JPS53133428A - Radiation sensitive copying constitute - Google Patents
Radiation sensitive copying constituteInfo
- Publication number
- JPS53133428A JPS53133428A JP4919578A JP4919578A JPS53133428A JP S53133428 A JPS53133428 A JP S53133428A JP 4919578 A JP4919578 A JP 4919578A JP 4919578 A JP4919578 A JP 4919578A JP S53133428 A JPS53133428 A JP S53133428A
- Authority
- JP
- Japan
- Prior art keywords
- constitute
- radiation sensitive
- sensitive copying
- copying
- radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
- C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
- C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
- C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
- C07D251/24—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Materials For Photolithography (AREA)
- Plural Heterocyclic Compounds (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Adhesives Or Adhesive Processes (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2718259A DE2718259C2 (en) | 1977-04-25 | 1977-04-25 | Radiation-sensitive mixture |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS53133428A true JPS53133428A (en) | 1978-11-21 |
| JPS6244258B2 JPS6244258B2 (en) | 1987-09-18 |
Family
ID=6007163
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4919578A Granted JPS53133428A (en) | 1977-04-25 | 1978-04-24 | Radiation sensitive copying constitute |
Country Status (16)
| Country | Link |
|---|---|
| JP (1) | JPS53133428A (en) |
| AU (1) | AU514951B2 (en) |
| BE (1) | BE866306A (en) |
| BR (1) | BR7802525A (en) |
| CA (1) | CA1103508A (en) |
| CH (1) | CH634158A5 (en) |
| DE (1) | DE2718259C2 (en) |
| DK (1) | DK176878A (en) |
| ES (1) | ES469089A1 (en) |
| FR (1) | FR2389157A1 (en) |
| GB (1) | GB1602903A (en) |
| IE (1) | IE46622B1 (en) |
| IT (1) | IT1102622B (en) |
| NL (1) | NL185179C (en) |
| SE (1) | SE423286B (en) |
| ZA (1) | ZA782332B (en) |
Cited By (131)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55126235A (en) * | 1979-03-22 | 1980-09-29 | Fuji Photo Film Co Ltd | Photosensitive composition |
| JPS58190946A (en) * | 1982-04-30 | 1983-11-08 | Sharp Corp | Photoresist |
| JPS61275747A (en) * | 1985-05-30 | 1986-12-05 | Nec Corp | Negative type resist material |
| JPS62115150A (en) * | 1985-07-02 | 1987-05-26 | Fuji Photo Film Co Ltd | Photosensitive composition |
| JPS6442645A (en) * | 1987-08-11 | 1989-02-14 | Tomoegawa Paper Co Ltd | Optical coloring composition |
| JPH02979A (en) * | 1987-12-12 | 1990-01-05 | Hoechst Ag | Post treatment of relief plate developed for use in flexiso printing |
| US4934791A (en) * | 1987-12-09 | 1990-06-19 | Matsushita Electric Industrial Co., Ltd. | Color filter |
| JPH02217855A (en) * | 1989-02-20 | 1990-08-30 | Tokyo Ohka Kogyo Co Ltd | Negative type electron beam resist composition |
| JPH04136860A (en) * | 1990-09-28 | 1992-05-11 | Tokyo Ohka Kogyo Co Ltd | Negative type radiation sensitive resist composition |
| US5304456A (en) * | 1991-01-31 | 1994-04-19 | Sumitomo Chemical Company, Limited | Negative photoresist composition |
| EP0690074A1 (en) | 1994-06-28 | 1996-01-03 | Toyo Ink Manufacturing Co., Ltd. | Photopolymerization initiator composition and photopolymerizable composition |
| EP0702271A1 (en) | 1994-09-06 | 1996-03-20 | Fuji Photo Film Co., Ltd. | Positive working printing plate |
| EP0726498A1 (en) | 1995-02-10 | 1996-08-14 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition |
| KR100359884B1 (en) * | 1998-08-18 | 2002-12-18 | 주식회사 엘지화학 | Tetrahydroquinolinyl and indolinyl triazine compounds and photopolymerization initiators |
| EP1602982A2 (en) | 2004-05-31 | 2005-12-07 | Fuji Photo Film Co., Ltd. | method of producing a lithographic printing plate and planographic printing method |
| EP1615073A1 (en) | 2004-07-06 | 2006-01-11 | Fuji Photo Film Co., Ltd. | Photosensitive composition and image recording method using the same |
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| EP1626309A2 (en) | 2004-03-25 | 2006-02-15 | Fuji Photo Film Co., Ltd. | Hologram recording material, hologram recording method and holographic optical element |
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| US4330590A (en) | 1980-02-14 | 1982-05-18 | Minnesota Mining And Manufacturing Company | Photoactive mixture of acrylic monomers and chromophore-substituted halomethyl-2-triazine |
