JPS53139693A - Production of polymer with good water and oil reprellency - Google Patents
Production of polymer with good water and oil reprellencyInfo
- Publication number
- JPS53139693A JPS53139693A JP5439177A JP5439177A JPS53139693A JP S53139693 A JPS53139693 A JP S53139693A JP 5439177 A JP5439177 A JP 5439177A JP 5439177 A JP5439177 A JP 5439177A JP S53139693 A JPS53139693 A JP S53139693A
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- production
- good water
- oil
- reprellency
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
PURPOSE: An unsaturated carboxylic acid along with an unsaturated carboxylic acid dimer which is obtained as a by-product in the production of the former acid, are reacted with polyfluoroalcohol to produce said polymer with good water and oil repellency.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5439177A JPS6029724B2 (en) | 1977-05-13 | 1977-05-13 | Method for producing a polymer with excellent water and oil repellency |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5439177A JPS6029724B2 (en) | 1977-05-13 | 1977-05-13 | Method for producing a polymer with excellent water and oil repellency |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53139693A true JPS53139693A (en) | 1978-12-06 |
JPS6029724B2 JPS6029724B2 (en) | 1985-07-12 |
Family
ID=12969376
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5439177A Expired JPS6029724B2 (en) | 1977-05-13 | 1977-05-13 | Method for producing a polymer with excellent water and oil repellency |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6029724B2 (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5410005A (en) * | 1992-08-14 | 1995-04-25 | Japan Synthetic Rubber Co., Ltd. | Reflection preventing film and process for forming resist pattern using the same |
US20090197204A1 (en) * | 2008-02-06 | 2009-08-06 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound |
US8475997B2 (en) | 2008-06-23 | 2013-07-02 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound |
US8518629B2 (en) | 2008-06-11 | 2013-08-27 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition for immersion exposure and method of forming resist pattern using the same |
US8846838B2 (en) | 2009-07-03 | 2014-09-30 | Tokyo Ohka Kogyo Co., Ltd. | Fluorine-containing block copolymeric compound |
US8980524B2 (en) | 2010-01-05 | 2015-03-17 | Tokyo Ohka Kogyo Co., Ltd. | Positive resist composition and method of forming resist pattern |
-
1977
- 1977-05-13 JP JP5439177A patent/JPS6029724B2/en not_active Expired
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5410005A (en) * | 1992-08-14 | 1995-04-25 | Japan Synthetic Rubber Co., Ltd. | Reflection preventing film and process for forming resist pattern using the same |
US20090197204A1 (en) * | 2008-02-06 | 2009-08-06 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound |
US8642244B2 (en) | 2008-02-06 | 2014-02-04 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound |
US8742038B2 (en) * | 2008-02-06 | 2014-06-03 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound |
US8518629B2 (en) | 2008-06-11 | 2013-08-27 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition for immersion exposure and method of forming resist pattern using the same |
US8475997B2 (en) | 2008-06-23 | 2013-07-02 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound |
US8846838B2 (en) | 2009-07-03 | 2014-09-30 | Tokyo Ohka Kogyo Co., Ltd. | Fluorine-containing block copolymeric compound |
US8980524B2 (en) | 2010-01-05 | 2015-03-17 | Tokyo Ohka Kogyo Co., Ltd. | Positive resist composition and method of forming resist pattern |
Also Published As
Publication number | Publication date |
---|---|
JPS6029724B2 (en) | 1985-07-12 |
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