JPS5321952A - Measurement of electron beam diameter - Google Patents
Measurement of electron beam diameterInfo
- Publication number
- JPS5321952A JPS5321952A JP9635476A JP9635476A JPS5321952A JP S5321952 A JPS5321952 A JP S5321952A JP 9635476 A JP9635476 A JP 9635476A JP 9635476 A JP9635476 A JP 9635476A JP S5321952 A JPS5321952 A JP S5321952A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- beam diameter
- measurement
- section
- cleavage cross
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Measurement Of Radiation (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
PURPOSE: To measure electron beam diameter with high precision by coating a material layer of metals on substrate, preparing cleavage cross-section by splitting this coated product and scanning electron beam at the boundary of the cleavage cross-section to detect reflected electrons thereof.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9635476A JPS5819041B2 (en) | 1976-08-11 | 1976-08-11 | How to measure electron beam diameter |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9635476A JPS5819041B2 (en) | 1976-08-11 | 1976-08-11 | How to measure electron beam diameter |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5321952A true JPS5321952A (en) | 1978-02-28 |
JPS5819041B2 JPS5819041B2 (en) | 1983-04-15 |
Family
ID=14162648
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9635476A Expired JPS5819041B2 (en) | 1976-08-11 | 1976-08-11 | How to measure electron beam diameter |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5819041B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5763463A (en) * | 1980-10-03 | 1982-04-16 | Toshiba Corp | Wafer for measuring diameter of electron beam and beam current |
US5382895A (en) * | 1992-12-28 | 1995-01-17 | Regents Of The University Of California | System for tomographic determination of the power distribution in electron beams |
-
1976
- 1976-08-11 JP JP9635476A patent/JPS5819041B2/en not_active Expired
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5763463A (en) * | 1980-10-03 | 1982-04-16 | Toshiba Corp | Wafer for measuring diameter of electron beam and beam current |
JPS6138829B2 (en) * | 1980-10-03 | 1986-09-01 | Tokyo Shibaura Electric Co | |
US5382895A (en) * | 1992-12-28 | 1995-01-17 | Regents Of The University Of California | System for tomographic determination of the power distribution in electron beams |
Also Published As
Publication number | Publication date |
---|---|
JPS5819041B2 (en) | 1983-04-15 |
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