| US4329384A (en) * | 1980-02-14 | 1982-05-11 | Minnesota Mining And Manufacturing Company | Pressure-sensitive adhesive tape produced from photoactive mixture of acrylic monomers and polynuclear-chromophore-substituted halomethyl-2-triazine |
| US4391687A (en) | 1980-02-14 | 1983-07-05 | Minnesota Mining And Manufacturing Company | Photoactive mixture of acrylic monomers and chromophore-substituted halomethyl-1-triazine |
| DE3144480A1 (en) * | 1981-11-09 | 1983-05-19 | Hoechst Ag, 6230 Frankfurt | LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE COPY MATERIAL MADE THEREOF |
| DE3337024A1 (en) * | 1983-10-12 | 1985-04-25 | Hoechst Ag, 6230 Frankfurt | LIGHT SENSITIVE COMPOUNDS HAVING TRICHLORMETHYL GROUPS, METHOD FOR THE PRODUCTION THEREOF AND LIGHT SENSITIVE MIXTURE CONTAINING THESE COMPOUNDS |
| DE3606155A1 (en) * | 1986-02-26 | 1987-08-27 | Basf Ag | PHOTOPOLYMERIZABLE MIXTURE, THIS CONTAINING LIGHT-SENSITIVE RECORDING ELEMENT, AND METHOD FOR PRODUCING A FLAT PRINT MOLD BY THIS LIGHT-SENSITIVE RECORDING ELEMENT |
| US4837128A (en) * | 1986-08-08 | 1989-06-06 | Fuji Photo Film Co., Ltd. | Light-sensitive composition |
| JPS6358440A (en) * | 1986-08-29 | 1988-03-14 | Fuji Photo Film Co Ltd | Photosensitive composition |
| DE3821585A1 (en) * | 1987-09-13 | 1989-03-23 | Hoechst Ag | POSITIVELY WORKING RADIATION-SENSITIVE MIXTURE AND PRODUCTION OF RADIATION-SENSITIVE RECORDING MATERIAL FOR HIGH-ENERGY RADIATION |
| JP2505033B2 (en) * | 1988-11-28 | 1996-06-05 | 東京応化工業株式会社 | Electron beam resist composition and method for forming fine pattern using the same |
| DE3912652A1 (en) * | 1989-04-18 | 1990-10-25 | Hoechst Ag | LIGHT-SENSITIVE BIS-TRICHLORMETHYL-S-TRIAZINE, METHOD FOR THE PRODUCTION THEREOF, AND LIGHT-SENSITIVE MIXTURE CONTAINING THESE COMPOUNDS |
| DE69130003T2 (en) * | 1990-05-25 | 1999-02-11 | Mitsubishi Chem Corp | Negative photosensitive composition and method for forming a photoresist pattern |
| DE4120173A1 (en) * | 1991-06-19 | 1992-12-24 | Hoechst Ag | POSITIVELY WORKING RADIATION-SENSITIVE MIXTURE AND PRODUCTION OF RADIATION-SENSITIVE RECORDING MATERIAL THEREFOR |
| DE4444669A1 (en) | 1994-12-15 | 1996-06-20 | Hoechst Ag | Radiation sensitive mixture |
| DE19803564A1 (en) | 1998-01-30 | 1999-08-05 | Agfa Gevaert Ag | Polymers with units of N-substituted maleimide and their use in radiation-sensitive mixtures |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1298414B (en) * | 1967-11-09 | 1969-06-26 | Kalle Ag | Photosensitive mixture |
-
1977
- 1977-04-25 DE DE2718259A patent/DE2718259C2/en not_active Expired
-
1978
- 1978-04-21 SE SE7804588A patent/SE423286B/en not_active IP Right Cessation
- 1978-04-21 IE IE788/78A patent/IE46622B1/en unknown
- 1978-04-21 IT IT49012/78A patent/IT1102622B/en active
- 1978-04-21 CA CA301,635A patent/CA1103508A/en not_active Expired
- 1978-04-21 AU AU35355/78A patent/AU514951B2/en not_active Expired
- 1978-04-21 NL NLAANVRAGE7804304,A patent/NL185179C/en not_active IP Right Cessation
- 1978-04-24 ZA ZA00782332A patent/ZA782332B/en unknown
- 1978-04-24 FR FR7812010A patent/FR2389157A1/en active Granted
- 1978-04-24 BR BR7802525A patent/BR7802525A/en unknown
- 1978-04-24 JP JP4919578A patent/JPS53133428A/en active Granted
- 1978-04-24 GB GB16075/78A patent/GB1602903A/en not_active Expired
- 1978-04-24 ES ES469089A patent/ES469089A1/en not_active Expired
- 1978-04-24 DK DK176878A patent/DK176878A/en unknown
- 1978-04-24 CH CH442078A patent/CH634158A5/en not_active IP Right Cessation
- 1978-04-24 BE BE187055A patent/BE866306A/en not_active IP Right Cessation
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Also Published As
| Publication number | Publication date |
|---|---|
| ZA782332B (en) | 1979-04-25 |
| CH634158A5 (en) | 1983-01-14 |
| DE2718259A1 (en) | 1978-11-02 |
| DK176878A (en) | 1978-10-26 |
| DE2718259C2 (en) | 1982-11-25 |
| IT1102622B (en) | 1985-10-07 |
| SE7804588L (en) | 1978-10-26 |
| AU514951B2 (en) | 1981-03-05 |
| NL7804304A (en) | 1978-10-27 |
| AU3535578A (en) | 1979-10-25 |
| GB1602903A (en) | 1981-11-18 |
| CA1103508A (en) | 1981-06-23 |
| NL185179B (en) | 1989-09-01 |
| SE423286B (en) | 1982-04-26 |
| JPS6244258B2 (en) | 1987-09-18 |
| IE780788L (en) | 1978-10-25 |
| FR2389157A1 (en) | 1978-11-24 |
| IE46622B1 (en) | 1983-08-10 |
| BE866306A (en) | 1978-10-24 |
| IT7849012A0 (en) | 1978-04-21 |
| ES469089A1 (en) | 1979-09-16 |
| FR2389157B1 (en) | 1980-10-31 |
| NL185179C (en) | 1990-02-01 |
| BR7802525A (en) | 1978-12-05 |
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