JPS5329664A - Thermal diffustion of impurity into semiconductor substrate - Google Patents

Thermal diffustion of impurity into semiconductor substrate

Info

Publication number
JPS5329664A
JPS5329664A JP10458976A JP10458976A JPS5329664A JP S5329664 A JPS5329664 A JP S5329664A JP 10458976 A JP10458976 A JP 10458976A JP 10458976 A JP10458976 A JP 10458976A JP S5329664 A JPS5329664 A JP S5329664A
Authority
JP
Japan
Prior art keywords
semiconductor substrate
impurity
diffustion
thermal
blowing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10458976A
Other languages
Japanese (ja)
Inventor
Sokichi Yamagishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP10458976A priority Critical patent/JPS5329664A/en
Publication of JPS5329664A publication Critical patent/JPS5329664A/en
Pending legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE:To uniformly coat a semiconductor substrate with the reaction product of the vaporized impurity, by blowing it against the inlet port of the oxidation agent at the end of the furnace core tube.
JP10458976A 1976-08-31 1976-08-31 Thermal diffustion of impurity into semiconductor substrate Pending JPS5329664A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10458976A JPS5329664A (en) 1976-08-31 1976-08-31 Thermal diffustion of impurity into semiconductor substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10458976A JPS5329664A (en) 1976-08-31 1976-08-31 Thermal diffustion of impurity into semiconductor substrate

Publications (1)

Publication Number Publication Date
JPS5329664A true JPS5329664A (en) 1978-03-20

Family

ID=14384611

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10458976A Pending JPS5329664A (en) 1976-08-31 1976-08-31 Thermal diffustion of impurity into semiconductor substrate

Country Status (1)

Country Link
JP (1) JPS5329664A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5416367U (en) * 1977-07-06 1979-02-02

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5416367U (en) * 1977-07-06 1979-02-02

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