the like to be exposed |
JPH0445968B2 (en) * | 1988-08-26 | 1992-07-28 | Hitachi Ltd |
Also Published As
Publication number | Publication date |
---|---|
JPS5619734B2 (en) | 1981-05-09 |
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