JPS5295170A - Evaporator by electron beam - Google Patents
Evaporator by electron beamInfo
- Publication number
- JPS5295170A JPS5295170A JP1145376A JP1145376A JPS5295170A JP S5295170 A JPS5295170 A JP S5295170A JP 1145376 A JP1145376 A JP 1145376A JP 1145376 A JP1145376 A JP 1145376A JP S5295170 A JPS5295170 A JP S5295170A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- evaporator
- grounded
- evaporated
- degradation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
PURPOSE:To prevent the degradation of element property caused by secondary electron by inserting a grounded or low voltage wire net between electron beam system and materials to be evaporated.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1145376A JPS5295170A (en) | 1976-02-06 | 1976-02-06 | Evaporator by electron beam |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1145376A JPS5295170A (en) | 1976-02-06 | 1976-02-06 | Evaporator by electron beam |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5295170A true JPS5295170A (en) | 1977-08-10 |
Family
ID=11778505
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1145376A Pending JPS5295170A (en) | 1976-02-06 | 1976-02-06 | Evaporator by electron beam |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5295170A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60165372A (en) * | 1984-02-09 | 1985-08-28 | Matsushita Electronics Corp | Electron beam vapor deposition apparatus |
JPS61177383A (en) * | 1985-01-31 | 1986-08-09 | Stanley Electric Co Ltd | Plasma ashing device |
JPH0364455A (en) * | 1989-07-31 | 1991-03-19 | Nec Corp | Electron gun type film forming device |
-
1976
- 1976-02-06 JP JP1145376A patent/JPS5295170A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60165372A (en) * | 1984-02-09 | 1985-08-28 | Matsushita Electronics Corp | Electron beam vapor deposition apparatus |
JPS61177383A (en) * | 1985-01-31 | 1986-08-09 | Stanley Electric Co Ltd | Plasma ashing device |
JPH0364455A (en) * | 1989-07-31 | 1991-03-19 | Nec Corp | Electron gun type film forming device |
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