JPS5320768A - Forming method of fine pattern mask layer - Google Patents
Forming method of fine pattern mask layerInfo
- Publication number
- JPS5320768A JPS5320768A JP9450976A JP9450976A JPS5320768A JP S5320768 A JPS5320768 A JP S5320768A JP 9450976 A JP9450976 A JP 9450976A JP 9450976 A JP9450976 A JP 9450976A JP S5320768 A JPS5320768 A JP S5320768A
- Authority
- JP
- Japan
- Prior art keywords
- forming method
- mask layer
- fine pattern
- pattern mask
- patterns
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE: To facilitate controlling of pattern accuracy and make the final accuracy more than 10 times higher than that of conventional oxide film patterns by selectively oxidizing polycrystalline Si film, utilizing said oxidized part as patterns for mask.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9450976A JPS5320768A (en) | 1976-08-10 | 1976-08-10 | Forming method of fine pattern mask layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9450976A JPS5320768A (en) | 1976-08-10 | 1976-08-10 | Forming method of fine pattern mask layer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5320768A true JPS5320768A (en) | 1978-02-25 |
Family
ID=14112277
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9450976A Pending JPS5320768A (en) | 1976-08-10 | 1976-08-10 | Forming method of fine pattern mask layer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5320768A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012018342A (en) * | 2010-07-09 | 2012-01-26 | Shin Etsu Chem Co Ltd | Transfer method of resist pattern and manufacturing method of photo mask |
-
1976
- 1976-08-10 JP JP9450976A patent/JPS5320768A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012018342A (en) * | 2010-07-09 | 2012-01-26 | Shin Etsu Chem Co Ltd | Transfer method of resist pattern and manufacturing method of photo mask |
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