JPS5321952A - Measurement of electron beam diameter - Google Patents

Measurement of electron beam diameter

Info

Publication number
JPS5321952A
JPS5321952A JP9635476A JP9635476A JPS5321952A JP S5321952 A JPS5321952 A JP S5321952A JP 9635476 A JP9635476 A JP 9635476A JP 9635476 A JP9635476 A JP 9635476A JP S5321952 A JPS5321952 A JP S5321952A
Authority
JP
Japan
Prior art keywords
electron beam
beam diameter
measurement
section
cleavage cross
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9635476A
Other languages
Japanese (ja)
Other versions
JPS5819041B2 (en
Inventor
Yasuo Furukawa
Noriaki Nakayama
Masahiro Okabe
Seigo Igaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9635476A priority Critical patent/JPS5819041B2/en
Publication of JPS5321952A publication Critical patent/JPS5321952A/en
Publication of JPS5819041B2 publication Critical patent/JPS5819041B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Measurement Of Radiation (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE: To measure electron beam diameter with high precision by coating a material layer of metals on substrate, preparing cleavage cross-section by splitting this coated product and scanning electron beam at the boundary of the cleavage cross-section to detect reflected electrons thereof.
COPYRIGHT: (C)1978,JPO&Japio
JP9635476A 1976-08-11 1976-08-11 How to measure electron beam diameter Expired JPS5819041B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9635476A JPS5819041B2 (en) 1976-08-11 1976-08-11 How to measure electron beam diameter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9635476A JPS5819041B2 (en) 1976-08-11 1976-08-11 How to measure electron beam diameter

Publications (2)

Publication Number Publication Date
JPS5321952A true JPS5321952A (en) 1978-02-28
JPS5819041B2 JPS5819041B2 (en) 1983-04-15

Family

ID=14162648

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9635476A Expired JPS5819041B2 (en) 1976-08-11 1976-08-11 How to measure electron beam diameter

Country Status (1)

Country Link
JP (1) JPS5819041B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5763463A (en) * 1980-10-03 1982-04-16 Toshiba Corp Wafer for measuring diameter of electron beam and beam current
US5382895A (en) * 1992-12-28 1995-01-17 Regents Of The University Of California System for tomographic determination of the power distribution in electron beams

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5763463A (en) * 1980-10-03 1982-04-16 Toshiba Corp Wafer for measuring diameter of electron beam and beam current
JPS6138829B2 (en) * 1980-10-03 1986-09-01 Tokyo Shibaura Electric Co
US5382895A (en) * 1992-12-28 1995-01-17 Regents Of The University Of California System for tomographic determination of the power distribution in electron beams

Also Published As

Publication number Publication date
JPS5819041B2 (en) 1983-04-15

Similar Documents

Publication Publication Date Title
JPS5266485A (en) Scar searching apparatus
JPS5321952A (en) Measurement of electron beam diameter
JPS51137443A (en) Method for measuring dimensions of three-dimensional structures
JPS5359455A (en) Radiation measuring apparatus
JPS5412488A (en) Method of detecting drum flange hole position
JPS522547A (en) Optical method to measure displacement of plane
JPS5281975A (en) High-melting point carbide filament
JPS5437580A (en) Dry etching method and target film used for it
JPS5321950A (en) Detection of position
JPS52115249A (en) Detecting method of deviation of electron beams and moving direction o f materials
JPS51130442A (en) A method for double-side coating
JPS5332677A (en) Electron beam exposure apparatus
JPS5220859A (en) Direction signal generator
JPS5387720A (en) Positive type radiation sensitive material
JPS53117463A (en) Position detection method
JPS5224070A (en) Productio method of magnetron anode
JPS53144931A (en) Coating material
JPS52123646A (en) Scanning type length measuring apparatus
JPS53106162A (en) Electron beam meter
JPS52105887A (en) Measurement of adhesion strength of metal powders
JPS5228377A (en) Temperature distribution measuring device
JPS5364547A (en) Electron beam spot shape measuring apparatus
JPS5357763A (en) Diaphragm of electron beam exposure apparatus
JPS53120584A (en) Remaining life measuring method of metal materials
JPS5244657A (en) Method of measuring thin film charcteristics by fluorescent x-rays met hod