JPS53139693A - Production of polymer with good water and oil reprellency - Google Patents

Production of polymer with good water and oil reprellency

Info

Publication number
JPS53139693A
JPS53139693A JP5439177A JP5439177A JPS53139693A JP S53139693 A JPS53139693 A JP S53139693A JP 5439177 A JP5439177 A JP 5439177A JP 5439177 A JP5439177 A JP 5439177A JP S53139693 A JPS53139693 A JP S53139693A
Authority
JP
Japan
Prior art keywords
polymer
production
good water
oil
reprellency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5439177A
Other languages
Japanese (ja)
Other versions
JPS6029724B2 (en
Inventor
Takao Hayashi
Hitoshi Matsuo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP5439177A priority Critical patent/JPS6029724B2/en
Publication of JPS53139693A publication Critical patent/JPS53139693A/en
Publication of JPS6029724B2 publication Critical patent/JPS6029724B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

PURPOSE: An unsaturated carboxylic acid along with an unsaturated carboxylic acid dimer which is obtained as a by-product in the production of the former acid, are reacted with polyfluoroalcohol to produce said polymer with good water and oil repellency.
COPYRIGHT: (C)1978,JPO&Japio
JP5439177A 1977-05-13 1977-05-13 Method for producing a polymer with excellent water and oil repellency Expired JPS6029724B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5439177A JPS6029724B2 (en) 1977-05-13 1977-05-13 Method for producing a polymer with excellent water and oil repellency

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5439177A JPS6029724B2 (en) 1977-05-13 1977-05-13 Method for producing a polymer with excellent water and oil repellency

Publications (2)

Publication Number Publication Date
JPS53139693A true JPS53139693A (en) 1978-12-06
JPS6029724B2 JPS6029724B2 (en) 1985-07-12

Family

ID=12969376

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5439177A Expired JPS6029724B2 (en) 1977-05-13 1977-05-13 Method for producing a polymer with excellent water and oil repellency

Country Status (1)

Country Link
JP (1) JPS6029724B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5410005A (en) * 1992-08-14 1995-04-25 Japan Synthetic Rubber Co., Ltd. Reflection preventing film and process for forming resist pattern using the same
US20090197204A1 (en) * 2008-02-06 2009-08-06 Tokyo Ohka Kogyo Co., Ltd. Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound
US8475997B2 (en) 2008-06-23 2013-07-02 Tokyo Ohka Kogyo Co., Ltd. Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound
US8518629B2 (en) 2008-06-11 2013-08-27 Tokyo Ohka Kogyo Co., Ltd. Resist composition for immersion exposure and method of forming resist pattern using the same
US8846838B2 (en) 2009-07-03 2014-09-30 Tokyo Ohka Kogyo Co., Ltd. Fluorine-containing block copolymeric compound
US8980524B2 (en) 2010-01-05 2015-03-17 Tokyo Ohka Kogyo Co., Ltd. Positive resist composition and method of forming resist pattern

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5410005A (en) * 1992-08-14 1995-04-25 Japan Synthetic Rubber Co., Ltd. Reflection preventing film and process for forming resist pattern using the same
US20090197204A1 (en) * 2008-02-06 2009-08-06 Tokyo Ohka Kogyo Co., Ltd. Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound
US8642244B2 (en) 2008-02-06 2014-02-04 Tokyo Ohka Kogyo Co., Ltd. Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound
US8742038B2 (en) * 2008-02-06 2014-06-03 Tokyo Ohka Kogyo Co., Ltd. Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound
US8518629B2 (en) 2008-06-11 2013-08-27 Tokyo Ohka Kogyo Co., Ltd. Resist composition for immersion exposure and method of forming resist pattern using the same
US8475997B2 (en) 2008-06-23 2013-07-02 Tokyo Ohka Kogyo Co., Ltd. Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound
US8846838B2 (en) 2009-07-03 2014-09-30 Tokyo Ohka Kogyo Co., Ltd. Fluorine-containing block copolymeric compound
US8980524B2 (en) 2010-01-05 2015-03-17 Tokyo Ohka Kogyo Co., Ltd. Positive resist composition and method of forming resist pattern

Also Published As

Publication number Publication date
JPS6029724B2 (en) 1985-07-12

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