JPS5295170A - Evaporator by electron beam - Google Patents

Evaporator by electron beam

Info

Publication number
JPS5295170A
JPS5295170A JP1145376A JP1145376A JPS5295170A JP S5295170 A JPS5295170 A JP S5295170A JP 1145376 A JP1145376 A JP 1145376A JP 1145376 A JP1145376 A JP 1145376A JP S5295170 A JPS5295170 A JP S5295170A
Authority
JP
Japan
Prior art keywords
electron beam
evaporator
grounded
evaporated
degradation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1145376A
Other languages
Japanese (ja)
Inventor
Akihiro Tomosawa
Kensuke Nakada
Hirobumi Yoshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1145376A priority Critical patent/JPS5295170A/en
Publication of JPS5295170A publication Critical patent/JPS5295170A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

PURPOSE:To prevent the degradation of element property caused by secondary electron by inserting a grounded or low voltage wire net between electron beam system and materials to be evaporated.
JP1145376A 1976-02-06 1976-02-06 Evaporator by electron beam Pending JPS5295170A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1145376A JPS5295170A (en) 1976-02-06 1976-02-06 Evaporator by electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1145376A JPS5295170A (en) 1976-02-06 1976-02-06 Evaporator by electron beam

Publications (1)

Publication Number Publication Date
JPS5295170A true JPS5295170A (en) 1977-08-10

Family

ID=11778505

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1145376A Pending JPS5295170A (en) 1976-02-06 1976-02-06 Evaporator by electron beam

Country Status (1)

Country Link
JP (1) JPS5295170A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60165372A (en) * 1984-02-09 1985-08-28 Matsushita Electronics Corp Electron beam vapor deposition apparatus
JPS61177383A (en) * 1985-01-31 1986-08-09 Stanley Electric Co Ltd Plasma ashing device
JPH0364455A (en) * 1989-07-31 1991-03-19 Nec Corp Electron gun type film forming device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60165372A (en) * 1984-02-09 1985-08-28 Matsushita Electronics Corp Electron beam vapor deposition apparatus
JPS61177383A (en) * 1985-01-31 1986-08-09 Stanley Electric Co Ltd Plasma ashing device
JPH0364455A (en) * 1989-07-31 1991-03-19 Nec Corp Electron gun type film forming device

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